公开(公告)号：WO2022073679A1

公开(公告)日：2022-04-14

申请号：PCT/EP2021/073138

申请日：2021-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： BUSTRAAN, Krijn, Frederik ,  GIJSBERTSEN, Arjan ,  VAN DONGEN, Paul ,  ACAN, Ibrahim

IPC: G03F7/20 ,  H01L21/687

Abstract: The invention provides a substrate holder to hold a substrate in a substrate holding position, comprising: a frame, multiple surface clamping devices arranged on the frame to clamp a substrate at an upper surface thereof, wherein the surface clamping devices each have a clamping pad to be arranged on the upper surface of the substrate, the surface clamping pads being movable with respect to each other at least in a first direction substantially perpendicular to the upper surface of a substrate held by the surface clamping pads, and one or more actuators to move the surface clamping pads with respect to each other in the first direction.

公开(公告)号：WO2015169616A1

公开(公告)日：2015-11-12

申请号：PCT/EP2015/058831

申请日：2015-04-23

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： LEENDERS, Martinus, Hendrikus, Antonius ,  DE KRUIJF, Niek, Elout ,  DUSA, Mircea ,  HOUBEN, Martijn ,  MULDER, Johannes, Gerardus,Maria ,  POIESZ, Thomas ,  VAN DEN HEUVEL, Marco, Adrianus, Peter ,  VAN DONGEN, Paul ,  GERRITZEN, Justin, Johannes, Hermanus ,  VERWEIJ, Antonie, Hendrik ,  SOETHOUDT, Abraham, Alexander

IPC: G03F7/20

CPC classification number: G03F7/707 ,  G03F7/70716 ,  G03F7/70783 ,  H01L21/6835 ,  H01L21/6838

Abstract: A substrate support (1), includes: a substrate support location (4) configured to support a substrate (W), and a vacuum clamping device (7) configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source (8) to create a reduced pressure, at least one vacuum section (9) connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device (16) configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input (16a) to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

Abstract translation: 衬底支撑件（1）包括：被配置为支撑衬底（W）的衬底支撑位置（4）和被配置为将衬底夹持在衬底支撑位置上的真空夹紧装置（7），其中真空夹紧装置包括 至少一个减压源（8）以产生减压，连接到所述至少一个减压源的至少一个真空部分（9），其中所述至少一个真空部分被配置为将所述基板吸引到所述基板支撑件 位置和控制装置（16），其被配置为控制沿着所述至少一个真空部分的空间压力分布，所述基板由所述至少一个真空部分被所述真空夹紧装置吸引，其中所述控制装置包括用于接收的基板形状数据输入（16a） 表示要被夹持的基板的形状数据的基板形状数据，并且其中所述控制装置被配置为根据所述基板形状数据来适应所述空间压力分布。

公开(公告)号：WO2021239589A1

公开(公告)日：2021-12-02

申请号：PCT/EP2021/063549

申请日：2021-05-20

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DONGEN, Paul ,  VAN BAREN, Martijn

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/68 ,  G03F9/00 ,  H01L21/687

Abstract: Conditioning device for conditioning an object in a conditioning volume, comprising: at least one support pin adapted to support the object; a first plate and a second plate forming outer borders of the conditioning volume; an actuator unit adapted to move at least one of the first plate and the second plate between: an object receiving position in which the first plate and second plate are separated by a receiving distance of each other and the object can be arranged into the conditioning volume; and an object conditioning position in which the first plate and second plate are separated by a conditioning distance of each other which is smaller than the receiving distance, wherein a seal is formed between the first plate and the second plate in the object conditioning position, wherein the seal forms an outer border of the conditioning volume.

公开(公告)号：WO2019091662A1

公开(公告)日：2019-05-16

申请号：PCT/EP2018/076213

申请日：2018-09-27

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DONGEN, Paul ,  VAN BEUZEKOM, Aart, Adrianus

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/677

CPC classification number: G03F7/7075 ,  G03F7/70466 ,  G03F7/70475 ,  G03F7/70866 ,  G03F7/70916 ,  G03F7/70991 ,  H01L21/67225 ,  H01L21/67248 ,  H01L21/67253 ,  H01L21/67769 ,  H01L21/67778 ,  H01L21/6831 ,  H01L21/6838 ,  H01L21/68707

Abstract: A lithographic apparatus comprising a substrate storage module having a controllable environment for protecting lithographically exposed substrates from ambient air. The substrate storage module is configured to store at least twenty substrates and the substrate storage module is an integral part of the lithographic apparatus. The substrate storage module may be used to protect substrates from ambient air during stitched lithographic exposures.

公开(公告)号：WO2023025468A1

公开(公告)日：2023-03-02

申请号：PCT/EP2022/070146

申请日：2022-07-19

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DONGEN, Paul

IPC: G03F7/20 ,  H01L21/687 ,  B25J15/06

Abstract: A gripper for an object handler comprises an engaging surface for engaging a surface of an object, and a first channel connected to a first outlet, said first outlet being configured to operate, during use, as a vacuum clamp arranged to secure the engaging surface to the surface of the object. The gripper further comprises a second channel arranged to be connected to a pressure source, and at least one second outlet arranged adjacent to the engaging surface and connected to the second channel.

公开(公告)号：WO2022148607A1

公开(公告)日：2022-07-14

申请号：PCT/EP2021/085443

申请日：2021-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DONGEN, Paul ,  VAN BEUZEKOM, Aart, Adrianus

IPC: G03F7/20 ,  H01L21/683

Abstract: Disclosed herein is a gripper configured to transport a substrate in a lithographic apparatus, the gripper comprising: a main body with one or more engagement portions for engaging with a surface of the substrate; wherein a part of the main body, that is overlapped by a region of a substrate when the one or more engagement portions are engaged with the substrate, comprises a plurality of openings that extend through the main body in a direction substantially perpendicular to the surface of the substrate.

公开(公告)号：WO2015193036A1

公开(公告)日：2015-12-23

申请号：PCT/EP2015/060427

申请日：2015-05-12

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN BEUZEKOM, Aart, Adrianus ,  ALBERTI, Jozef, Augustinus, Maria ,  SEGERS, Hubert, Marie ,  VAN DER HAM, Ronald ,  FAHRNI, Francis ,  OLIESLAGERS, Ruud ,  PIETERSE, Gerben ,  ROPS, Cornelius, Maria ,  VAN DEN EIJNDEN, Pepijn ,  VAN DONGEN, Paul ,  WILLEMS, Bas

IPC: G03F7/20

CPC classification number: G03F7/7075 ,  G03F7/70341 ,  G03F7/70991

Abstract: A lithographic apparatus comprises a substrate table, post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is for handling the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a wafer handler.

Abstract translation: 光刻设备包括基板台，曝光后处理模块，基板处理机器人和干燥台。 衬底台被配置为支撑用于曝光过程的衬底。 后曝光处理模块用于处理基板曝光后。 衬底处理机器人被配置为沿着衬底卸载路径将衬底从衬底台转移到后曝光处理模块中。 干燥站构造成主动地从基板的表面移除液体。 干燥站位于基板卸载路径中。 干燥站位于曝光后处理模块中。 后曝光处理模块可以是晶片处理器。