公开(公告)号：WO2011062755A3

公开(公告)日：2011-09-15

申请号：PCT/US2010055077

申请日：2010-11-02

Applicant: APPLIED MATERIALS INC ,  LUBOMIRSKY DMITRY ,  YANG JANG-GYOO ,  MILLER MATTHEW L ,  PINSON JAY D III ,  CHUC KIEN N ,  VENKATARMAN SHANKAR

Inventor： LUBOMIRSKY DMITRY ,  YANG JANG-GYOO ,  MILLER MATTHEW L ,  PINSON JAY D III ,  CHUC KIEN N ,  VENKATARMAN SHANKAR

IPC: H05H1/46 ,  H01L21/205 ,  H01L21/3065

CPC classification number: H01J37/3211 ,  H01J37/32357

Abstract: Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

Abstract translation: 本发明的实施例通常提供一种等离子体源装置及其使用方法，其能够通过使用电磁能量在对称地定位在磁芯元件周围的等离子体产生区域中产生自由基和/或气体离子 资源。 通常，等离子体生成区域和磁芯的取向和形状允许将所递送的电磁能量有效且均匀地耦合到设置在等离子体生成区域中的气体。 通常，在等离子体生成区域中形成的等离子体的改善的特性能够改善在设置在等离子体生成区域下游的衬底或处理室的一部分上执行的沉积，蚀刻和/或清洁处理。

公开(公告)号：WO2006069341A3

公开(公告)日：2006-10-12

申请号：PCT/US2005046877

申请日：2005-12-21

Applicant: APPLIED MATERIALS INC ,  ISHIKAWA TETSUYA ,  ROBERTS RICK J ,  ARMER HELEN R ,  VOLFOVSKI LEON ,  PINSON JAY D ,  RICE MICHAEL ,  QUACH DAVID H ,  SALEK MOHSEN S ,  LOWRANCE ROBERT ,  BACKER JOHN A ,  WEAVER WILLIAM TYLER ,  CARLSON CHARLES ,  WANG CHONGYANG ,  HUDGENS JEFFREY ,  HERCHEN HARALD ,  LUE BRIAN

Inventor： ISHIKAWA TETSUYA ,  ROBERTS RICK J ,  ARMER HELEN R ,  VOLFOVSKI LEON ,  PINSON JAY D ,  RICE MICHAEL ,  QUACH DAVID H ,  SALEK MOHSEN S ,  LOWRANCE ROBERT ,  BACKER JOHN A ,  WEAVER WILLIAM TYLER ,  CARLSON CHARLES ,  WANG CHONGYANG ,  HUDGENS JEFFREY ,  HERCHEN HARALD ,  LUE BRIAN

IPC: H01L21/00

CPC classification number: H01L21/67167 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  H01L21/67754 ,  H01L21/67766 ,  H01L21/67781

Abstract: Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased throughput, increased reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also has a smaller system footprint. In one embodiment of the cluster tool, the cost of ownership is reduced by grouping substrates together and transferring and processing the substrates in groups of two or more to improve system throughput, and reduces the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, thus reducing wear on the robot and increasing system reliability. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.

Abstract translation: 实施例通常提供一种用于使用具有增加的吞吐量，增加的可靠性的多腔室处理系统（例如，集群工具）来处理衬底的装置和方法，在群集工具中处理的衬底具有更可重复的晶片历史，并且还具有 较小的系统占用空间。 在集群工具的一个实施例中，通过将基板分组在一起并以两个或更多个组的方式传送和处理基板来降低所有权成本，以提高系统吞吐量，并且减少机器人必须进行的转移批次的移动次数 的处理室之间的基板，从而减少机器人的磨损并提高系统的可靠性。 实施例还提供了用于增加衬底转移过程以减少系统停机时间的可靠性的方法和装置。

公开(公告)号：WO2006069341A2

公开(公告)日：2006-06-29

申请号：PCT/US2005/046877

申请日：2005-12-21

Applicant: APPLIED MATERIALS, INC. ,  ISHIKAWA, Tetsuya ,  ROBERTS, Rick, J. ,  ARMER, Helen, R. ,  VOLFOVSKI, Leon ,  PINSON, Jay, D. ,  RICE, Michael ,  QUACH, David, H. ,  SALEK, Mohsen, S. ,  LOWRANCE, Robert ,  BACKER, John, A. ,  WEAVER, William, Tyler ,  CARLSON, Charles ,  WANG, Chongyang ,  HUDGENS, Jeffrey ,  HERCHEN, Harald ,  LUE, Brian

Inventor： ISHIKAWA, Tetsuya ,  ROBERTS, Rick, J. ,  ARMER, Helen, R. ,  VOLFOVSKI, Leon ,  PINSON, Jay, D. ,  RICE, Michael ,  QUACH, David, H. ,  SALEK, Mohsen, S. ,  LOWRANCE, Robert ,  BACKER, John, A. ,  WEAVER, William, Tyler ,  CARLSON, Charles ,  WANG, Chongyang ,  HUDGENS, Jeffrey ,  HERCHEN, Harald ,  LUE, Brian

IPC: H01L21/00

CPC classification number: H01L21/67167 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  H01L21/67754 ,  H01L21/67766 ,  H01L21/67781

Abstract: Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased throughput, increased reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also has a smaller system footprint. In one embodiment of the cluster tool, the cost of ownership is reduced by grouping substrates together and transferring and processing the substrates in groups of two or more to improve system throughput, and reduces the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, thus reducing wear on the robot and increasing system reliability. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.

Abstract translation: 实施方式通常提供了一种用于使用多室处理系统（例如，群集工具）来处理衬底的设备和方法，所述多室处理系统具有增加的生产量，增加的可靠性，在群集工具中处理的衬底具有更多 可重复的晶圆历史，并且还具有较小的系统尺寸。 在群集工具的一个实施例中，通过将衬底分组在一起并且以两个或更多个成组的方式传送和处理衬底来降低所有权成本，以提高系统吞吐量，并且减少机器人为了传送批次而必须做出的移动次数 的处理室之间的基板，从而减少了机器人的磨损并提高了系统的可靠性。 实施例还提供了用于增加衬底传输过程的可靠性以减少系统停机时间的方法和设备。

公开(公告)号：WO2011062755A2

公开(公告)日：2011-05-26

申请号：PCT/US2010/055077

申请日：2010-11-02

Applicant: APPLIED MATERIALS, INC. ,  LUBOMIRSKY, Dmitry ,  YANG, Jang-Gyoo ,  MILLER, Matthew L. ,  PINSON, Jay D., III ,  CHUC, Kien N. ,  VENKATARMAN, Shankar

Inventor： LUBOMIRSKY, Dmitry ,  YANG, Jang-Gyoo ,  MILLER, Matthew L. ,  PINSON, Jay D., III ,  CHUC, Kien N. ,  VENKATARMAN, Shankar

IPC: H05H1/46 ,  H01L21/3065 ,  H01L21/205

CPC classification number: H01J37/3211 ,  H01J37/32357

Abstract: Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

Abstract translation: 本发明的实施例通常提供一种等离子体源装置及其使用方法，其能够通过使用电磁能量在等离子体产生区域内产生自由基和/或气体离子，所述等离子体产生区域围绕磁芯元件对称地定位 资源。 通常，等离子体产生区域和磁芯的取向和形状允许将输送的电磁能量有效均匀地耦合到设置在等离子体产生区域中的气体。 通常，等离子体产生区域中形成的等离子体的改进的特性能够改善在设置在等离子体产生区域下游的衬底或处理室的一部分上进行的沉积，蚀刻和/或清洁过程。

公开(公告)号：WO2008031031A2

公开(公告)日：2008-03-13

申请号：PCT/US2007/077883

申请日：2007-09-07

Applicant: APPLIED MATERIALS, INC. ,  ENGLHARDT, Eric A. ,  RICE, Michael R. ,  HUDGENS, Jeffrey C. ,  HONGKHAM, Steve ,  PINSON, Jay D. ,  SALEK, Mohsen ,  CARLSON, Charles ,  WEAVER, William T. ,  ARMER, Helen R.

Inventor： ENGLHARDT, Eric A. ,  RICE, Michael R. ,  HUDGENS, Jeffrey C. ,  HONGKHAM, Steve ,  PINSON, Jay D. ,  SALEK, Mohsen ,  CARLSON, Charles ,  WEAVER, William T. ,  ARMER, Helen R.

IPC: B65H1/00 ,  C23F1/00 ,  H01L21/306 ,  C23C16/00

CPC classification number: G03F7/70991 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67742 ,  H01L21/67745

Abstract: The present invention generally provides an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that is easily configurable, has an increased system throughput, increased system reliability, improved device yield performance, a more repeatable wafer processing history (or wafer history), and a reduced footprint. In one embodiment, the cluster tool is adapted to perform a track lithography process in which a substrate is coated with a photosensitive material, is then transferred to a stepper/scanner, which exposes the photosensitive material to some form of radiation to form a pattern in the photosensitive material, and then certain portions of the photosensitive material are removed in a developing process completed in the cluster tool.

Abstract translation: 本发明总体上提供了一种用于使用容易配置的多室处理系统（例如，集群工具）处理衬底的装置和方法，具有增加的系统吞吐量，增加的系统可靠性，改进的器件产量性能，更可重复的晶片 处理历史（或晶圆历史），减少占地面积。 在一个实施例中，簇工具适于执行其中衬底被感光材料涂覆的轨道光刻工艺，然后转移到步进/扫描器，其将感光材料暴露于某种形式的辐射以形成图案 感光材料，然后在簇组工具中完成的显影过程中去除感光材料的某些部分。

公开(公告)号：WO2011063146A3

公开(公告)日：2011-11-24

申请号：PCT/US2010057274

申请日：2010-11-18

Applicant: APPLIED MATERIALS INC ,  LUBOMIRSKY DMITRY ,  YANG JANG-GYOO ,  MILLER MATTHEW L ,  PINSON JAY D III ,  CHUC KIEN N

Inventor： LUBOMIRSKY DMITRY ,  YANG JANG-GYOO ,  MILLER MATTHEW L ,  PINSON JAY D III ,  CHUC KIEN N

IPC: H05H1/46 ,  H01L21/3065

CPC classification number: H01J37/3211 ,  H01J37/32357

Abstract: Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

公开(公告)号：WO2011063146A2

公开(公告)日：2011-05-26

申请号：PCT/US2010/057274

申请日：2010-11-18

Applicant: APPLIED MATERIALS, INC. ,  LUBOMIRSKY, Dmitry ,  YANG, Jang-Gyoo ,  MILLER, Matthew L. ,  PINSON, Jay D., III ,  CHUC, Kien N.

Inventor： LUBOMIRSKY, Dmitry ,  YANG, Jang-Gyoo ,  MILLER, Matthew L. ,  PINSON, Jay D., III ,  CHUC, Kien N.

IPC: H05H1/46 ,  H01L21/3065

CPC classification number: H01J37/3211 ,  H01J37/32357

Abstract: Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

Abstract translation: 本发明的实施例通常提供一种等离子体源装置及其使用方法，其能够在等离子体产生区中产生自由基和/或气体离子，该等离子体产生区对称地位于磁体 核心元件通过使用电磁能源。 通常，等离子体生成区域和磁芯的取向和形状允许将所递送的电磁能量有效且均匀地耦合到设置在等离子体生成区域中的气体。 通常，在等离子体生成区域中形成的等离子体的改善的特性能够改善在布置在等离子体生成区域下游的衬底或处理室的一部分上执行的沉积，蚀刻和/或清洁过程。 p>

公开(公告)号：WO2008031031A3

公开(公告)日：2009-03-05

申请号：PCT/US2007077883

申请日：2007-09-07

Applicant: APPLIED MATERIALS INC ,  ENGLHARDT ERIC A ,  RICE MICHAEL R ,  HUDGENS JEFFREY C ,  HONGKHAM STEVE ,  PINSON JAY D ,  SALEK MOHSEN ,  CARLSON CHARLES ,  WEAVER WILLIAM T ,  ARMER HELEN R

Inventor： ENGLHARDT ERIC A ,  RICE MICHAEL R ,  HUDGENS JEFFREY C ,  HONGKHAM STEVE ,  PINSON JAY D ,  SALEK MOHSEN ,  CARLSON CHARLES ,  WEAVER WILLIAM T ,  ARMER HELEN R

IPC: B65H1/00

CPC classification number: G03F7/70991 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67742 ,  H01L21/67745

Abstract: The present invention generally provides an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that is easily configurable, has an increased system throughput, increased system reliability, improved device yield performance, a more repeatable wafer processing history (or wafer history), and a reduced footprint. In one embodiment, the cluster tool is adapted to perform a track lithography process in which a substrate is coated with a photosensitive material, is then transferred to a stepper/scanner, which exposes the photosensitive material to some form of radiation to form a pattern in the photosensitive material, and then certain portions of the photosensitive material are removed in a developing process completed in the cluster tool.

Abstract translation: 本发明总体上提供了一种用于使用容易配置的多室处理系统（例如，集群工具）处理衬底的装置和方法，具有增加的系统吞吐量，增加的系统可靠性，改进的器件产量性能，更可重复的晶片 处理历史（或晶圆历史），减少占地面积。 在一个实施例中，簇工具适于执行其中衬底被感光材料涂覆的轨道光刻工艺，然后转移到步进/扫描器，其将感光材料暴露于某种形式的辐射以形成图案 感光材料，然后在簇组工具中完成的显影过程中去除感光材料的某些部分。