公开(公告)号：WO2020011513A1

公开(公告)日：2020-01-16

申请号：PCT/EP2019/066520

申请日：2019-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： LIANG, Jiao ,  ZHANG, Chen ,  ZHANG, Qiang ,  GUO, Yunbo

IPC: G03F7/20

Abstract: A method for improving a process model by measuring a feature on a printed design that was constructed based in part on a target design is disclosed. The method includes obtaining a) an image of the printed design from an image capture device and b) contours based on shapes in the image. The method also includes identifying, by a pattern recognition program, patterns on the target design that include the feature and determining coordinates, on the contours, that correspond to the feature. The method further includes improving the process model by at least a) providing a measurement of the feature based on the coordinates and b) calibrating the process model based on a comparison of the measurement with a corresponding feature in the target design.

公开(公告)号：WO2021259738A1

公开(公告)日：2021-12-30

申请号：PCT/EP2021/066323

申请日：2021-06-17

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Jen-Shiang ,  YANG, Pengcheng ,  HUANG, Jiao ,  LU, Yen-Wen ,  LIU, Liang ,  ZHANG, Chen

IPC: G03F7/20 ,  G03F1/36 ,  G03F7/70433 ,  G03F7/70441 ,  G03F7/705

Abstract: Described herein is a method for determining a likelihood that an assist feature of a mask pattern will print on a substrate. The method includes obtaining (i) a plurality of images of a pattern printed on a substrate and (ii) variance data the plurality of images of the pattern; determining, based on the variance data, a model configured to generate variance data associated with the mask pattern; and determining, based on model-generated variance data for a given mask pattern and a resist image or etch image associated with the given mask pattern, the likelihood that an assist feature of the given mask pattern will be printed on the substrate. The likelihood can be applied to adjust one or more parameters related to a patterning process or a patterning apparatus to reduce the likelihood that the assist feature will print on the substrate.

公开(公告)号：WO2020035285A1

公开(公告)日：2020-02-20

申请号：PCT/EP2019/070142

申请日：2019-07-26

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Chen ,  ZHANG, Qiang ,  WANG, Jen-Shiang ,  LIANG, Jiao

IPC: G03F7/20 ,  G06T7/00 ,  G01N21/956

Abstract: A method for evaluating images of a printed pattern is implemented by at least one programmable processor. The method includes obtaining (2310,2320) a first averaged image of the printed pattern, where the first averaged image is generated by averaging raw images of the printed pattern. The method also includes identifying (2330) one or more features of the first averaged image. The method further includes evaluating (2340) the first averaged image, by the programmable processor executing an image quality classification model and based at least on the one or more features. The evaluating includes determining (2350), by the image quality classification model, whether the first averaged image satisfies a metric.

公开(公告)号：WO2019145278A1

公开(公告)日：2019-08-01

申请号：PCT/EP2019/051461

申请日：2019-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： CAO, Yu ,  WALLOW, Thomas I. ,  ZHANG, Chen ,  WANG, Jen-Shiang

IPC: G03F7/20

Abstract: Systems, methods, and programming are described herein for pre-scan feature determination. In one embodiment, image data representing a plurality of scanning electron microscope ("SEM") images may be obtained, each including a representation of a feature and each being associated with a respective scan of the feature by an SEM. For each image, a parameter associated with each of a plurality of gauge positions may be determined. A change in the parameter from each SEM image to a subsequent SEM image may be determined. For each gauge position, a rate of change for the parameter may be determined based on a difference in a location of the parameter between at least two of the plurality of SEM images. Feature data representing a reconstruction of the feature prior to the SEM being applied may be generated by extrapolating an original location of the parameter based on the parameter's rate of change.