MONOLITHIC, LINEAR GLASS POLARIZER AND ATTENUATOR
    1.
    发明申请
    MONOLITHIC, LINEAR GLASS POLARIZER AND ATTENUATOR 审中-公开
    单声道,线性玻璃偏振器和衰减器

    公开(公告)号:WO2014081648A1

    公开(公告)日:2014-05-30

    申请号:PCT/US2013/070486

    申请日:2013-11-18

    Abstract: The disclosure is directed to an element that is capable of acting as both an optical polarizer and an optical attenuator, thus integrating both functions into a single element. The element comprises a monolithic or one piece glass polarizer (herein also call the "substrate"), a multilayer " light attenuation or light attenuating " ("LA") coating that has been optimized for use at selected wavelengths and attenuations deposited on at least one polarizer facial surface, and a multilayer anti-reflective (AR) coating on top of the LA coating. The disclosure is further directed to an integrated optical isolator/attenuator comprising a first and a second polarizing elements and a Faraday rotator for rotating light positioned after the first polarizing element and before the second polarizing element, the integrated optical isolator/attenuator both polarizing and attenuation a light beam from a light source.

    Abstract translation: 本公开涉及能够充当光学偏振器和光衰减器的元件,从而将两个功能集成到单个元件中。 该元件包括单片或单片玻璃偏振器(这里也称为“基板”),已优化的多层“光衰减或光衰减”(“LA”)涂层,用于至少沉积在所选择的波长和衰减 一个偏振器面部表面和在LA涂层顶部的多层抗反射(AR)涂层。 本发明进一步涉及一种集成光隔离器/衰减器,其包括第一和第二偏振元件和法拉第旋转器,用于旋转位于第一偏振元件之后的光并且在第二偏振元件之前,集成光隔离器/衰减器均具有偏振和衰减 来自光源的光束。

    YTTRIUM OXIDE COATED OPTICAL ELEMENTS WITH IMPROVED MID-INFRARED PERFORMANCE
    2.
    发明申请
    YTTRIUM OXIDE COATED OPTICAL ELEMENTS WITH IMPROVED MID-INFRARED PERFORMANCE 审中-公开
    氧化钇涂层的光学元件具有改善的中红外性能

    公开(公告)号:WO2013082079A2

    公开(公告)日:2013-06-06

    申请号:PCT/US2012/066749

    申请日:2012-11-28

    Abstract: The disclosure is directed to a method of making yttrium oxide, Y 2 O 3 , coatings on substrates suitable for use at infrared wavelengths, including use in the 2-12 μm range. The coating method eliminates or substantially eliminates the absorptions peaks that typically appear at approximately 3.0 μm, 6.6 μm and 7.1 μm. This is achieved by using Y metal as the yttrium source in combination with an oxygen-containing plasma to form the Y 2 O 3 , coating in place of the using Y 2 O 3 as the coating material source The disclosure is further directed to optics suitable for use in the infrared that have such coatings. The transmission spectrum of the coated substrate made according to the method described herein is greater than the transmission spectrum of the uncoated substrate over the wavelength range of 4 μm to 12 μm.

    Abstract translation: 本公开涉及在适用于红外波长的衬底上制造氧化钇Y 2 O 3 O 3涂层的方法,包括 在2-12μm范围内使用。 涂覆方法消除或基本上消除了通常出现在约3.0μm,6.6μm和7.1μm处的吸收峰。 这是通过使用Y金属作为钇源与含氧等离子体组合以形成Y 2 O 3 3涂层以取代使用的Y

    CLEANING METHOD FOR DUV OPTICAL ELEMENTS TO EXTEND THEIR LIFETIME
    3.
    发明申请
    CLEANING METHOD FOR DUV OPTICAL ELEMENTS TO EXTEND THEIR LIFETIME 审中-公开
    用于DUV光学元件的清洁方法来延长寿命

    公开(公告)号:WO2009017634A2

    公开(公告)日:2009-02-05

    申请号:PCT/US2008/008934

    申请日:2008-07-23

    Abstract: The invention is directed to a method for cleaning surfaces of optical elements made from metal fluoride single crystals of formula MF2, where M is calcium, barium, magnesium, or strontium, or mixtures of the foregoing, prior to coating the elements with films of protective materials. The method has at least the steps of: (a) immersing the optical element in at least one selected liquid and utilizing sonication at megasonic frequencies to remove particulates, polishing slurry residue and the damaged top layer of the optical element; (b) cleaning in a gas phase cleaning process whereby hydrocarbons are removed from the surface of the optical element using UV/ozone cleaning; and (c) exposing, in a gas phase process, of the optical element's surface to a low-energy plasma containing argon and oxygen in a vacuum environment.

    Abstract translation: 本发明涉及一种用于清洁由MF2金属氟化物单晶制成的光学元件的表面的方法,其中M是钙,钡,镁或锶,或前述物质的混合物,在将元件与保护膜 材料。 该方法至少具有以下步骤:(a)将光学元件浸入至少一个所选择的液体中,并利用超声波以超声波频率去除微粒,抛光浆料残留物和损坏的光学元件顶层; (b)在气相清洗过程中进行清洗,由此使用UV /臭氧清洁从光学元件的表面除去烃类; 和(c)在气相工艺中在真空环境中将光学元件的表面暴露于含有氩和氧的低能量等离子体。

    METHOD FOR PRODUCING SMOOTH, DENSE OPTICAL FILMS
    4.
    发明申请
    METHOD FOR PRODUCING SMOOTH, DENSE OPTICAL FILMS 审中-公开
    生产平滑膜,透光膜的方法

    公开(公告)号:WO2008027225A1

    公开(公告)日:2008-03-06

    申请号:PCT/US2007/018332

    申请日:2007-08-17

    CPC classification number: G02B1/10 C23C14/22

    Abstract: The invention is directed to preparing optical elements having a thin, smooth, dense coating or film thereon, and a method for making such coating or film. The coated element has a surface roughness of

    Abstract translation: 本发明涉及制备其上具有薄的,光滑的,致密的涂层或膜的光学元件,以及制造这种涂层或膜的方法。 涂层元件具有<1.0nm rms的表面粗糙度。 涂层材料包括氧化铪或氧化铪和另一种氧化物材料的混合物,例如二氧化硅。 该方法包括使用反向掩模将涂层或膜沉积在旋转的基底上。

    SILICA-MODIFIED-FLUORIDE BROAD ANGLE ANTI-REFLECTION COATINGS
    5.
    发明申请
    SILICA-MODIFIED-FLUORIDE BROAD ANGLE ANTI-REFLECTION COATINGS 审中-公开
    二氧化硅改性氟化物广角防反射涂料

    公开(公告)号:WO2013181175A1

    公开(公告)日:2013-12-05

    申请号:PCT/US2013/042967

    申请日:2013-05-29

    CPC classification number: G02B1/115 G02B1/10 G02B1/105 G03F7/7015 G03F7/70958

    Abstract: The disclosure is directed to a coating comprising a binary metal fluoride coating consisting a high refractive index metal fluoride layer on top of a substrate, a low refractive index metal fluoride layer on top of the high refractive index layer and layer of SiO 2 or F-SiO 2 containing 0.2 wt% to 4.5 (2000ppm to 45,000 ppm) F on top of the low refractive index layer. In one embodiment the F content of F-SiO 2 is in the range of 5000 ppm to 10,000 ppm F. The high index and low index materials are each deposited to a thickness of less than or equal to 0.9 quarter wave, and the capping material is deposited to a thickness in the range of 5nm to 25nm. The disclosure is also directed to optical elements having the foregoing coating and a method of making the coating.

    Abstract translation: 本发明涉及一种包含二元金属氟化物涂层的涂层,其包含在基底顶部的高折射率金属氟化物层,在高折射率层顶部的低折射率金属氟化物层和SiO 2或F-SiO 2层 在低折射率层的顶部含有0.2重量%〜4.5(2000ppm〜45,000ppm)F。 在一个实施方案中,F-SiO 2的F含量在5000ppm至10,000ppm F的范围内。高折射率和低折射率材料各自沉积至小于或等于0.9的1/4波长,并且封盖材料为 沉积在5nm至25nm范围内的厚度。 本发明还涉及具有上述涂层的光学元件和制备该涂层的方法。

    ADHESIVE, HERMETIC OXIDE FILMS FOR METAL FLUORIDE OPTICS
    7.
    发明申请
    ADHESIVE, HERMETIC OXIDE FILMS FOR METAL FLUORIDE OPTICS 审中-公开
    用于金属氟化物光学胶的粘合氧化膜

    公开(公告)号:WO2009145871A1

    公开(公告)日:2009-12-03

    申请号:PCT/US2009/003000

    申请日:2009-05-14

    Abstract: The invention is directed to single crystal alkaline earth metal fluoride optical elements having an adhesive, hermetic coating thereon, the coating being chemically bonded to the surface of the metal fluoride optical element with a bonding energy >4 eV and not merely bonded by van de Walls forces. The materials that can be used for coating the optical elements are selected from the group consisting of SiO 2 , F-SiO 2 , Al2O 3 , F-Al2O 3 , SiON, HfO 2 , Si 3 N 4 , TiO 2 and ZrO 2 , and mixtures (of any composition) of the forgoing, for example, SiO 2 JHfO 2 and F-SiO 2 /ZrO 2 . The preferred alkali earth metal fluoride used for the optical elements is CaF 2 . Preferred coatings are SiO 2 , F-SiO 2 , SiO 2 /ZrO 2 and F-SiO 2 /ZrO 2 .

    Abstract translation: 本发明涉及在其上具有粘合剂,气密涂层的单晶碱土金属氟化物光学元件,该涂层以金属氟化物光学元件的表面化学键合,其结合能> 4eV,不仅仅由van de Walls 军队。 可用于涂覆光学元件的材料选自SiO 2,F-SiO 2,Al 2 O 3,F-Al 2 O 3,SiON,HfO 2,Si 3 N 4,TiO 2和ZrO 2,以及前述的任何组合的混合物 ,例如SiO2JHfO2和F-SiO2 / ZrO2。 用于光学元件的优选碱土金属氟化物是CaF 2。 优选的涂层是SiO 2,F-SiO 2,SiO 2 / ZrO 2和F-SiO 2 / ZrO 2。

    DENSE HOMOGENEOUS FLUORIDE FILMS FOR DUV ELEMENTS AND METHOD OF PREPARING SAME
    8.
    发明申请
    DENSE HOMOGENEOUS FLUORIDE FILMS FOR DUV ELEMENTS AND METHOD OF PREPARING SAME 审中-公开
    DENSE均质氟化物膜用于DUV元件及其制备方法

    公开(公告)号:WO2009070227A1

    公开(公告)日:2009-06-04

    申请号:PCT/US2008/012912

    申请日:2008-11-19

    Abstract: The invention is directed to optical elements that are coated with dense homogeneous fluoride films and to a method of making such coated elements. The coatings materials are a high ("H") refractive index fluoride material and a low ("L") refractive index material that are co evaporated to form a coating layer of a L-H coating material (a co deposited coating of L and H materials). Lanthanide metal fluorides (for example, neodymium, lanthanum, dysprosium, yttrium and gadolinium, and combinations thereof) are preferred metal fluorides for use as the high refractive index materials with lanthanum fluoride (LaF3)and gadolinium fluoride (GdF3) being particularly preferred. Aluminum fluoride (AlF3) and alkaline earth metal fluorides (fluorides of calcium, magnesium, barium and strontium) are the preferred low refractive index materials, with magnesium fluoride (MgF2) being a preferred alkaline earth metal fluoride.

    Abstract translation: 本发明涉及涂覆有致密的均匀氟化物膜的光学元件和制造这种涂覆元件的方法。 涂层材料是高(“H”)折射率氟化物材料和低(“L”)折射率材料,其被蒸发以形成LH涂层材料的涂层(L和H材料的共沉积涂层 )。 镧系金属氟化物(例如钕,镧,镝,钇和钆及其组合)是用作具有氟化镧(LaF 3)和氟化钆(GdF 3)的高折射率材料的优选金属氟化物。 氟化铝(AlF 3)和碱土金属氟化物(钙,镁,钡和锶的氟化物)是优选的低折射率材料,其中氟化镁(MgF 2)是优选的碱土金属氟化物。

    PLASMA ASSISTED DEPOSITION OF MO/SI MULTILAYERS
    10.
    发明申请
    PLASMA ASSISTED DEPOSITION OF MO/SI MULTILAYERS 审中-公开
    等离子体辅助沉积MO / SI多层

    公开(公告)号:WO2011137285A1

    公开(公告)日:2011-11-03

    申请号:PCT/US2011/034443

    申请日:2011-04-29

    Abstract: The disclosure is directed to multilayer Mo/Si coatings for reflective mirrors used in extreme ultraviolet lithographic systems and to a method of making such mirrors using plasma ion assisted deposition (PIAD) techniques. The coating are deposited on a substrate suitable for EUV lithography, and are Mo/Si coating consisting of 40-100 Mo/Si periods, each period consisting on a Mo layer followed by a Si layer. Each of the individual Mo and Si layers is deposited to a specified or target thickness in the range of 2nm to 5nm, and the thicknesses are controlled to 0.1nm. A plasma from a plasma source is used to densify and smooth the substrate prior to deposition of the coating, and each layer of the coating is plasma densified and smoothed.

    Abstract translation: 本公开涉及用于极紫外光刻系统的反射镜的多层Mo / Si涂层以及使用等离子体离子辅助沉积(PIAD)技术制造这种反射镜的方法。 涂层沉积在适用于EUV光刻的基板上,并且是由40-100Mo / Si周期组成的Mo / Si涂层,每个周期由Mo层和Si层组成。 将各个Mo和Si层分别沉积到2nm至5nm范围内的规定或目标厚度,并将其厚度控制在0.1nm。 使用来自等离子体源的等离子体在沉积涂层之前使衬底致密化和平滑化,并且涂层的每层是等离子体致密化和平滑化的。

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