公开(公告)号：WO2020050974A1

公开(公告)日：2020-03-12

申请号：PCT/US2019/047331

申请日：2019-08-20

Applicant: APPLIED MATERIALS, INC.

Inventor： HERLE, Subramanya P. ,  LIM, Vicente M. ,  PATTANSHETTY, Basavaraj ,  MORE, Ajay ,  MOHR, Marco ,  STICKSEL-WEIS, Bjoern ,  BAGUL, Nilesh Chimanrao ,  SIVARAMAKRISHNAN, Visweswaren

IPC: C23C16/448 ,  C23C16/52 ,  C23C16/455 ,  C23C16/40 ,  C23C16/50 ,  H01M4/04

Abstract: A method and apparatus for direct liquid injection (DLI) of chemical precursors into a processing chamber is provided. The DLI system includes a liquid precursor source vaporization system, which vaporizes liquid stably and efficiently. In one implementation, the DLI system is a closed loop integrated system which combines, an injection valve (IV) along with a Liquid Flow Meter (LFM), an ampoule assembly as a source of pressurized precursor, an inert push gas to pressurize the precursor in the ampoule assembly, a temperature controller to maintain a targeted temperature regime, leak detection and controlled carrier gas flow to gas heater.

公开(公告)号：WO2022261216A1

公开(公告)日：2022-12-15

申请号：PCT/US2022/032686

申请日：2022-06-08

Applicant: APPLIED MATERIALS, INC.

Inventor： DEEPAK, Nitin ,  CHAKRABORTY, Tapash ,  GORADIA, Prerna Sonthalia ,  SIVARAMAKRISHNAN, Visweswaren ,  BAGUL, Nilesh Chimanrao ,  UPADHYE, Bahubali S.

IPC: C23C16/44 ,  C09K13/00

Abstract: Methods for etching alkali metal compounds are disclosed. Some embodiments of the disclosure expose an alkali metal compound to an alcohol to form a volatile metal alkoxide. Some embodiments of the disclosure expose an alkali metal compound to a β-diketone to form a volatile alkali metal β-diketonate compound. Some embodiments of the disclosure are performed in-situ after a deposition process. Some embodiments of the disclosure provide methods which selectively etch alkali metal compounds.

公开(公告)号：WO2021062205A1

公开(公告)日：2021-04-01

申请号：PCT/US2020/052795

申请日：2020-09-25

Applicant: APPLIED MATERIALS, INC.

Inventor： PATEL, Dakshalkumar ,  CHATURVEDI, Girish Kumar ,  UPADHYE, Bahubali S. ,  ACHARYA, Sumedh ,  CHIDAMBARAM, Mahendran ,  BAGUL, Nilesh Chimanrao

IPC: B22F3/105 ,  B23K26/342 ,  B33Y30/00 ,  B33Y40/00

Abstract: An additive manufacturing apparatus includes an environmentally sealed first chamber, a second chamber separated from the first chamber by a first valve, a platform positionable in the first chamber, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform in the first chamber, at least one energy source to selectively fuse feed material in a layer on the platform in the first chamber, and an air knife assembly to direct a laminar flow of air across a layer of feed material on the platform in the first chamber. The air knife assembly includes an inlet module and an exhaust module that are movable through the first valve between the first chamber and the second chamber.

公开(公告)号：WO2022109009A1

公开(公告)日：2022-05-27

申请号：PCT/US2021/059695

申请日：2021-11-17

Applicant: APPLIED MATERIALS, INC.

Inventor： CHAKRABORTY, Tapash ,  DEEPAK, Nitin ,  GORADIA, Prerna Sonthalia ,  UPADHYE, Bahubali S. ,  BAGUL, Nilesh Chimanrao ,  HERLE, Subramanya P. ,  SIVARAMAKRISHNAN, Visweswaren

IPC: C23C16/44 ,  C23C14/56

Abstract: Exemplary methods of removing lithium-containing deposits may include heating a surface of a lithium-containing deposit. The surface may include oxygen or nitrogen, and the lithium-containing deposit may be disposed on a surface of a processing chamber. The methods may include contacting the surface of the lithium-containing deposit with a hydrogen-containing precursor. The contacting may hydrogenate the surface of the lithium-containing deposit. The methods may include contacting the lithium-containing deposit with a nitrogen-containing precursor to form volatile byproducts. The methods may include exhausting the volatile byproducts of the lithium-containing deposit from the processing chamber.

公开(公告)号：WO2018194978A1

公开(公告)日：2018-10-25

申请号：PCT/US2018/027789

申请日：2018-04-16

Applicant: APPLIED MATERIALS, INC.

Inventor： ARNEPALLI, Ranga Rao ,  THAKARE, Darshan ,  MALLICK, Abhijit Basu ,  MANNA, Pramit ,  VISSER, Robert Jan ,  BAGUL, Nilesh Chimanrao

IPC: H01L21/768

CPC classification number: C23C16/4486 ,  C23C16/045 ,  C23C16/345 ,  C23C16/401 ,  C23C16/403 ,  C23C16/405 ,  H01L21/02153 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02178 ,  H01L21/02181 ,  H01L21/02183 ,  H01L21/02186 ,  H01L21/02189 ,  H01L21/02271

Abstract: Systems and methods for forming films on the surface of a substrate are described. The systems possess aerosol generators which form droplets from a liquid solution made from a solvent and a deposition precursor. A carrier gas may be flowed through the liquid solution and push the droplets toward a substrate placed in a substrate processing region. The droplets pass into the substrate processing region and chemically react with the substrate to form films. The temperature of the substrate may be maintained below the boiling temperature of the solvent during film formation. The solvent imparts a flowability to the forming film and enable the depositing film to flow along the surface of a patterned substrate during formation prior to solidifying. The flowable film results in bottom-up gapfill inside narrow high-aspect ratio gaps in the patterned substrate.