公开(公告)号：WO2013050842A1

公开(公告)日：2013-04-11

申请号：PCT/IB2012/001717

申请日：2012-09-05

Applicant: GIGAPHOTON INC. ,  NAGANO, Hitoshi ,  WADA, Yasunori ,  YANAGIDA, Tatsuya ,  WAKABAYASHI, Osamu

Inventor： NAGANO, Hitoshi ,  WADA, Yasunori ,  YANAGIDA, Tatsuya ,  WAKABAYASHI, Osamu

IPC: H01S3/23 ,  H05G2/00 ,  G03F7/20 ,  G02F1/03 ,  H01S3/00

CPC classification number: H05G2/008 ,  G03F7/70025 ,  G03F7/70033 ,  G03F7/70041 ,  G21K1/062 ,  H01L21/0275 ,  H01S3/005 ,  H01S3/10038 ,  H01S3/1075 ,  H01S3/115 ,  H01S3/1305 ,  H01S3/1643 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S5/4087 ,  H05G2/005

Abstract: A system (11A) for generating extreme ultraviolet light, in which a target material (27) inside a chamber (2A) is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus (40) configured to output a first laser beam (41), a second laser apparatus (3A) configured to output a second laser beam having a pedestal and a peak portion, and a controller (5A)connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the peak portion having higher energy than the pedestal to be outputted after the pedestal.

Abstract translation: 一种用于产生极紫外光的系统（11A），其中在室（2A）内部的目标材料（27）被照射成等离子体的激光束，包括第一激光装置（40），其被配置为输出第一 激光束（41），被配置为输出具有基座和峰值部分的第二激光束的第二激光装置（3A）和连接到第一和第二激光装置的控制器（5A），并被配置为使第一激光束 首先输出要在第一激光束之后输出的基座，并且峰值部分具有比基座更高的能量以在基座之后输出。

公开(公告)号：WO2012131452A1

公开(公告)日：2012-10-04

申请号：PCT/IB2012/000409

申请日：2012-03-05

Applicant: GIGAPHOTON INC. ,  NAKARAI, Hiroaki ,  WAKABAYASHI, Osamu ,  HOSHINO, Hideo

Inventor： NAKARAI, Hiroaki ,  WAKABAYASHI, Osamu ,  HOSHINO, Hideo

IPC: H01S3/131 ,  H01S3/13 ,  H01S3/23 ,  H05G2/00 ,  H01S3/134 ,  H01S3/107

CPC classification number: H01S3/0057 ,  H01S3/107 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S3/2391 ,  H05G2/008

Abstract: A laser apparatus may include a seed laser device configured to output a pulse laser beam, a pulse energy adjusting unit configured to vary pulse energy of the pulse laser beam, at least one amplifier for amplifying the pulse laser beam, at least one power source for varying an excitation intensity in the at least one amplifier, and a controller configured to control the pulse energy adjusting unit on a pulse-to-pulse basis for the pulse laser beam passing therethrough and to control the at least one power source for a group of multiple pulses of the pulse laser beam.

Abstract translation: 激光装置可以包括配置成输出脉冲激光束的种子激光装置，被配置为改变脉冲激光束的脉冲能量的脉冲能量调节单元，至少一个用于放大脉冲激光束的放大器，至少一个用于 改变所述至少一个放大器中的激发强度，以及控制器，被配置为基于脉冲至脉冲基准控制所述脉冲能量调节单元，以使所述脉冲激光束通过其中并且控制所述至少一个电源 多脉冲脉冲激光束。

公开(公告)号：WO2011122689A1

公开(公告)日：2011-10-06

申请号：PCT/JP2011/058468

申请日：2011-03-25

Applicant: GIGAPHOTON INC. ,  YANAGIDA, Tatsuya ,  WAKABAYASHI, Osamu

Inventor： YANAGIDA, Tatsuya ,  WAKABAYASHI, Osamu

IPC: H05G2/00

CPC classification number: H01S3/10061 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/2308 ,  H01S3/2383 ,  H01S2301/20 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

Abstract translation: 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 室; 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。

公开(公告)号：WO2011115025A1

公开(公告)日：2011-09-22

申请号：PCT/JP2011/055861

申请日：2011-03-07

Applicant: GIGAPHOTON INC. ,  SUGANUMA, Takashi ,  NOWAK, Krzysztof ,  WAKABAYASHI, Osamu

Inventor： SUGANUMA, Takashi ,  NOWAK, Krzysztof ,  WAKABAYASHI, Osamu

IPC: H01S3/23 ,  H01S3/03 ,  H05G2/00

CPC classification number: H01S3/05 ,  B82Y20/00 ,  H01S3/0315 ,  H01S3/08031 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2232 ,  H01S3/2325 ,  H01S3/235 ,  H01S3/2366 ,  H01S3/2375 ,  H01S5/042 ,  H01S5/06 ,  H01S5/14 ,  H01S5/3401

Abstract: A regenerative amplifier (20) according to one aspect of this disclosure is used in combination with a laser device, and the regenerative amplifier may include: a pair of resonator mirrors (21a, 21b) constituting an optical resonator; a C02 slab amplifier (25) provided between the pair of the resonator mirrors for amplifying a laser beam with a predetermined wavelength outputted from the laser device; and an optical system (26, 27) disposed to configure a multipass optical path (C2) along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position (la) as an optical image of the laser beam at a second position (lb).

Abstract translation: 根据本公开的一个方面的再生放大器（20）与激光装置组合使用，再生放大器可以包括：构成光谐振器的一对谐振器镜（21a，21b） 设置在该对谐振镜之间用于放大从激光装置输出的预定波长的激光束的CO 2板放大器（25） 以及光学系统（26,27），被配置为配置激光束沿着平板放大器往复运动的多通道光路（C2），所述光学系统将第一位置（1a）处的激光束的光学图像作为 在第二位置（lb）处的激光束的光学图像。

公开(公告)号：WO2013104947A1

公开(公告)日：2013-07-18

申请号：PCT/IB2012/002781

申请日：2012-12-21

Applicant: GIGAPHOTON INC. ,  MORIYA, Masato ,  WAKABAYASHI, Osamu

Inventor： MORIYA, Masato ,  WAKABAYASHI, Osamu

IPC: H05G2/00

CPC classification number: H05G2/008 ,  B23K26/06 ,  G02B19/009 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/2316

Abstract: A device is provided for controlling a laser beam. The device may include a first wavefront adjuster (81) provided in a beam path of a laser beam outputted from a laser apparatus (3), a beam delivery unit (50) provided in a beam path of the laser beam from the first wavefront adjuster, a second wavefront adjuster (82) provided in a beam path of the laser beam from the beam delivery unit, a beam monitor (57) provided in a beam path of the laser beam from the second wavefront adjuster, and a controller (58) configured to control the first and second wavefront adjusters based on a detection result of the beam monitor. An extreme ultraviolet light apparatus including the device is also provided.

Abstract translation: 提供了一种用于控制激光束的装置。 设备可以包括设置在从激光装置（3）输出的激光束的光束路径中的第一波前调整器（81），设置在来自第一波前调整器的激光束的光束路径中的光束传送单元 ，设置在来自光束传送单元的激光束的光束路径中的第二波前调整器（82），设置在来自第二波前调整器的激光束的光束路径中的光束监视器（57），以及控制器（58） 被配置为基于所述波束监视器的检测结果来控制所述第一和第二波前调整器。 还提供了包括该装置的极紫外光装置。

公开(公告)号：WO2012131455A1

公开(公告)日：2012-10-04

申请号：PCT/IB2012/000443

申请日：2012-03-08

Applicant: GIGAPHOTON INC. ,  WAKABAYASHI, Osamu

Inventor： WAKABAYASHI, Osamu

IPC: H01S3/00 ,  H01S3/134 ,  H01S3/13 ,  H01S3/23

CPC classification number: H01S3/10007 ,  H01S3/0057 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S3/2391

Abstract: A laser apparatus for generating extreme ultraviolet (EUV) light at a wavelength of approximately 13 nm is provided. The laser apparatus may be combined with a reduced projection reflective optical system. Systems and methods for generating EUV light are also provided.

Abstract translation: 提供了用于产生波长约13nm的极紫外（EUV）光的激光装置。 激光装置可以与缩小投影反射光学系统组合。 还提供了用于产生EUV灯的系统和方法。

公开(公告)号：WO2012114172A1

公开(公告)日：2012-08-30

申请号：PCT/IB2012/000222

申请日：2012-02-08

Applicant: GIGAPHOTON INC. ,  MIYAO, Kenichi ,  NIWANO, Motoki ,  WAKABAYASHI, Osamu

Inventor： MIYAO, Kenichi ,  NIWANO, Motoki ,  WAKABAYASHI, Osamu

IPC: H01S3/23 ,  H01S3/10 ,  G03F7/20

CPC classification number: H01S3/10046 ,  G03F7/70025 ,  G03F7/70033 ,  H01S3/0085 ,  H01S3/09702 ,  H01S3/10007 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S5/4025 ,  H05G2/005 ,  H05G2/008

Abstract: A laser apparatus may include a master oscillator configured to output a laser beam, at least one amplifier disposed in a beam path of the laser beam from the master oscillator, at least one power source for applying a high-frequency voltage to the at least one amplifier, and a controller for varying the high-frequency voltage to be applied to the at least one amplifier from the at least one power source.

Abstract translation: 激光装置可以包括主振荡器，其被配置为输出激光束，至少一个放大器，设置在来自主振荡器的激光束的光束路径中，至少一个电源，用于将至少一个高频电压 放大器和控制器，用于改变要从至少一个电源施加到至少一个放大器的高频电压。

公开(公告)号：WO2012110847A1

公开(公告)日：2012-08-23

申请号：PCT/IB2011/003183

申请日：2011-12-29

Applicant: GIGAPHOTON INC. ,  SOMEYA, Hiroshi ,  WATANABE, Yukio ,  WAKANA, Katsuhiko ,  WAKABAYASHI, Osamu

Inventor： SOMEYA, Hiroshi ,  WATANABE, Yukio ,  WAKANA, Katsuhiko ,  WAKABAYASHI, Osamu

IPC: G02B7/18 ,  G03F7/20

CPC classification number: G02B7/181 ,  G02B5/0891 ,  G02B5/10 ,  G03F7/70033 ,  G03F7/70175

Abstract: A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.

Abstract translation: 反射镜装置可以包括：反射镜，包括基板，在基板的第一表面上的反射膜，以及在基板的第二表面上的多个第一突起; 多个用于分别支撑多个第一突起的支撑部分，每个支撑部分具有形成在其中的槽，用于引导第一突起; 以及多个夹具，用于分别将多个第一突起抵靠在多个支撑部中的相应凹槽上。

公开(公告)号：WO2012073087A1

公开(公告)日：2012-06-07

申请号：PCT/IB2011/002795

申请日：2011-11-23

Applicant: GIGAPHOTON INC. ,  MORIYA, Masato ,  WAKABAYASHI, Osamu

Inventor： MORIYA, Masato ,  WAKABAYASHI, Osamu

IPC: G03F7/20 ,  H01S3/13 ,  H05G2/00

CPC classification number: G03F7/708 ,  G03F7/70008 ,  G03F7/7085 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/2253 ,  H01S3/2316 ,  H05G2/008

Abstract: An optical device ( 100 ) may include a mirror ( 30 ) for respectively reflecting and transmitting parts of a first laser beam ( L2 ) as first reflected and first transmitted beams, and for respectively transmitting and reflecting parts of a second laser beam ( L3 ) as second transmitted and second reflected beams; an optical system disposed so that the first and second laser beams are such that beam paths of the first transmitted and second reflected beams are parallel or substantially coincide, or such that beam paths of the first reflected and second transmitted beams are parallel or substantially coincide; first and second measuring units (D31; D32 ) configured to respectively measure a beam parameter of the first transmitted or first reflected beams, and of the second reflected or second transmitted beams; and first and second adjusting units ( 11; 21 ) configured to adjust the first and second laser beams based on measurement results by the measuring units.

Abstract translation: 光学装置（100）可以包括用于分别反射和透射作为第一反射和第一透射光束的第一激光束（L2）的部分的反射镜（30），并且用于分别透射和反射第二激光束（L3）的部分， 作为第二透射和第二反射光束; 光学系统设置成使得第一和第二激光束使得第一透射和第二反射光束的光束路径平行或基本重合，或使得第一反射和第二透射光束的光束路径平行或基本重合; 第一和第二测量单元（D31; D32），其被配置为分别测量第一透射或第一反射光束以及第二反射或第二透射光束的光束参数; 以及第一和第二调整单元（11; 21），其被配置为基于测量单元的测量结果来调节第一和第二激光束。

公开(公告)号：WO2012066402A1

公开(公告)日：2012-05-24

申请号：PCT/IB2011/002663

申请日：2011-11-10

Applicant: GIGAPHOTON INC. ,  NOWAK, Krzysztof ,  SUGANUMA, Takashi ,  WAKABAYASHI, Osamu

Inventor： NOWAK, Krzysztof ,  SUGANUMA, Takashi ,  WAKABAYASHI, Osamu

IPC: H01S3/00 ,  H01S3/03 ,  H01S3/23 ,  H05G2/00

CPC classification number: H01S3/0315 ,  H01S3/005 ,  H01S3/0407 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2366 ,  H05G2/008

Abstract: An EUV light generation system (100) includes a driver laser (101) comprising a master oscillator (10) such as a semiconductor laser, a spatial filter (20), gas slab amplification devices (30a, 30b), relay optical systems (R1-R4), and high-speed axial -flow amplifiers (MA1, MA2). The slab amplification devices include beam adjusting optical units (31, 32) disposed, respectively, at input and output sides of the slab amplifiers SA to convert the beam profile and/or polarization direction of the laser beam such that the polarization direction and/or an elongated direction of the beam profile within the slab amplifiers is parallel to a free space axis AF of the slab waveguides, i.e. parallel to the discharge electrodes (331, 332).

Abstract translation: EUV光发生系统（100）包括：驱动激光器（101），其包括诸如半导体激光器的主振荡器（10），空间滤波器（20），气体平板放大装置（30a，30b），中继光学系统 -R4）和高速轴流放大器（MA1，MA2）。 平板放大装置包括分别设置在平板放大器SA的输入和输出侧的光束调节光学单元（31,32），以转换激光束的光束分布和/或偏振方向，使得偏振方向和/或 平板放大器内的光束轮廓的细长方向平行于平板波导的自由空间轴AF，即平行于放电电极（331,332）。