METHOD OF MAKING A COMPOSITION AND AQUEOUS COMPOSITION PREPARABLE THEREBY
    5.
    发明申请
    METHOD OF MAKING A COMPOSITION AND AQUEOUS COMPOSITION PREPARABLE THEREBY 审中-公开
    制备组合物的方法和可制备的水性组合物

    公开(公告)号:WO2010074877A1

    公开(公告)日:2010-07-01

    申请号:PCT/US2009/065839

    申请日:2009-11-25

    CPC classification number: C11D1/004 C11D1/65

    Abstract: A method of making a composition comprises independently providing a first component comprising a first compound, and a second component comprising a second compound; and combining the first component and the second component, wherein: a) the first compound is represented by; and b) the second compound is represented by. R f represents a perfluoroalkyl group having from 1 to 12 carbon atoms. R 1 , R 2 , R 3 , and R 4 each independently represent H or an alkyl group having from 1 to 6 carbon atoms. R 5 represents H, an alkyl group having from 1 to 6 carbon atoms, or a hydroxyalkyl group having from 1 to 6 carbon atoms. R 6 and R 7 each independently represent an alkyl group having from 1 to 6 carbon atoms, or a hydroxyalkyl group having from 1 to 6 carbon atoms. Compositions preparable according to the method are also disclosed.

    Abstract translation: 制备组合物的方法包括独立地提供包含第一化合物的第一组分和包含第二化合物的第二组分; 并且组合所述第一组分和所述第二组分,其中:a)所述第一化合物由下式表示: 和b)第二化合物表示。 Rf表示具有1至12个碳原子的全氟烷基。 R 1,R 2,R 3和R 4各自独立地表示H或具有1至6个碳原子的烷基。 R5表示H,具有1至6个碳原子的烷基或具有1至6个碳原子的羟烷基。 R6和R7各自独立地表示具有1至6个碳原子的烷基或具有1至6个碳原子的羟烷基。 还公开了根据该方法可制备的组合物。

    FLUORINATED SURFACTANTS FOR BUFFERED ACID ETCH SOLUTIONS
    6.
    发明申请
    FLUORINATED SURFACTANTS FOR BUFFERED ACID ETCH SOLUTIONS 审中-公开
    用于缓冲酸蚀溶液的氟化表面活性剂

    公开(公告)号:WO2004044091A1

    公开(公告)日:2004-05-27

    申请号:PCT/US2003/028606

    申请日:2003-09-11

    CPC classification number: H01L21/31111 C09K13/08

    Abstract: The present invention is directed to certain fluorinated surfactants, and use thereof in acid etch solutions, such as in aqueous buffered acid etch solutions. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.

    Abstract translation: 本发明涉及某些氟化表面活性剂及其在酸蚀刻溶液中的用途,例如在含水缓冲酸蚀刻溶液中。 蚀刻溶液与各种各样的衬底一起使用,例如,在含氧化硅的衬底的蚀刻中。

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