Abstract:
The present invention provides a unique and novel way of producing vinyl phenols such as poly(4-hydroxystyrene) (PHS). In this new process, 4-hydroxyphenylmethylcarbinol (HPMC) is heated under suitable conditions of temperature and pressure and for a sufficient period of time to form the poly(4-hydroxystyrene) (PHS).
Abstract:
Amines endowed with chain extension activity for formulations such as polyureas and polyurethanes are disclosed, which have general formula (A) wherein n is 1-1000 and m is 1-100; R1 and R2 are from the group -C2H4- and C3H6-; and R3 and R4 are each independently selected from the group consisting of H, -CH3, -CH2CH3, -CH2OH, and -CH2-CH2-OH; and the diastereomeric salts thereof.
Abstract:
The present invention provides a unique and novel way of producing vinyl phenols such as poly(4-hydroxystyrene) (PHS). In this new process, p- alpha -aminoethylphenol (AEP) is heated under suitable conditions of temperature and pressure and for a sufficient period of time to form the poly(4-hydroxystyrene) (PHS).
Abstract:
The present invention provides a unique and novel way of producing 4-acetoxystyrene. In this new process, 4-hydroxystyrene is acetylated, in the presence of an acetylation agent, under suitable conditions of temperature and pressure and for a sufficient period of time to form acetoxystyrene.
Abstract:
The present invention provides a unique and novel way of producing vinyl phenols such as p-vinyl phenol(4-hydroxystyrene-HSM). In this new process, p- alpha -aminoethylphenol (AEP) is heated under suitable deamination conditions of temperature and pressure and for a sufficient period of time to form the 4-hydroxystyrene (HSM).
Abstract:
Substituted phenyl compounds endowed with chain extension activity for formulations such as polyurethanes are disclosed, and which have general formula (I) wherein n is 1-1000 and m is 1-100; and R1 and R2 are each independently selected from the group -C2H4- and -C3H6-; and R3 is from the group consisting of (a), and (b) and the diasteromeric salts thereof.
Abstract translation:公开了用于制剂如聚氨酯的取代的具有延伸活性的取代的苯基化合物,其具有通式(I),其中n为1-1000,m为1-100; 并且R 1和R 2各自独立地选自-C 2 H 4 - 和-C 3 H 6 - ; 并且R 3是由(a)和(b)组成的组及其非对映体盐。
Abstract:
The invention relates to the use of thermally stable, water-insoluble and alkali-soluble polyalkylated phenolic resins in photosensitive compositions, where the polyalkylated resin is a reaction product of a carboxylic acid and at least one substituted phenyl carbinol. The invention also relates to the use of these photosensitive compositions in manufacturing semiconductor devices.
Abstract:
The invention relates to the use of a mixture of film forming water-insoluble and alkali-soluble novolak resin and thermally stable, alkali-soluble and water-insoluble polyalkylated resin in photosensitive compositions where the polyalkylated resin is a reaction product of a carboxylic acid and at least one substituted phenyl carbinol. The present invention also relates to a method for producing a semiconductor device by coating, imaging and developing the photosensitive composition containing a mixture of novolak resin and the polyalkylated resin of this invention.
Abstract:
The present invention provides a unique and novel way of producing polyhydroxystyrene which comprises the steps of (a) heating 4-hydroxyacetophenone under suitable hydrogenation conditions of temperature and pressure in the presence of a suitable palladium catalyst and for a sufficient period of time to form 4-hydroxyphenylmethyl-carbinol; (b) heating 4-hydroxyphenylmethyl-carbinol under suitable conditions of temperature and pressure and for a sufficient period of time to form said polyhydroxystyrene.
Abstract:
Di-amines endowed with chain extension activity for formulations such as polyureas and polyurethanes are disclosed, and which have general formula (1) wherein n is 0-1000 and m is 0-100; R1, R2, R5, and R6 are each independently selected from the group consisting of H, -CH3, -CH2CH3, -CH2OH, and -CH2-CH2-OH; and R3 and R4 are each independently selected from the group consisting of -C2H4-; and -C3H6-; and the diasteromeric salts thereof.