公开(公告)号：WO2007005511A3

公开(公告)日：2007-06-14

申请号：PCT/US2006025349

申请日：2006-06-28

Applicant: CYMER INC ,  REILEY DANIEL J ,  RYLOV GERMAN E ,  BERGSTEDT ROBERT A

Inventor： REILEY DANIEL J ,  RYLOV GERMAN E ,  BERGSTEDT ROBERT A

IPC: H01S3/10

CPC classification number: G03F7/70575 ,  G03F7/70025 ,  H01S3/005 ,  H01S3/08036 ,  H01S3/106 ,  H01S3/137 ,  H01S3/225

Abstract: In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range and increase a bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is above the predetermined bandwidth range. In another aspect an active bandwidth control system may include an optic for altering a wavefront of a laser beam in a laser cavity of the laser source to selectively adjust an output laser bandwidth in response to the control signal. In yet another aspect, the bandwidth of a laser having a wavelength variation across an aperture may be actively controlled by an aperture blocking element that is moveable to adjust a size of the aperture.

Abstract translation: 在第一方面，光刻设备可以包括使用光学邻近校正（OPC），脉冲激光源和有源带宽控制系统设计的掩模，该有源带宽控制系统被配置为响应于测量的脉冲带宽而增加后续脉冲的带宽， 低于预定带宽范围，并且响应于高于预定带宽范围的测量脉冲带宽增加随后脉冲的带宽。 在另一方面，有源带宽控制系统可以包括用于改变激光源的激光腔中的激光束的波前的光学器件，用于响应于控制信号选择性地调节输出激光器带宽。 在另一方面，具有穿过孔的波长变化的激光器的带宽可以由可移动以调节孔径的孔径阻挡元件主动地控制。

公开(公告)号：WO2006060360A3

公开(公告)日：2006-10-26

申请号：PCT/US2005043056

申请日：2005-11-28

Applicant: CYMER INC ,  ALGOTS MARTIN J ,  BERGSTEDT ROBERT A ,  GILLESPIE WALTER D ,  KULGEYKO VLADIMIR A ,  PARTLO WILLIAM N ,  RYLOV GERMAN E ,  SANDSTROM RICHARD L ,  STRATE BRIAN D ,  DYER TIMOTHY S

Inventor： ALGOTS MARTIN J ,  BERGSTEDT ROBERT A ,  GILLESPIE WALTER D ,  KULGEYKO VLADIMIR A ,  PARTLO WILLIAM N ,  RYLOV GERMAN E ,  SANDSTROM RICHARD L ,  STRATE BRIAN D ,  DYER TIMOTHY S

IPC: H01S3/22

CPC classification number: H01S3/1055 ,  G03F7/70025 ,  G03F7/70041 ,  H01S3/005 ,  H01S3/036 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/106 ,  H01S3/2251

Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength.

Abstract translation: 一种用于窄带DUV大功率高重复率气体放电激光器的线窄化方法和模块，其产生具有标称光路的脉冲串中的输出激光束脉冲束脉冲，其可以包括：分散中心波长选择光学器件 可移动地安装在线路窄化模块的光路内，为至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定的每个脉冲选择至少一个中心波长; 第一调谐机构部分地通过选择包含脉冲朝向分散中心的激光束的透射角度来选择包含分散中心波长选择光学器件上的各个脉冲的激光束的入射角 波长选择光学; 第二调谐机构部分地通过改变色散中心波长选择光学器件相对于线条变窄模块的标称光路的位置来选择包含相应脉冲的激光束的入射角; 其中第二调谐机构粗略地选择中心波长的值，并且第一调谐机构更精细地选择中心波长的值。

公开(公告)号：WO2005046011A3

公开(公告)日：2005-12-22

申请号：PCT/US2004035671

申请日：2004-10-27

Applicant: CYMER INC ,  SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  BROWN DANIEL J W ,  YAGER THOMAS A ,  ERSHOV ALEXANDER I ,  RAFAC ROBERT J ,  RYLOV GERMAN E

Inventor： SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  BROWN DANIEL J W ,  YAGER THOMAS A ,  ERSHOV ALEXANDER I ,  RAFAC ROBERT J ,  RYLOV GERMAN E

IPC: B23K26/06 ,  B23K26/40 ,  G01J1/42 ,  G01J9/02 ,  G02B26/00 ,  G02B26/08 ,  G03F7/20 ,  H01S20060101 ,  H01S3/00 ,  H01S3/1055 ,  H01S3/22 ,  H01S3/225

CPC classification number: G01J1/429 ,  B23K26/0622 ,  B23K2201/40 ,  G01J9/02 ,  G02B26/002 ,  G02B26/0875 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/1055 ,  H01S3/225

Abstract: An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.

Abstract translation: 公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲束产生系统的装置和方法，产生包括选定脉冲重复频率的激光输出光脉冲的光束，其可以包括：色散中心波长选择光学选择 用于每个脉冲的至少一个中心波长至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定; 调谐机构，用于在分散中心波长选择光学器件上选择包含相应脉冲的激光束脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光束的所述第一空间限定部分的多个折射角位移通过所述可变折射光学元件在所述激光的入射的多个位置中的一个位置 脉冲光束在可变折射光学元件上。 可变折射光学元件可以包括：限定用于激光束脉冲束的入射面的第一大致平坦的面; 以及限定用于激光束的出口的多个大致平坦的表面或出口的连续变化的表面的第二多面或弯曲面。 脉冲参数测量和脉冲调制控制的其他方面包括响应于来自利用工具的信号，例如涉及具有不同中心波长光谱的适当剂量控制。

公开(公告)号：WO2007005511A2

公开(公告)日：2007-01-11

申请号：PCT/US2006/025349

申请日：2006-06-28

Applicant: CYMER, INC. ,  REILEY, Daniel, J. ,  RYLOV, German, E. ,  BERGSTEDT, Robert, A.

Inventor： REILEY, Daniel, J. ,  RYLOV, German, E. ,  BERGSTEDT, Robert, A.

IPC: A61N5/00

CPC classification number: G03F7/70575 ,  G03F7/70025 ,  H01S3/005 ,  H01S3/08036 ,  H01S3/106 ,  H01S3/137 ,  H01S3/225

Abstract: In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range and increase a bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is above the predetermined bandwidth range. In another aspect an active bandwidth control system may include an optic for altering a wavefront of a laser beam in a laser cavity of the laser source to selectively adjust an output laser bandwidth in response to the control signal. In yet another aspect, the bandwidth of a laser having a wavelength variation across an aperture may be actively controlled by an aperture blocking element that is moveable to adjust a size of the aperture.

Abstract translation: 在第一方面，光刻设备可以包括使用光学邻近校正（OPC），脉冲激光源和有源带宽控制系统设计的掩模，该有源带宽控制系统被配置为增加后续脉冲的带宽 响应于低于预定带宽范围的测量脉冲带宽并且响应于高于预定带宽范围的测量脉冲带宽来增加后续脉冲的带宽。 在另一方面，有源带宽控制系统可以包括用于改变激光源的激光腔中的激光束的波阵面的光学器件，以响应于控制信号选择性地调整输出激光器带宽。 在又一个方面中，具有穿过孔径的波长变化的激光器的带宽可以由可移动以调节孔径尺寸的孔径阻挡元件主动控制。

公开(公告)号：WO2006060360A2

公开(公告)日：2006-06-08

申请号：PCT/US2005/043056

申请日：2005-11-28

Applicant: CYMER, INC. ,  ALGOTS, Martin, J. ,  BERGSTEDT, Robert, A. ,  GILLESPIE, Walter, D. ,  KULGEYKO, Vladimir, A. ,  PARTLO, William, N. ,  RYLOV, German, E. ,  SANDSTROM, Richard. L. ,  STRATE, Brian, D. ,  DYER, Timothy, S.

Inventor： ALGOTS, Martin, J. ,  BERGSTEDT, Robert, A. ,  GILLESPIE, Walter, D. ,  KULGEYKO, Vladimir, A. ,  PARTLO, William, N. ,  RYLOV, German, E. ,  SANDSTROM, Richard. L. ,  STRATE, Brian, D. ,  DYER, Timothy, S.

IPC: H01S3/22

CPC classification number: H01S3/1055 ,  G03F7/70025 ,  G03F7/70041 ,  H01S3/005 ,  H01S3/036 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/106 ,  H01S3/2251

Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength.

Abstract translation: 公开了一种用于窄脉冲DUV高功率高重复频率气体放电激光器的线窄化方法和模块，其以脉冲串的脉冲产生输出激光脉冲束脉冲，该模块具有标称光路，其可以 包括：色散中心波长选择光学器件，可移动地安装在所述线缩窄模块的光路内，为每个脉冲选择至少一个中心波长，所述每个脉冲至少部分由包含相应脉冲的激光脉冲束的入射角确定 色散波长选择光学器件; 第一调谐机构部分地工作以通过选择包含朝向色散中心的脉冲的激光脉冲束的传输角度来选择包含相应脉冲的激光脉冲束在色散中心波长选择光学器件上的入射角 波长选择镜片; 第二调谐机构，其部分地操作以通过相对于所述线缩窄模块的标称光路改变所述色散中心波长选择光学器件的位置来选择包含相应脉冲的所述激光脉冲束的入射角; 其中第二调谐机构粗略地选择中心波长的值，并且第一调谐机构更精细地选择中心波长的值。

公开(公告)号：WO2005046011A2

公开(公告)日：2005-05-19

申请号：PCT/US2004/035671

申请日：2004-10-27

Applicant: CYMER, INC. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  BROWN, Daniel, J., W. ,  YAGER, Thomas, A. ,  ERSHOV, Alexander I. ,  RAFAC, Robert, J. ,  RYLOV, German, E.

Inventor： SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  BROWN, Daniel, J., W. ,  YAGER, Thomas, A. ,  ERSHOV, Alexander I. ,  RAFAC, Robert, J. ,  RYLOV, German, E.

IPC: H01S

CPC classification number: G01J1/429 ,  B23K26/0622 ,  B23K2201/40 ,  G01J9/02 ,  G02B26/002 ,  G02B26/0875 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/1055 ,  H01S3/225

Abstract: An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a dispersive center wavelength selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of a first spatially defined portion of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; and, the tuning mechanism comprising a variably refractive optical element defining a plurality of refractive angular displacements of the first spatially defined portion of the laser light pulse beam passing through the variably refractive optical element at one of a plurality of positions of incidence of the laser light pulse beam on the variably refractive optical element. The variably refractive optical element may comprise: a first generally flat face defining a surface of incidence for the laser light pulse beam; and, a second multifaceted or curved face defining a plurality of generally flat surfaces of exit or a continuously varying surface of exit for the laser light beam. Other aspects of pulse parameter metrology and pulse modulation control, including in response to signals from the utilization tool are disclosed, e.g., relating to proper dose control with differing center wavelength spectra.

Abstract translation: 公开了一种用于操作窄带短脉冲持续时间气体放电激光输出光脉冲光束产生系统的设备和方法，产生包括具有选定脉冲重复率的激光输出光脉冲的光束，其可以包括 ：色散中心波长选择光学器件，用于为每个脉冲选择至少一个中心波长，所述至少一个中心波长至少部分由在色散波长选择光学器件上包含相应脉冲的激光脉冲光束的入射角确定; 调谐机构，用于在所述色散中心波长选择光学器件上选择包含所述相应脉冲的所述激光脉冲光束的第一空间限定部分的至少一个入射角; 并且所述调谐机构包括可变折射光学元件，所述可变折射光学元件限定所述激光脉冲光束的第一空间限定部分在所述激光的多个入射位置中的一个位置处穿过所述可变折射光学元件的多个折射角位移 脉冲光束在可变折射光学元件上。 可变折射光学元件可以包括：限定用于激光脉冲束的入射表面的第一大致平坦面; 以及第二多面或曲面，其限定激光束的多个出口的大体上平坦的表面或连续变化的出口表面。 公开了脉冲参数测量和脉冲调制控制的其他方面，包括响应来自使用工具的信号，例如涉及具有不同中心波长谱的适当剂量控制。

公开(公告)号：WO2003021727A3

公开(公告)日：2003-03-13

申请号：PCT/US2002/026394

申请日：2002-08-19

Applicant: CYMER, INC, ,  KNOWLES, David, S. ,  BROWN, Daniel, J., W. ,  SANDSTROM, Richard, L. ,  RYLOV, German, E. ,  ONKELS, Eckehard, D. ,  BESAUCELE, Herve, A. ,  MYERS, David, W. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  FOMENKOV, Igor, V. ,  UJAZDOWSKI, Richard, C. ,  NESS, Richard, M. ,  SMITH, Scot, T. ,  HULBURD, William, G.

Inventor： KNOWLES, David, S. ,  BROWN, Daniel, J., W. ,  SANDSTROM, Richard, L. ,  RYLOV, German, E. ,  ONKELS, Eckehard, D. ,  BESAUCELE, Herve, A. ,  MYERS, David, W. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  FOMENKOV, Igor, V. ,  UJAZDOWSKI, Richard, C. ,  NESS, Richard, M. ,  SMITH, Scot, T. ,  HULBURD, William, G.

IPC: H01S3/11

Abstract: An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The masters oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength an a pulse to pulse basis at repetition rates of 4,000 Hz or greater to precision of less that 0.2 pm.

公开(公告)号：WO2003021727A2

公开(公告)日：2003-03-13

申请号：PCT/US2002/026394

申请日：2002-08-19

Applicant: CYMER, INC, ,  KNOWLES, David, S. ,  BROWN, Daniel, J., W. ,  SANDSTROM, Richard, L. ,  RYLOV, German, E. ,  ONKELS, Eckehard, D. ,  BESAUCELE, Herve, A. ,  MYERS, David, W. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  FOMENKOV, Igor, V. ,  UJAZDOWSKI, Richard, C. ,  NESS, Richard, M. ,  SMITH, Scot, T. ,  HULBURD, William, G.

Inventor： KNOWLES, David, S. ,  BROWN, Daniel, J., W. ,  SANDSTROM, Richard, L. ,  RYLOV, German, E. ,  ONKELS, Eckehard, D. ,  BESAUCELE, Herve, A. ,  MYERS, David, W. ,  ERSHOV, Alexander, I. ,  PARTLO, William, N. ,  FOMENKOV, Igor, V. ,  UJAZDOWSKI, Richard, C. ,  NESS, Richard, M. ,  SMITH, Scot, T. ,  HULBURD, William, G.

IPC: H01S

CPC classification number: H01S3/2366 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333

Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F 2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F 2 spectral line.

Abstract translation: 一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。 提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 配置为MOPA并被专门设计用作集成电路光刻的光源的F2激光系统中的优选实施例。 在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。 主振荡器配有一个线选择包，用于选择最强的F2谱线。