Abstract:
The present invention discloses a sliding window system for a multistoried building, which has structural strength to endure external wind pressure and also allows natural ventilation of the indoor space. The sliding window system for a multistoried building comprises a curtain wall including a plurality of transoms and mullions and having a plurality of window installation spaces formed by the transoms and the mullions; a plurality of fixed windows disposed in some of the window installation spaces of the curtain wall, each fixed window comprising at least one fixed window frame mounted fixedly to two transoms and two mullions; and at least one sliding window disposed in the window installation space and mounted to two mullions and two transoms to be opened and closed. Here, each sliding window comprises a sliding window frame slidably mounted to rails mounted to the corresponding transoms and a fixed window frame fixed to the transoms and the mullions. In addition, each of the fixed window frame of the sliding window and the fixed window frame of the fixed window comprises upper and lower horizontal frames respectively fixed to the transoms and two vertical frames disposed at both ends of the horizontal frames and fixed to the mullions.
Abstract:
The present invention relates to a substrate stacked image sensor having a dual detection function. In the substrate stacked image sensor, first to fourth photodiodes are disposed on a first substrate, and a fifth photodiode is disposed on a second substrate to couple the first to fourth photodiodes to the fifth photodiode when the substrates are stacked and coupled to each other, thereby providing a complete photodiode for one pixel. The image sensor may selectively read signals separately detected in each of the photodiodes or read all of the signals as necessary. To this end, the first to fourth photodiodes are disposed on the first substrate, and the fifth photodiode is disposed on the second substrate. Then, the first to fourth photodiodes and the fifth photodiode electrically contact each other so that the first and second substrates have different pixel arrays and thus different sensor resolutions.
Abstract:
Disclosed are a 4T-4S step & repeat unit pixel used in an image sensor and an image sensor having the same. The 4T-4S step & repeat unit pixel has four diffusion area patterns for photodiodes and three diffusion area patterns for an image signal conversion circuit. An aperture ratio of the image sensor increases in maximum by using four photodiodes arranged in a diagonal direction from each other and three diffusion area patterns arranged between the photodiodes near their edges.
Abstract:
A separation type unit pixel of an image sensor, which can handle light that incidents onto a photodiode at various angles, and provides a zoom function in a mini camera module by securing an incident angle margin, and a manufacturing method thereof are provided. The separation type unit pixel having a 3D structure for an image sensor, composed of a plurality of transistors, includes: a first wafer which includes a photodiode, a transfer transistor, a node of a floating diffusion area functioning as static electricity for converting electric charge into a voltage, and a pad connecting the floating diffusion area and the transfer transistor to an external circuit, respectively; a second wafer which includes the rest of the circuit elements constituting a pixel (i.e., a reset transistor, a source-follower transistor, and a blocking switch transistor), a read-out circuit, a vertical/horizontal decoder, a correlated double sampling (CDS) circuit which involves in a sensor operation and an image quality, an analog circuit, an analog-digital converter (ADC), a digital circuit, and a pad connecting each pixel; and a connecting means which connects the pad of the first wafer and the pad of the second wafer. Accordingly, by forming an area for a photodiode and an area for a pixel almost the same, an image sensor can be manufactured to have a good sensitivity, without having to use a micro lens. In addition, by disposing the photodiode at the top layer, an incident angle margin of incident light can be secured, which has to be basically provided by the sensor for its auto focusing function or zoom function.
Abstract:
Provided are a diagnosis device in which a bio-chemical reaction between a reference sample and a target sample occurs and a result of the bio-chemical reaction can be detected and a method of manufacturing the diagnosis device. The diagnosis device includes an image sensor where a plurality of photo-detectors are formed; a polymer layer which is made of a polymer material and formed on an upper portion of the image sensor; and a plurality of wells which are formed corresponding to the plurality of photo-detectors on the polymer layer, wherein an inner portion of each well is empty.
Abstract:
The present invention relates to an image sensor in which substrates are stacked. In the multi-substrate image sensor according to the present invention, a first photodiode is disposed on a first substrate, and a second photodiode is disposed on a second substrate. Then, the two substrates are aligned with and bonded to each other to electrically connect the two photodiodes to each other, thereby manufacturing an integrated photodiode within one pixel.
Abstract:
Disclosed is a 4T-2S step & repeat unit cell obtained by combining four image sensor unit cells each having four transistors into a single unit. A 4T-2S step & repeat unit cell includes a first photodiode diffusion area pattern, a second photodiode diffusion area pattern, a third photodiode diffusion area pattern, a fourth photodiode diffusion area pattern, a first image signal conversion circuit diffusion area pattern, and a second image signal conversion circuit diffusion area pattern. The second photodiode diffusion area pattern is formed in a diagonal direction from the first photodiode diffusion area pattern. The third photodiode diffusion area pattern is formed above the first photodiode diffusion area pattern beside the second photodiode diffusion area pattern. The fourth photodiode diffusion area pattern is formed in a diagonal direction from the third photodiode diffusion area pattern above the second photodiode diffusion area pattern. The first image signal conversion circuit diffusion area pattern is formed beside the first photodiode diffusion area pattern below the second photodiode diffusion area pattern. The second image signal conversion circuit diffusion area pattern is formed above the third photodiode diffusion area pattern beside the fourth photodiode diffusion area pattern.
Abstract:
Provided is a unit pixel suppressing a dead zone and an afterimage. The unit pixel includes: one or more photodiodes generating image charges corresponding to a received image signal; and one or more transfer transistors for transferring the image charges to a floating diffusion area by performing switching operations in response to a transfer control signal, wherein portions of the one or more photodiode areas, which are close to gate terminals of the corresponding transfer transistors have higher concentration of impurity ions than the remaining portions, wherein an equipotential surface having the highest or lowest voltage level among equipotential surfaces is disposed at the portions of the photodiode areas close to the gate terminals of the transfer transistors, or wherein the portions of the photodiode areas close to the gate terminals of the transfer transistors have a depth deeper than the remaining portions of the photodiode.
Abstract:
Provided are a unit pixel for improving sensitivity in low illumination conditions and a method of manufacturing the unit pixel. The unit pixel includes: a photodiode generating image charges corresponding to an image signal; a transfer transistor transferring the image charges to a floating diffusion area; and a reset transistor having a terminal connected to the floating diffusion area and the other terminal applied with a power supply, wherein concentration of impurity ions implanted into the floating diffusion area is lower than concentration of impurity ions implanted into a diffusion area of the reset transistor applied with the power supply.
Abstract:
Provided are a separation type unit pixel for preventing sensitivity reduction to prevent a depletion area from decreasing and a method of driving the unit pixel. The separation type unit pixel for preventing sensitivity reduction includes: a substrate; a photodiode constructed with a junction of a P-type diffusion area and an N-type diffusion area which are formed under a surface of the substrate in a vertical direction; a gate electrode conductor which is disposed on an upper portion of the surface of the substrate to be adjacent to the N-type or P-type diffusion area; a floating diffusion area formed to be adjacent to another surface of the gate electrode conductor; and a sensitivity reduction preventing conductor disposed on an upper portion of the photodiode area to cover the photodiode area.