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公开(公告)号：WO2023064060A1
公开(公告)日：2023-04-20
申请号：PCT/US2022/043693
申请日：2022-09-15
发明人： LEI, Wei-Sheng , YAO, Zhengping , CHIDAMBARAM, Mahendran , WANG, Kangkang , LIN, Zhihong John , GODET, Ludovic , SIVARAMAKRISHNAN, Visweswaren
IPC分类号： B23K26/354 , B23K26/0622 , G02B6/122 , G02B6/12
摘要： A method and apparatus for dicing optical devices from a substrate are described herein. The method includes the formation of a plurality of trenches using radiation pulses delivered to the substrate. The radiation pulses are delivered in a pattern to form trenches with varying depth as the trenches extend outward from a top surface of the optical device. The varying depth of the trenches provides edges of each of the optical devices which are slanted. The radiation pulses are UV radiation pulses and are delivered in bursts around the silhouette of the optical devices.
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公开(公告)号：WO2022204044A1
公开(公告)日：2022-09-29
申请号：PCT/US2022/021177
申请日：2022-03-21
发明人： FU, Jinxin , SUN, Yangyang , GODET, Ludovic
摘要： Embodiments of the present disclosure relate to a sensor apparatuses with stacked metasurfaces suitable for small form factors. The apparatus is a sensing apparatus operable to be used in sensing applications. The apparatus includes a light source and an optical device. The optical device includes multiple metasurfaces. The optical device includes a collimation metasurface disposed on a substrate to collimate one or more laser beams from the light source. The one or more laser beams propagate through the substrate to a diffractive metasurface. The diffractive metasurface diffracts the collimated one or more laser beams into diffraction beams.
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公开(公告)号：WO2022203949A1
公开(公告)日：2022-09-29
申请号：PCT/US2022/020871
申请日：2022-03-18
发明人： OHNO, Kenichi , KURATOMI, Takashi , HAYEE, Fariah , CEBALLOS, Andrew , HOURANI, Rami , GODET, Ludovic
摘要： A method of forming an optical device is provided. The method includes disposing an optical device substrate on a substrate support in a process volume of a process chamber, the optical device substrate having a first surface; and forming a first optical layer on the first surface of the optical device substrate during a first time period when the optical device substrate is on the substrate support, wherein the first optical layer comprises one or more metals in a metal-containing oxide, a metal¬ containing nitride, or a metal-containing oxynitride, and the first optical layer is formed without an RF-generated plasma over the optical device substrate; and forming a second optical layer with an RF-generated plasma over the first optical layer during a second time period when the optical device substrate is on the substrate support.
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公开(公告)号：WO2022197480A1
公开(公告)日：2022-09-22
申请号：PCT/US2022/019162
申请日：2022-03-07
发明人： FU, Jinxin , SUN, Yangyang , DAITO, Kazuya , GODET, Ludovic
摘要： Embodiments of the present disclosure relate to measurement systems and methods of measuring efficiency of optical devices. In one example, the measurement systems include a light source, a mirror, an illumination source, and a sensor. The light source provides a light beam to the optical device to be diffracted into diffraction beams having diffraction orders. The diffractions beams form a diffraction pattern. The method includes positioning the optical device in the measurement system and directing the diffraction beams to the sensor. The sensor is operable to measure the efficiency of the optical device by measuring the diffraction pattern.
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公开(公告)号：WO2022115461A1
公开(公告)日：2022-06-02
申请号：PCT/US2021/060585
申请日：2021-11-23
发明人： FU, Jinxin , DAITO, Kazuya , GODET, Ludovic
摘要： A method of optical device metrology is provided. The method includes providing a first type of light into a first optical device during a first time period; measuring a quantity of the first type of light transmitted from a first location on the top surface or the bottom surface during the first time period; coating at least a portion of an edge of the one or more edges with a first coating of optically absorbent material during a second time period that occurs after the first time period; providing the first type of light into the first optical device during a third time period that occurs after the second time period; and measuring a quantity of the first type of light transmitted from the first location on the top surface or the bottom surface during the third time period.
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公开(公告)号：WO2022115457A1
公开(公告)日：2022-06-02
申请号：PCT/US2021/060576
申请日：2021-11-23
发明人： SUN, Yangyang , FU, Jinxin , DAITO, Kazuya , GODET, Ludovic
IPC分类号： G01N21/88 , G01N21/956 , G01B11/24 , G06T7/00 , G06T19/00
摘要： Embodiments described herein provide for light engines of a measurement system and methods of using the light engines. The measurement system includes a light engine operable to illuminate a first grating of an optical device. The light engine projects a pattern with a light from a light engine. The light engine projects a pattern to the first grating such that a metrology metric may be extracted from one or more images captured by a detector of the measurement system. The metrology metrics are extracted by processing the image. The metrology metrics determine if the optical device meets image quality standards.
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公开(公告)号：WO2022026073A1
公开(公告)日：2022-02-03
申请号：PCT/US2021/037807
申请日：2021-06-17
摘要： An apparatus for manufacturing a nano-imprint lithography stamp from a master template stamp, including a stamp chuck configured to selectively secure a stamp backing material thereto, a master chuck configured to support a master template stamp, the master template stamp including a master pattern thereon, the master chuck configured to support the master template stamp in facing relationship to the stamp backing material when selectively secured to the stamp chuck, wherein the master template stamp includes an electromagnetic energy curable material on and in the master pattern, and the stamp chuck is configured and arranged to position a portion of the backing material thereon spaced therefrom and in contact with the electromagnetic energy curable material, and the stamp chuck is further configured to position the portion of the backing material in contact with the energy curable material, after it is cured, in contact with the stamp chuck.
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公开(公告)号：WO2022020101A1
公开(公告)日：2022-01-27
申请号：PCT/US2021/040879
申请日：2021-07-08
IPC分类号： G02B1/02 , C23C14/34 , C23C14/08 , C23C14/06 , C23C14/00 , C23C16/40 , C23C16/34 , C23C16/505
摘要： Embodiments of the present disclosure relate to optical device films and methods of forming optical device films. Specifically, embodiments described herein provide for an optical device film having a constant oxygen-concentration, a first concentration profile of the first material, and a second concentration profile of the second material. The first material, described and referenced to herein, has a first refractive index about 2.0 or greater and the second material has a second refractive index less than 2.0.
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公开(公告)号：WO2021173271A1
公开(公告)日：2021-09-02
申请号：PCT/US2021/014589
申请日：2021-01-22
发明人： XU, Yongan , CHEN, Chien-An , GODET, Ludovic
IPC分类号： G03F7/20 , G03F7/09 , H01L21/027 , H01L21/033 , H01L21/308
摘要： Aspects of the present disclosure relate generally to methods and apparatus of processing transparent substrates, such as glass substrates. In one implementation, a film stack for optical devices includes a glass substrate including a first surface and a second surface. The film stack includes a device function layer formed on the first surface, a hard mask layer formed on the device function layer, and a substrate recognition layer formed on the hard mask layer. The hard mask layer includes one or more of chromium, ruthenium, or titanium nitride. The film stack includes a backside layer formed on the second surface. The backside layer formed on the second surface includes one or more of a conductive layer or an oxide layer.
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公开(公告)号：WO2021141706A1
公开(公告)日：2021-07-15
申请号：PCT/US2020/063782
申请日：2020-12-08
IPC分类号： G03F7/20 , G03F9/00 , G02B5/1857 , G03F1/42 , G03F7/2002 , G03F7/201
摘要： A method of forming patterned features on a substrate is provided. The method includes positioning a plurality of masks arranged in a mask layout over a substrate. The substrate is positioned in a first plane and the plurality of masks are positioned in a second plane, the plurality of masks in the mask layout have edges that each extend parallel to the first plane and parallel or perpendicular to an alignment feature on the substrate, the substrate includes a plurality of areas configured to be patterned by energy directed through the masks arranged in the mask layout. The method further includes directing energy towards the plurality of areas through the plurality of masks arranged in the mask layout over the substrate to form a plurality of patterned features in each of the plurality of areas.
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