公开(公告)号：WO2020050974A1

公开(公告)日：2020-03-12

申请号：PCT/US2019/047331

申请日：2019-08-20

Applicant: APPLIED MATERIALS, INC.

Inventor： HERLE, Subramanya P. ,  LIM, Vicente M. ,  PATTANSHETTY, Basavaraj ,  MORE, Ajay ,  MOHR, Marco ,  STICKSEL-WEIS, Bjoern ,  BAGUL, Nilesh Chimanrao ,  SIVARAMAKRISHNAN, Visweswaren

IPC: C23C16/448 ,  C23C16/52 ,  C23C16/455 ,  C23C16/40 ,  C23C16/50 ,  H01M4/04

Abstract: A method and apparatus for direct liquid injection (DLI) of chemical precursors into a processing chamber is provided. The DLI system includes a liquid precursor source vaporization system, which vaporizes liquid stably and efficiently. In one implementation, the DLI system is a closed loop integrated system which combines, an injection valve (IV) along with a Liquid Flow Meter (LFM), an ampoule assembly as a source of pressurized precursor, an inert push gas to pressurize the precursor in the ampoule assembly, a temperature controller to maintain a targeted temperature regime, leak detection and controlled carrier gas flow to gas heater.