公开(公告)号：WO2016050453A1

公开(公告)日：2016-04-07

申请号：PCT/EP2015/070410

申请日：2015-09-07

Applicant: ASML NETHERLANDS B.V.

Inventor： SINGH, Amandev ,  PELLEMANS, Henricus, Petrus, Maria

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70641 ,  G02B21/245 ,  G03F7/70616 ,  G03F9/7026

Abstract: An inspection apparatus (300) includes a focus monitoring arrangement (500, 500'). Focusing radiation (505) comprises radiation having a first wavelength and radiation having a second wavelength. Reference radiation and focusing radiation at each wavelength are provided with at least one relative frequency shift so that the interfering radiation detected in the detection system includes a time-varying component having a characteristic frequency. A focus detection system (520) comprises one or more lock-in detectors (520b, 520c, 900). Operating the lock-in detectors with reference to both the first and second characteristic frequencies allows the arrangement to select which of the first and second focusing radiation is used to determine whether the optical system is in focus. Good quality signals can be obtained from targets of different structure.

Abstract translation: 检查装置（300）包括聚焦监视装置（500,500'）。 聚焦辐射（505）包括具有第一波长的辐射和具有第二波长的辐射。 在每个波长处的参考辐射和聚焦辐射被提供有至少一个相对频移，使得在检测系统中检测到的干扰辐射包括具有特征频率的时变分量。 焦点检测系统（520）包括一个或多个锁定检测器（520b，520c，900）。 参考第一和第二特征频率操作锁定检测器允许该装置选择使用第一和第二聚焦辐射中的哪一个来确定光学系统是否聚焦。 可以从不同结构的目标获得良好的质量信号。

公开(公告)号：WO2018086852A1

公开(公告)日：2018-05-17

申请号：PCT/EP2017/077013

申请日：2017-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： TUKKER, Teunis, Willem ,  VAN DER ZOUW, Gerbrand ,  SINGH, Amandev

IPC: G03F7/20 ,  G03F9/00

Abstract: A measurement system is disclosed in which a first optical system splits an input radiation beam into a plurality of components. A modulator receives the plurality of components and applies a modulation to at least one of the components independently of at least one other of the components. A second optical system illuminates a target with the plurality of components and directs radiation scattered by the target to a detection system. The detection system distinguishes between each of one or more components, or between each of one or more groups of components, of the radiation directed to the detection system based on the modulation applied to each component or each group of components by the modulator.

Abstract translation: 公开了一种测量系统，其中第一光学系统将输入辐射束分成多个分量。 调制器接收多个分量并且独立于至少另一个分量对至少一个分量施加调制。 第二光学系统用多个部件照射目标，并将由目标散射的辐射引导至检测系统。 检测系统基于由调制器应用于每个组件或每组组件的调制，区分指向检测系统的辐射的一个或多个组件中的每一个或者一个或多个组件组中的每一个之间。 p>

公开(公告)号：WO2018069052A1

公开(公告)日：2018-04-19

申请号：PCT/EP2017/074618

申请日：2017-09-28

Applicant: ASML NETHERLANDS B.V.

Inventor： TUKKER, Teunis, Willem ,  SINGH, Amandev ,  VAN DER ZOUW, Gerbrand

IPC: G03F7/20 ,  G01B9/02 ,  G01N21/95 ,  G01N21/956

CPC classification number: G03F7/70633 ,  G01B9/02016 ,  G01B11/272 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F7/70625 ,  G03F7/70941

Abstract: Metrology apparatus and methods are disclosed. In one arrangement, a substrate is inspected. A source beam of radiation (131) emitted by a radiation source (50) is split into a measurement beam (132) and a reference beam (133). A first target is illuminated with the measurement beam, the first target being on the substrate (W). A second target (90) is illuminated with the reference beam, the second target being separated from the substrate. First scattered radiation (134) is collected from the first target and delivered to a detector (80). Second scattered radiation (135) is collected from the second target and delivered to the detector. The first scattered radiation interferes with the second scattered radiation at the detector. The first target comprises a first pattern. The second target comprises a second pattern, or a pupil plane image of the second pattern. The first pattern is geometrically identical to the second pattern, the first pattern and the second pattern are periodic and a pitch of the first pattern is identical to a pitch of the second pattern, or both.

Abstract translation: 公开了计量装置和方法。 在一种布置中，检查衬底。 由辐射源（50）发射的源辐射束（131）被分成测量束（132）和参考束（133）。 测量光束照射第一个目标，第一个目标位于衬底（W）上。 用参考光束照射第二目标（90），第二目标与衬底分离。 从第一目标收集第一散射辐射（134）并传送到检测器（80）。 从第二个目标收集第二散射辐射（135）并传送到检测器。 第一散射辐射在检测器处干扰第二散射辐射。 第一个目标包括第一个模式。 第二目标包括第二图案或第二图案的瞳面图像。 第一图案在几何上与第二图案相同，第一图案和第二图案是周期性的，并且第一图案的间距与第二图案的间距相同，或者两者都相同。

公开(公告)号：WO2016096524A1

公开(公告)日：2016-06-23

申请号：PCT/EP2015/078915

申请日：2015-12-08

Applicant: ASML NETHERLANDS B.V.

Inventor： FUCHS, Andreas ,  WARDENIER, Peter, Hanzen ,  SINGH, Amandev ,  D'ALFONSO, Maxime ,  BOS, Hilko, Dirk

IPC: G03F7/20

CPC classification number: G06T7/0004 ,  G03F7/70633 ,  G03F7/70941 ,  G06T7/11 ,  G06T2207/30148

Abstract: A scatterometer is used in a dark-field imaging mode to measure asymmetry-related parameters such overlay. Measurements of small grating targets are made using identical optical paths, with the target in two orientations to obtain separate measurements of +1 and -1 diffraction orders. In this way, intensity scaling differences (tool asymmetry) are avoided. However, additive Intensity defects due to stray light (ghosts) in the optical system cannot be avoided. Additive intensity issues strongly depend on the ratio between 0th and 1st order diffraction and are therefore strongly wafer (process) dependent opposite. Calibration measurements (CM1-CM4) are made on a few representative target gratings having biases (+d, –d). The calibration measurements are made, using not only different wafer rotation (RZ = 0, π ) but also complementary apertures (13N, 13S). Corrections (δ, G) are calculated and applied calculate corrected asymmetry A', to reduce error caused by stray light.

Abstract translation: 在暗场成像模式中使用散射仪来测量不对称相关参数，如覆盖。 使用相同的光路进行小光栅靶的测量，其中目标在两个取向中以获得+1和-1衍射级的单独测量。 以这种方式，避免了强度缩放差异（工具不对称）。 然而，由于光学系统中的杂散光（重影）引起的附加强度缺陷是无法避免的。 添加强度问题很大程度上取决于第0级和第1级衍射之间的比例，因此强晶片（工艺）依赖相反。 校准测量（CM1-CM4）在具有偏差（+ d，-d）的几个代表性目标光栅上进行。 进行校准测量，不仅使用不同的晶片旋转（RZ = 0，π），而且使用互补孔（13N，13S）。 校正（δ，G）被计算并应用计算校正不对称A'，以减少由杂散光引起的误差。

公开(公告)号：WO2016005167A1

公开(公告)日：2016-01-14

申请号：PCT/EP2015/063828

申请日：2015-06-19

Applicant: ASML NETHERLANDS B.V.

Inventor： SINGH, Amandev ,  PELLEMANS, Henricus, Petrus, Maria ,  WARNAAR, Patrick

IPC: G03F7/20

CPC classification number: G03F7/70491 ,  G01J3/2823 ,  G01J3/45 ,  G01N21/4788 ,  G01N2201/06113 ,  G03F7/70625 ,  G03F7/70633

Abstract: Inspection apparatus (100) is used for measuring parameters of targets on a substrate. Coherent radiation follows an illumination path (solid rays) for illuminating target (T). A collection path (dashed rays) collects diffracted radiation from the target and delivers it to a lock-in image detector (112). A reference beam following a reference path (dotted rays). An acousto-optical modulator (108) shifts the optical frequency of the reference beam so that the intensity of radiation at the lock-in detector includes a time-varying component having a characteristic frequency corresponding to a difference between the frequencies of the diffracted radiation and the reference radiation. The lock-in image detector records two-dimensional image information representing both amplitude and phase of the time-varying component. A second reference beam with a different shift (110) follows a second reference path (dot-dash rays). Interference between the two reference beams can be used for intensity normalization.

Abstract translation: 检查装置（100）用于测量基板上的目标的参数。 相干辐射遵循用于照射目标（T）的照明路径（固体光线）。 收集路径（虚线）从目标物体收集衍射辐射并将其传送到锁定图像检测器（112）。 参考光束遵循参考路径（虚线）。 声光调制器（108）移动参考光束的光频率，使得锁定检测器处的​​辐射强度包括具有与衍射辐射的频率之间的差异相对应的特征频率的时变分量，以及 参考辐射。 锁定图像检测器记录表示时变分量的幅度和相位的二维图像信息。 具有不同偏移（110）的第二参考光束遵循第二参考路径（点划线）。 两个参考光束之间的干涉可用于强度归一化。