公开(公告)号：WO2016114863A1

公开(公告)日：2016-07-21

申请号：PCT/US2015/064264

申请日：2015-12-07

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC.

Inventor： HUNG, Yu-Lung ,  WANG, Hsuan Han ,  CHEN, Ming-Fa

IPC: B81B7/00 ,  G02B26/08 ,  G02B26/00

CPC classification number: G02F1/0107 ,  B32B7/14 ,  B32B17/00 ,  B32B37/0015 ,  B32B37/0076 ,  B32B37/1018 ,  B32B37/1292 ,  B32B37/18 ,  B32B38/10 ,  B32B2255/26 ,  B32B2307/40 ,  B32B2309/10 ,  B32B2309/12 ,  B32B2310/04 ,  B32B2363/00 ,  B32B2457/20 ,  B81B7/0051 ,  B81B2201/047 ,  G02B26/001 ,  G02B26/0841 ,  G02F1/21

Abstract: This disclosure provides devices, systems, and methods for reducing substrate warpage in a display device. In one aspect, the display device includes a device substrate and a cover substrate, where the device substrate includes one or more display elements and the cover substrate includes a device cavity extending partially through the cover substrate. At least one of the display elements may be sealed by a primary seal in contact with and between the cover substrate and the device substrate to define a device area. A dummy area outside of the device area may be defined between the primary seal and a secondary seal, where the secondary seal is also in contact with and between the cover substrate and the device substrate. The display device may further include a dummy cavity extending partially through the cover substrate in the dummy area.

Abstract translation: 本公开提供了用于减少显示装置中的基板翘曲的装置，系统和方法。 在一个方面，显示设备包括设备基板和盖基板，其中设备基板包括一个或多个显示元件，并且盖基板包括部分延伸穿过盖基板的器件空腔。 显示元件中的至少一个可以通过与盖衬底和器件衬底接触并且在盖衬底和器件衬底之间的初级密封件密封，以限定器件区域。 设备区域之外的虚拟区域可以被限定在主密封件和次级密封件之间，其中辅助密封件也与盖子基板和装置基板接触并且在其之间。 显示装置还可以包括在虚拟区域中部分延伸穿过覆盖基板的虚拟空腔。

公开(公告)号：WO2016111805A1

公开(公告)日：2016-07-14

申请号：PCT/US2015/065104

申请日：2015-12-10

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC.

Inventor： BECKMAN, Robert Anderson ,  WEN, Bing

IPC: G09G3/36 ,  G09G3/34

CPC classification number: G02B26/001 ,  G09G3/3466 ,  G09G2300/0426 ,  G09G2310/0254 ,  G09G2320/0209

Abstract: This disclosure provides systems and apparatus for an arrangement of pixels and interconnects in a display. In one aspect, interconnect for the arrangement of pixels may be routed to reduce parasitic capacitance.

Abstract translation: 本公开提供了用于在显示器中排列像素和互连的系统和装置。 在一个方面，用于排列像素的互连可被路由以减小寄生电容。

公开(公告)号：WO2016048700A1

公开(公告)日：2016-03-31

申请号：PCT/US2015/050006

申请日：2015-09-14

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC.

Inventor： HONG, John Hyunchul ,  FUNG, Tze-Ching ,  KIM, Cheonhong ,  NOMURA, Kenji

IPC: H01L29/66 ,  H01L29/786

CPC classification number: H01L21/02664 ,  H01L21/02565 ,  H01L29/66969 ,  H01L29/78693

Abstract: This disclosure provides methods and apparatuses for annealing an oxide semiconductor in a thin film transistor (TFT). In one aspect, the method includes providing a substrate with a partially fabricated TFT structure formed on the substrate. The partially fabricated TFT structure can include an oxide semiconductor layer and a dielectric oxide layer on the oxide semiconductor layer. The oxide semiconductor layer is annealed by heating the dielectric oxide layer with an infrared laser under ambient conditions to a temperature below the melting temperature of the oxide semiconductor layer. The infrared laser radiation can be substantially absorbed by the dielectric oxide layer and can remove unwanted defects from the oxide semiconductor layer at an interface in contact with the dielectric oxide layer.

Abstract translation: 本公开提供了在薄膜晶体管（TFT）中退火氧化物半导体的方法和装置。 在一个方面，该方法包括提供在基板上形成的部分制造的TFT结构的基板。 部分制造的TFT结构可以包括在氧化物半导体层上的氧化物半导体层和电介质氧化物层。 氧化物半导体层通过在环境条件下用红外激光器将电介质氧化物层加热到低于氧化物半导体层的熔融温度的温度来退火。 红外激光辐射可以被电介质氧化物层基本上吸收，并且可以在与电介质氧化物层接触的界面处从氧化物半导体层去除不想要的缺陷。

公开(公告)号：WO2016007247A1

公开(公告)日：2016-01-14

申请号：PCT/US2015/034154

申请日：2015-06-04

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC

Inventor： HONG, John Hyunchul ,  MA, Jian Jim

IPC: G02B26/00 ,  G02B3/00 ,  G02F1/1335 ,  H04N9/31

CPC classification number: G02B3/0068 ,  G02B3/0006 ,  G02B3/0062 ,  G02B26/001 ,  G09G3/3466 ,  G09G2300/0439

Abstract: Disclosed herein is a dual lens system capable of maintaining a substantially constant color within a well-defined angular range of light incident on a reflective pixel. Each reflective pixel (or subpixel) of a display may include a primary lens and a field lens. The field lens may be positioned at a distance equal to a focal length of the primary lens. Each plane wave of incident light arriving at the primary lens aperture may be focused on a unique location of the focal plane, but may emerge from the field lens within the same range of angles. If a reflective pixel is positioned below the field lens, the reflected color should be substantially the same within a range of viewing angles. The range of angles may be defined by the numerical aperture of the lens system and by black mask material disposed between the reflective pixels or subpixels. Thus, a reflective display includes an array of reflective pixels; an array of primary lenses, each of the primary lenses corresponding to a distinct one of the reflective pixels; and an array of field lenses, each of the field lenses corresponding to a distinct one of the reflective pixels and one of the primary lenses, each of the field lenses being positioned at a distance from a corresponding primary lens, the distance being a focal length of the corresponding primary lens, each of the field lenses being disposed proximate a corresponding reflective pixel.

Abstract translation: 本文公开了一种双透镜系统，其能够在入射在反射像素上的光的明确的角度范围内保持基本上恒定的颜色。 显示器的每个反射像素（或子像素）可以包括主透镜和场透镜。 场透镜可以被定位在等于主透镜的焦距的距离处。 到达主透镜孔的入射光的每个平面波可以聚焦在焦平面的唯一位置上，但是可以在相同的角度范围内从场透镜出射。 如果反射像素位于场透镜下方，则反射颜色应在视角范围内基本相同。 角度的范围可以由透镜系统的数值孔径和设置在反射像素或子像素之间的黑色掩模材料限定。 因此，反射显示器包括反射像素阵列; 主要透镜阵列，每个主要透镜对应于不同的一个反射像素; 和场透镜阵列，每个场透镜对应于反射像素中的不同一个和主透镜中的一个，每个场透镜位于与相应主透镜一定距离处，该距离为焦距 对应的主透镜，每个场透镜被设置在相应的反射像素附近。

公开(公告)号：WO2015183524A1

公开(公告)日：2015-12-03

申请号：PCT/US2015/029997

申请日：2015-05-08

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC.

Inventor： VAN LIER, Wilhelmus Johannes Robertus ,  CHAN, Edward Keat Leem ,  KIM, Cheonhong ,  WEN, Bing

IPC: G09G3/34 ,  G02B26/08

CPC classification number: G09G3/3466 ,  G02B26/001 ,  G02B26/0841 ,  G09G2300/0421 ,  G09G2300/0426 ,  G09G2300/08 ,  G09G2300/0809 ,  G09G2310/0251 ,  G09G2310/0256 ,  G09G2310/06 ,  G09G2310/061

Abstract: A display apparatus comprising an array of electromechanical display elements and a driver circuit coupled to the array is provided. The driver circuit is configured to apply a DC voltage to a first stationary electrode of the display element and adjust a bias voltage applied to a second stationary electrode of the display element from a first bias voltage to a second bias voltage before a reset period. The driver circuit is further configured to apply a first reset voltage to a movable electrode of the display element during the reset period, apply a write voltage to the movable electrode during a charging period to charge the movable electrode with a charge Q defined at least in part by the write voltage, and adjust the bias voltage applied to the second stationary electrode from the second bias voltage to a third bias voltage during a bias period.

Abstract translation: 提供了包括机电显示元件阵列和耦合到阵列的驱动电路的显示装置。 驱动电路被配置为向显示元件的第一固定电极施加DC电压，并且在复位周期之前将施加到显示元件的第二固定电极的偏置电压从第一偏置电压调整到第二偏置电压。 驱动器电路还被配置为在复位期间向显示元件的可动电极施加第一复位电压，在充电期间向可动电极施加写入电压，以对至少在 部分由写入电压，并且在偏置周期期间将施加到第二固定电极的偏置电压从第二偏置电压调整到第三偏置电压。

公开(公告)号：WO2015183520A1

公开(公告)日：2015-12-03

申请号：PCT/US2015/029880

申请日：2015-05-08

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC.

Inventor： KIM, Cheonhong ,  KAO, Tsongming ,  MA, Jian Jim ,  ZHOU, Lixia ,  CHANG, Tallis Young ,  CHEN, Shu-Jhih ,  HONG, John Hyunchul

IPC: H01L27/12 ,  H01L29/786 ,  G02B26/00

CPC classification number: G02B26/001 ,  G02B5/003 ,  G02B5/208 ,  H01L27/1214 ,  H01L27/1248 ,  H01L27/1259 ,  H01L29/78633

Abstract: A display assembly includes an array of display elements disposed between a first substrate and a second substrate, the array of display elements including one or more thin film transistors (TFTs). A black mask arrangement is disposed between the first substrate and the second substrate, the black mask arrangement being configured to prevent light entering the display assembly from reaching the TFTs.

Abstract translation: 显示组件包括布置在第一衬底和第二衬底之间的显示元件阵列，显示元件阵列包括一个或多个薄膜晶体管（TFT）。 黑色掩模布置设置在第一基板和第二基板之间，黑色掩模布置被配置为防止进入显示器组件的光到达TFT。

公开(公告)号：WO2015102710A2

公开(公告)日：2015-07-09

申请号：PCT/US2014/059734

申请日：2014-10-08

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC.

Inventor： VAN LIER, Wilhelmus Johannes Robertus ,  KAWAMOTO, Robert Steven ,  EDGAR, James Steven ,  VARMA, Pramod Kumar

IPC: G09G3/34

CPC classification number: G01R27/2605 ,  G01D5/241 ,  G09G3/3466 ,  G09G2320/04

Abstract: This disclosure provides systems, methods and apparatus for measuring capacitance of a display unit, such as an interferometric modulator (IMOD). In one example, a circuit may include an operational amplifier (op-amp), a voltage controlled current source, and feedback from an output of the op-amp as an input to the voltage controlled current source. An output of the voltage controlled current source may be provided to a display unit as well as an input of the op-amp. A second input of the op-amp may be provided a ramping reference voltage.

Abstract translation: 本公开提供了用于测量诸如干涉式调制器（IMOD）的显示单元的电容的系统，方法和装置。 在一个示例中，电路可以包括运算放大器（运算放大器），电压控制电流源和来自运算放大器的输出的反馈作为输入到电压控制电流源。 电压控制电流源的输出可以被提供给显示单元以及运算放大器的输入。 运算放大器的第二输入可以被提供斜坡参考电压。

公开(公告)号：WO2015061096A1

公开(公告)日：2015-04-30

申请号：PCT/US2014/060658

申请日：2014-10-15

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC.

Inventor： HONG, Brandon John ,  MA, Jian ,  HONG, John Hyunchul ,  WEN, Bing ,  CHANG, Tallis Young

IPC: B81C1/00

CPC classification number: C01B33/113 ,  B81C1/00031 ,  G02B5/00

Abstract: The disclosed technology relates to methods of patterning elongated structures. In one aspect, a method of forming pillars includes providing a substrate and providing a plurality of beads on a surface of the substrate. Regions of the surface without a directly overlying bead are exposed. The method additionally includes selectively etching the exposed regions of the substrate between the beads such that a plurality of pillars is formed under areas masked by the beads. Selectively etching completely removes at least some of the beads. The pillars that are not covered by beads are etched, thereby leaving some pillars taller than others, with the pillar height pending on the amount of time a pillar was left exposed to etchant by a removed bead.

Abstract translation: 所公开的技术涉及图案化细长结构的方法。 一方面，形成支柱的方法包括提供基底并在基底的表面上提供多个珠粒。 暴露出没有直接覆盖珠的表面区域。 该方法还包括选择性地蚀刻珠之间的衬底的暴露区域，使得多个柱形成在由珠掩蔽的区域之下。 选择性蚀刻完全除去珠粒中的至少一些。 没有被珠子覆盖的柱子被蚀刻，从而留下一些比其他柱子更高的柱子，其中柱子高度等待通过移除的珠子将柱子暴露于蚀刻剂的时间量。

公开(公告)号：WO2015057513A1

公开(公告)日：2015-04-23

申请号：PCT/US2014/060062

申请日：2014-10-10

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC.

Inventor： KARRI, Jyothi ,  BITA, Ion ,  MA, Jian Jim ,  PATEL, Sapna ,  WANG, Lai

IPC: G02B3/00 ,  G02B5/02 ,  G02B26/00

CPC classification number: G02B3/0037 ,  G02B1/11 ,  G02B1/12 ,  G02B3/0043 ,  G02B3/0056 ,  G02B5/021 ,  G02B5/0236 ,  G02B26/001

Abstract: A diffuser stack may include a first film with a first index of refraction and a second film proximate the first film. The second film may have a second index of refraction that is higher than the first index of refraction. An interface between the first film and the second film may include an array of microlenses of substantially randomized sizes. The microlenses may include sections of features that are substantially spherical, polygonal, conical, etc. The first and second films may be disposed between an array of pixels and a substantially transparent substrate. An anti-reflective layer may be disposed between the first film and the second film.

Abstract translation: 扩散器堆叠可以包括具有第一折射率的第一膜和靠近第一膜的第二膜。 第二膜可以具有高于第一折射率的第二折射率。 第一膜和第二膜之间的界面可以包括基本上随机化的尺寸的微透镜阵列。 微透镜可以包括基本上是球形，多边形，圆锥形等的特征部分。第一和第二膜可以设置在像素阵列和基本上透明的基板之间。 抗反射层可以设置在第一膜和第二膜之间。

公开(公告)号：WO2015053974A1

公开(公告)日：2015-04-16

申请号：PCT/US2014/058024

申请日：2014-09-29

Applicant: QUALCOMM MEMS TECHNOLOGIES, INC.

Inventor： LI, Kebin ,  LI, Zhengwu ,  MA, Jian Jim ,  HONG, John Hyunchul

IPC: F21V8/00 ,  G02B6/00

CPC classification number: G02B6/005 ,  G02B6/0065 ,  Y10T29/49982

Abstract: This disclosure provides systems, methods and apparatus for an illumination system. In one aspect, the illumination system is a light guide (101) that includes spaced-apart regions of medium (205a, 205b, 205c and 205d) containing diffractive features. For example, the medium may include holographic medium having holograms that are configured to redirect light (140), propagating through the light guide (101), out of the light guide (101). The spaces (209a, 209b, 209c and 209d) between the spaced-apart regions of media (205a, 205b, 205c and 205d) may be filled with a material having a lower refractive index than the light guide, thereby functioning as a reflective cladding in those spaces.

Abstract translation: 本公开提供了用于照明系统的系统，方法和装置。 在一个方面，照明系统是包括包含衍射特征的介质（205a，205b，205c和205d）的间隔开的区域的光导（101）。 例如，介质可以包括具有全息图的全息介质，该全息图被配置为将光（140）重新引导通过光导（101）传出光导（101）。 介质（205a，205b，205c和205d）的间隔开的区域之间的空间（209a，209b，209c和209d）可以用折射率低于导光体的材料填充，从而用作反射包层 在那些空间。