公开(公告)号：WO2014026819A3

公开(公告)日：2014-04-10

申请号：PCT/EP2013065069

申请日：2013-07-17

Applicant: ASML NETHERLANDS BV

Inventor： MATHIJSSEN SIMON GIJSBERT JOSEPHUS ,  BOGAART ERIK WILLEM ,  TINNEMANS PATRICIUS ALOYSIUS JACOBUS ,  DEN BOEF ARIE JEFFREY

IPC: G03F9/00 ,  G03F7/20

CPC classification number: G01B11/14 ,  G01B9/02 ,  G01B11/27 ,  G03F7/70058 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7069 ,  G03F9/7088

Abstract: A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of an alignment target comprising a periodic structure. An illumination optical system for focusing radiation into a spot on said structure. An asymmetry detection optical system receives a share of positive and negative orders of radiation diffracted by the periodic structure, and forms first and second images of said spot on first and second detectors respectively, wherein said negative order radiation is used to form the first image and said positive order radiation is used to form the second image. A processor for processing together signals from said first and second detectors representing intensities of said positive and negative orders to produce a measurement of asymmetry in the periodic structure. The asymmetry measurement can be used to improve accuracy of the position read by the alignment sensor.

Abstract translation: 一种光刻设备包括对准传感器，该对准传感器包括用于读取包括周期性结构的对准目标的位置的自参考干涉仪。 一种照明光学系统，用于将辐射聚焦到所述结构上的一个点上。 不对称检测光学系统接收由周期性结构衍射的正辐射和负辐射阶数的份额，并分别在第一和第二检测器上形成所述光斑的第一和第二图像，其中所述负阶辐射用于形成第一图像，以及 所述正序照射被用于形成第二图像。 处理器，用于一起处理来自所述第一和第二检测器的代表所述正和负阶的强度的信号，以产生周期性结构中的不对称性的测量结果。 不对称测量可用于提高对准传感器读取位置的准确度。

公开(公告)号：WO2016139055A3

公开(公告)日：2016-10-27

申请号：PCT/EP2016053216

申请日：2016-02-16

Applicant: ASML NETHERLANDS BV

Inventor： NIENHUYS HAN-KWANG ,  BOGAART ERIK WILLEM ,  DONKER RILPHO LUDOVICUS ,  KRUIZINGA BORGERT ,  LOOPSTRA ERIK ROELOF ,  BOTMA HAKO ,  DE VRIES GOSSE CHARLES ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  BASELMANS JOHANNES JACOBUS MATHEUS

IPC: G03F7/20 ,  G02B5/02

CPC classification number: G03F7/70191 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/70025 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  H01S3/2308 ,  H05G2/008

Abstract: A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

Abstract translation: 一种辐射系统，包括分束装置，其被配置为接收主辐射束并将主辐射束分裂成多个分支辐射束，以及布置成接收输入辐射束并输出修改的辐射束的辐射改变装置，其中辐射 改变装置被配置为提供与所接收的输入辐射束相比具有增加的光密度的输出修改的辐射束，其中所述辐射改变装置被布置成使得由所述辐射改变装置接收的输入辐射束是主 辐射束和辐射改变装置被配置为向分束装置提供修改的主辐射束，或者其中辐射改变装置被布置成使得由辐射改变装置接收的输入辐射束是分支辐射束输出 从分束装置。

公开(公告)号：WO2016079051A3

公开(公告)日：2016-09-22

申请号：PCT/EP2015076687

申请日：2015-11-16

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： KRUIZINGA MATTHIAS ,  JANSEN MAARTEN MATHIJS MARINUS ,  AZEREDO LIMA JORGE MANUEL ,  BOGAART ERIK WILLEM ,  BROUNS DERK SERVATIUS GERTRUDA ,  BRUIJN MARC ,  BRULS RICHARD JOSEPH ,  DEKKERS JEROEN ,  JANSSEN PAUL ,  KAMALI MOHAMMAD REZA ,  KRAMER RONALD HARM GUNTHER ,  LANSBERGEN ROBERT GABRIËL MARIA ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIPSON MATTHEW ,  LOOPSTRA ERIK ROELOF ,  LYONS JOSEPH H ,  ROUX STEPHEN ,  VAN DEN BOSCH GERRIT ,  VAN DEN HEIJKANT SANDER ,  VAN DER GRAAF SANDRA ,  VAN DER MEULEN FRITS ,  VAN LOO JÉRÔME FRANÇOIS SYLVAIN VIRGILE ,  VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN

IPC: G03F1/62 ,  G03F1/00 ,  G03F7/20

CPC classification number: G03F7/70983 ,  G03F1/64 ,  G03F7/70825

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract translation: 适用于光刻过程的掩模组件，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述支架被构造成相对于所述图案形成装置悬挂所述薄膜框架，使得所述薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。