公开(公告)号：WO2022010872A1

公开(公告)日：2022-01-13

申请号：PCT/US2021/040476

申请日：2021-07-06

Applicant: APPLIED MATERIALS, INC.

Inventor： PANAVALAPPIL KUMARANKUTTY, Hanish Kumar ,  SEUTTER, Sean M. ,  GONDHALEKAR, Sudhir R. ,  BOYD, Wendell Glenn ,  RAMAMURTHI, Badri ,  ATHANI, Shekhar ,  KALAL, Anil Kumar ,  PINSON, Jay Dee, II

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/687 ,  H01J37/32 ,  H01J2237/2007 ,  H01J37/32724 ,  H01L21/67109 ,  H01L21/6833 ,  H01L21/6875

Abstract: Embodiments of the disclosure provide electrostatic chucks for securing substrates during processing. Some embodiments of this disclosure provide methods and apparatus for increased temperature control across the radial profile of the substrate. Some embodiments of the disclosure provide methods and apparatus for providing control of hydrogen concentration in processed films during a high-density plasma (HDP) process.

公开(公告)号：WO2021021518A1

公开(公告)日：2021-02-04

申请号：PCT/US2020/043082

申请日：2020-07-22

Applicant: APPLIED MATERIALS, INC.

Inventor： PANDEY, Vishwas Kumar ,  PRABHAKAR, Vinay ,  AFZAL, Bushra ,  RAMAMURTHI, Badri ,  ROCHA, Juan C.

IPC: C23C16/44 ,  C23C16/458 ,  C23C16/455 ,  C23C16/50 ,  H01J37/32

Abstract: A processing chamber may include a gas distribution member, a metal ring member below the gas distribution member, and an isolating assembly coupled with the metal ring member and isolating the metal ring member from the gas distribution member. The isolating assembly may include an outer isolating member coupled with the metal ring member. The outer isolating member may at least in part define a chamber wall. The isolating assembly may further include an inner isolating member coupled with the outer isolating member. The inner isolating member may be disposed radially inward from the metal ring member about an central axis of the processing chamber. The inner isolating member may define a plurality of openings configured to provide fluid access into a radial gap between the metal ring member and the inner isolating member.