公开(公告)号：WO2008072962A2

公开(公告)日：2008-06-19

申请号：PCT/NL2007/050645

申请日：2007-12-13

Applicant: ASML NETHERLANDS B.V. ,  VAN HERPEN, Maarten Marinus Johannes Wilhelmus ,  BANINE, Vadim Yevgenyevich ,  IVANOV, Vladimir Vitalevitch ,  KOSHELEV, Konstantin Nikolaevitch ,  KLUNDER, Derk Jan Wilfred

Inventor： VAN HERPEN, Maarten Marinus Johannes Wilhelmus ,  BANINE, Vadim Yevgenyevich ,  IVANOV, Vladimir Vitalevitch ,  KOSHELEV, Konstantin Nikolaevitch ,  KLUNDER, Derk Jan Wilfred

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005

Abstract: The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.

Abstract translation: 本发明涉及一种用于产生电磁辐射的辐射系统。 辐射系统包括一对电极，其构造和布置成产生等离子体中的第一物质的等离子体和夹紧。 辐射系统还包括等离子体复合表面，其被布置成靠近夹点，并且被配置为中和多个等离子体颗粒。

公开(公告)号：WO2008072959A2

公开(公告)日：2008-06-19

申请号：PCT/NL2007050598

申请日：2007-11-27

Applicant: ASML NETHERLANDS BV ,  WASSINK ARNOUD CORNELIS ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  CADEE THEODORUS PETRUS MARIA ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  KLUNDER DERK JAN WILFRED ,  VAN HERPEN MAARTEN MARINUS JOH ,  BROM PAUL PETER ANNA ANTONIUS ,  SOER WOUTER ANTHON ,  GLUSHKOV DENIS

Inventor： WASSINK ARNOUD CORNELIS ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  CADEE THEODORUS PETRUS MARIA ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  KLUNDER DERK JAN WILFRED ,  VAN HERPEN MAARTEN MARINUS JOH ,  BROM PAUL PETER ANNA ANTONIUS ,  SOER WOUTER ANTHON ,  GLUSHKOV DENIS

IPC: G03F7/20 ,  G21K1/00 ,  H05G2/00

CPC classification number: G03F7/70933 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract translation: 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。

公开(公告)号：WO2008133506A1

公开(公告)日：2008-11-06

申请号：PCT/NL2008/050238

申请日：2008-04-23

Applicant: ASML NETHERLANDS B.V. ,  BANINE, Vadim, Yevgenyevich ,  BLEEKER, Arno, Jan ,  IVANOV, Vladimir, Vitalevitch ,  KOSHELEV, Konstantin, Nikolaevitch ,  SCHUURMANS, Frank, Jeroen, Pieter ,  KRIVTSUN, Vladimir, Mihailovitch ,  VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus

Inventor： BANINE, Vadim, Yevgenyevich ,  BLEEKER, Arno, Jan ,  IVANOV, Vladimir, Vitalevitch ,  KOSHELEV, Konstantin, Nikolaevitch ,  SCHUURMANS, Frank, Jeroen, Pieter ,  KRIVTSUN, Vladimir, Mihailovitch ,  VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus

IPC: G21K7/00

CPC classification number: G21K7/00

Abstract: An extreme ultraviolet (EUV) microscope configured to analyze a sample (5). The microscope includes a source (2) of EUV radiation constructed and arranged to generate the EUV radiation with a wavelength at least in a range of about 2 - 6 nm, and an optical system (3) constructed and arranged to illuminate the sample with the EUV radiation and to collect a radiation emanating (6) from the sample. The optical system is arranged with at least one mirror that includes a multilayer structure for in- phase reflection of at least a portion of the radiation in the range of about 2 - 6 nm.

Abstract translation: 配置用于分析样品（5）的极紫外（EUV）显微镜。 显微镜包括EUV辐射源（2），其被构造和布置成产生波长至少在约2-6nm范围内的EUV辐射;以及光学系统（3），被构造和布置成用 EUV辐射并从样品中收集辐射（6）。 光学系统布置有至少一个反射镜，其包括多层结构，用于在约2-6nm的范围内的至少一部分辐射的同相反射。

公开(公告)号：WO2008100143A1

公开(公告)日：2008-08-21

申请号：PCT/NL2008/050082

申请日：2008-02-14

Applicant: ASML NETHERLANDS B.V. ,  KRIVTSUN, Vladimir Mihailovitch ,  BANINE, Vadim Yevgenyevich ,  IVANOV, Vladimir Vitalevitch ,  KOROP, Evgeny Dmitrievich ,  KOSHELEV, Konstantin Nikolaevitch ,  SIDELNIKOV, Yurii Victorovitch ,  YAKUSHEV, Oleg

Inventor： KRIVTSUN, Vladimir Mihailovitch ,  BANINE, Vadim Yevgenyevich ,  IVANOV, Vladimir Vitalevitch ,  KOROP, Evgeny Dmitrievich ,  KOSHELEV, Konstantin Nikolaevitch ,  SIDELNIKOV, Yurii Victorovitch ,  YAKUSHEV, Oleg

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

Abstract: An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source (24), and a foil trap (25) provided with a plurality of thin foils (20) that extend substantially parallel to the direction of radiation from the plasma source (20). A grid (22) is disposed between the plasma radiation source (20) and the foil trap (24). A space is located between the grid (22) and the foil trap (24). The apparatus also include an electrical potential application circuit (28) that is constructed and arranged to apply an electrical potential to the grid (22) so that the grid (22) repels electrons emitted by the plasma radiation source (22) and creates a positive space charge between the grid (20) and the foil trap (24) to deflect ions emitted by the plasma radiation source (20) to the foil trap (24).

Abstract translation: 用于形成电磁辐射束的装置包括等离子体辐射源（24）和设置有多个薄箔（20）的箔捕获器（25），其基本平行于等离子体源（20）的辐射方向延伸 ）。 栅极（22）设置在等离子体辐射源（20）和箔阱（24）之间。 一个空间位于网格（22）和箔片陷阱（24）之间。 该装置还包括电位施加电路（28），其构造和布置成向电网（22）施加电势，使得电网（22）排斥由等离子体辐射源（22）发射的电子并产生正的 格栅（20）和箔捕获器（24）之间的空间电荷以将由等离子体辐射源（20）发射的离子偏转到箔捕获器（24）。

公开(公告)号：WO2008072959A3

公开(公告)日：2008-06-19

申请号：PCT/NL2007/050598

申请日：2007-11-27

Applicant: ASML NETHERLANDS B.V. ,  WASSINK, Arnoud Cornelis ,  BANINE, Vadim Yevgenyevich ,  IVANOV, Vladimir Vitalevitch ,  KOSHELEV, Konstantin Nikolaevitch ,  CADEE, Theodorus Petrus Maria ,  KRIVTSUN, Vladimir Mihailovitch ,  KLUNDER, Derk Jan Wilfred ,  VAN HERPEN, Maarten Marinus Johannes Wilhelmus ,  BROM, Paul Peter Anna Antonius ,  SOER, Wouter Anthon ,  GLUSHKOV, Denis

Inventor： WASSINK, Arnoud Cornelis ,  BANINE, Vadim Yevgenyevich ,  IVANOV, Vladimir Vitalevitch ,  KOSHELEV, Konstantin Nikolaevitch ,  CADEE, Theodorus Petrus Maria ,  KRIVTSUN, Vladimir Mihailovitch ,  KLUNDER, Derk Jan Wilfred ,  VAN HERPEN, Maarten Marinus Johannes Wilhelmus ,  BROM, Paul Peter Anna Antonius ,  SOER, Wouter Anthon ,  GLUSHKOV, Denis

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/00

Abstract: A radiation system (1) for generating a beam of radiation (2) that defines an optical axis (3) is provided. The radiation system (1) includes a plasma produced discharge source (4) for generating EUV radiation. The discharge source (4) includes a pair of electrodes (5) constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes (5) so as to provide a discharge (7) in the plasma between the electrodes (5). The radiation system (1) also includes a debris catching shield (11) for catching debris (8) from the electrodes (5). The debris catching shield (11) is constructed and arranged to shield the electrodes (5) from a line of sight provided in a predetermined spherical angle relative the optical axis (3), and to provide an aperture (12) to a central area (10) between the electrodes (5) in the line of sight.

公开(公告)号：WO2008069654A1

公开(公告)日：2008-06-12

申请号：PCT/NL2007/050592

申请日：2007-11-26

Applicant: ASML NETHERLANDS B.V. ,  IVANOV, Vladimir, Vitalevitch ,  BANINE, Vadim, Yevgenyevich ,  KOSHELEV, Konstantin, Nikolaevitch ,  KRIVTSUN, Vladimir Mihailovitch

Inventor： IVANOV, Vladimir, Vitalevitch ,  BANINE, Vadim, Yevgenyevich ,  KOSHELEV, Konstantin, Nikolaevitch ,  KRIVTSUN, Vladimir Mihailovitch

IPC: H05G2/00

CPC classification number: H05G2/003 ,  H05G2/005

Abstract: A radiation source is disclosed that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between the anode and the cathode and to form a plasma so as to generate electromagnetic radiation, the anode and the cathode being rotatably mounted around an axis of rotation, the cathode being arranged to hold a liquid metal. The radiation source further includes an activation source arranged to direct an energy beam onto the liquid metal so as to vaporize part of the liquid metal and a liquid metal provider arranged to supply additional liquid metal so as to compensate for the vaporized part of the liquid metal.

Abstract translation: 公开了一种辐射源，其包括阳极和阴极，其构造和布置成在阳极和阴极之间的放电空间中的物质中产生放电并形成等离子体以产生电磁辐射，阳极和 阴极围绕旋转轴线可旋转地安装，阴极被布置成保持液态金属。 辐射源还包括激活源，其被布置成将能量束引导到液态金属上，以便使部分液态金属蒸发，并且液态金属提供器被布置成提供附加的液态金属，以便补偿液态金属的汽化部分 。

公开(公告)号：WO2009116867A3

公开(公告)日：2009-11-12

申请号：PCT/NL2009050132

申请日：2009-03-20

Applicant: ASML NETHERLANDS BV ,  KRIVTSUN VLADIMIR MIHAILOVITC ,  BANINE VADIM YEVGENYEVICH ,  BLEEKER ARNO JAN ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  MOORS JOHANNES HUBERTUS JOSEPH ,  CHURILOV SERGEY ,  GLUSHKOV DENIS

Inventor： KRIVTSUN VLADIMIR MIHAILOVITC ,  BANINE VADIM YEVGENYEVICH ,  BLEEKER ARNO JAN ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  CHURILOV SERGEY ,  GLUSHKOV DENIS

IPC: H05G2/00

CPC classification number: H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in a 6.8 nm range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd, or Tb, or a Tb-based composition configured to reduce a melting temperature of Tb.

Abstract translation: 目标材料被配置为用于构造和布置成产生具有6.8nm范围波长的辐射束的源。 目标材料包括配置成改变Gd或Tb的熔融温度的Gd基组合物或构造成降低Tb的熔融温度的Tb基组合物。

公开(公告)号：WO2009129960A1

公开(公告)日：2009-10-29

申请号：PCT/EP2009/002782

申请日：2009-04-16

Applicant: ASML NETHERLANDS B. V., ,  SCACCABAROZZI, Luigi ,  IVANOV, Vladimir, Vitalevitch ,  KOSHELEV, Konstantin, Nikolaevich ,  MOORS, Johannes, Hubertus, Josephina ,  STEVENS, Lucas, Henricus, Johannes ,  ANTSIFEROV, Pavel, Stanislavovich ,  KRIVTSUN, Vladimir, Mihailovitch ,  DOROKHIN, Leonid, Alexandrovich ,  VAN KAMPEN, Maarten

Inventor： SCACCABAROZZI, Luigi ,  IVANOV, Vladimir, Vitalevitch ,  KOSHELEV, Konstantin, Nikolaevich ,  MOORS, Johannes, Hubertus, Josephina ,  STEVENS, Lucas, Henricus, Johannes ,  ANTSIFEROV, Pavel, Stanislavovich ,  KRIVTSUN, Vladimir, Mihailovitch ,  DOROKHIN, Leonid, Alexandrovich ,  VAN KAMPEN, Maarten

IPC: G03F7/20

CPC classification number: G03F7/70925

Abstract: A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device is configured to impart a pattern to the beam of radiation. The apparatus includes a patterning device cleaning system configured to provide an electrostatic force to contaminant particles that are on the patterning device and that are electrically charged by the beam of radiation, in order to remove the contaminant particles from the patterning device.

Abstract translation: 光刻设备包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。 图案形成装置被配置为向辐射束施加图案。 该装置包括图案形成装置清洁系统，该图案形成装置清洁系统被配置为向图案形成装置上的污染物颗粒提供静电力，并且由辐射束对其进行带电，以便从图案形成装置移除污染物颗粒。

公开(公告)号：WO2008072966A2

公开(公告)日：2008-06-19

申请号：PCT/NL2007/050652

申请日：2007-12-14

Applicant: ASML NETHERLANDS B.V. ,  IVANOV, Vladimir Vitalevitch ,  BANINE, Vadim Yevgenyevich ,  KOSHELEV, Konstantin Nikolaevitch

Inventor： IVANOV, Vladimir Vitalevitch ,  BANINE, Vadim Yevgenyevich ,  KOSHELEV, Konstantin Nikolaevitch

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005

Abstract: A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.

Abstract translation: 将图案化的辐射束投影到基底上。 反射光学元件用于帮助从等离子体源的等离子体区域发射的辐射形成辐射束。 在等离子体源中，在等离子体区域中产生等离子体电流。 为了减少对反射光学元件的损伤，在等离子体区域中施加至少一个沿着等离子体电流的方向指向的分量的磁场。 该轴向磁场有助于限制等离子体的Z夹点区域的塌陷。 通过限制塌陷，可以减少发射的快速离子的数量。

公开(公告)号：WO2005064401A2

公开(公告)日：2005-07-14

申请号：PCT/NL2004/000928

申请日：2004-12-31

Applicant: ASML NETHERLANDS B.V. ,  BANINE, Vadim, Yevgenyevich ,  BAKKER, Levinus, Pieter ,  MOORS, Johannes, Hubertus, Josephina ,  IVANOV, Vladimir, Vitalevitch ,  ZUKAVISHVILI, Givi, Georgievitch ,  VEEFKIND, Abraham

Inventor： BANINE, Vadim, Yevgenyevich ,  BAKKER, Levinus, Pieter ,  MOORS, Johannes, Hubertus, Josephina ,  IVANOV, Vladimir, Vitalevitch ,  ZUKAVISHVILI, Givi, Georgievitch ,  VEEFKIND, Abraham

IPC: G03F7/00

CPC classification number: G03F7/70916 ,  G03F7/70983

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.

Abstract translation: 公开了一种光刻设备。 该设备包括提供辐射束的照明系统和支撑图案化结构的支撑结构。 构图结构被构造成在其横截面中赋予辐射束图案。 该设备还包括支撑衬底的衬底支撑件，将图案化的束投影到衬底的目标部分上的投影系统，以及缓解在使用该衬底的至少一部分期间形成的碎片颗粒的碎片缓解系统 光刻设备。 碎片缓解系统被布置成施加磁场，以至少减少带电碎片颗粒。