Abstract:
A method of fabricating a microwell in an array structure is disclosed herein. The array structure includes a plurality of field effect transistors (FETs), where each FET has a gate structure. The method includes disposing a titanium nitride (TiN) layer on at least one conductive layer coupled to the gate structure of at least one FET. A insulation layer is disposed on the array structure, where the insulation layer lies above the TiN layer. Further, an opening above the gate structure of the at least one FET is etched to remove the insulation layer above the gate structure and to expose the TiN layer. A microwell with at least one sidewall formed from the insulation layer and with a bottom surface formed from the TiN layer is a result of the etching process. The gate structure is specified as a floating gate structure and the FET is an ISFET.
Abstract:
In one embodiment, a chemical sensor is described. The chemical sensor includes a chemically-sensitive field effect transistor including a floating gate conductor having an upper surface. A material defines an opening extending to the upper surface of the floating gate conductor. The material comprises a first dielectric underlying a second dielectric. A conductive element contacts the upper surface of the floating gate conductor and extends a distance along a sidewall of the opening, the distance defined by a thickness of the first dielectric.
Abstract:
A system includes a sensor including a sensor pad and includes a well wall structure defining a well operatively connected to the sensor pad. The sensor pad is associated with a lower surface of the well. The well wall structure defines an upper surface and a wall surface extending between the upper surface and the lower surface. The upper surface is defined by an upper buffer material having a high intrinsic buffer capacity of at least 2x 10 17 hydroxyl groups/m 2 at pH=7. The wall surface is defined by a wall material having a low intrinsic buffer capacity of not greater than 1.7x10 17 hydroxyl groups/m 2 at pH=7.
Abstract translation:一种系统包括传感器,其包括传感器垫,并且包括限定可操作地连接到传感器垫的井的井壁结构。 传感器垫与井的下表面相关联。 井壁结构限定了在上表面和下表面之间延伸的上表面和壁表面。 上表面由在pH = 7时具有至少2×10 17个羟基/ m 2的高本征缓冲能力的上缓冲材料限定。 壁表面由在pH = 7时具有不大于1.7×10 17个羟基/ m 2的低本征缓冲能力的壁材料限定。
Abstract:
An apparatus includes a substrate, a gate structure disposed over the substrate and having an upper surface, a well structure disposed over the substrate and defining a well over the upper surface of the gate structure, a conductive layer disposed on the upper surface of the gate structure and at least partially extending along a wall of the well in the well structure, and a dielectric structure disposed over the well structure and defining an opening to the well.
Abstract:
In one implementation, a chemical detection device is described herein. The device includes a chemically-sensitive field effect transistor including a floating gate conductor having an upper surface. A dielectric material defines a cavity extending to the upper surface of the floating gate conductor. A conductive layer is on a sidewall of the cavity and electrically communicating with the floating gate conductor. An inner surface of the conductive layer defines a well for the sensor.
Abstract:
In one embodiment, a chemical sensor is described. The chemical sensor includes a chemically-sensitive field effect transistor including a floating gate conductor having an upper surface, a first opening extending through a first material and through a portion of a second material located on the first material and a second opening extending from the bottom of the first opening to the top of a liner layer located on the upper surface of the floating gate conductor.
Abstract:
The device includes a material defining a reaction region. The device includes a plurality of chemically-sensitive field effect transistors (chemFET) each having a common floating gate (370) in communication with the reaction region. The device also includes a circuit to obtain respective output signals from the chemically- sensitive field effect transistors indicating an analyte within the reaction region.
Abstract:
The device includes a material defining a reaction region. The device includes a plurality of chemically-sensitive field effect transistors (chemFET) each having a common floating gate (370) in communication with the reaction region. The device also includes a circuit to obtain respective output signals from the chemically- sensitive field effect transistors indicating an analyte within the reaction region.
Abstract:
In one embodiment, a chemical sensor is described. The chemical sensor includes a chemically-sensitive field effect transistor including a floating gate conductor having an upper surface. A material defines an opening extending to the upper surface of the floating gate conductor, the material comprising a first dielectric underlying a second dielectric. A conductive element contacts the upper surface of the floating gate conductor and extending a distance along a sidewall of the opening.
Abstract:
In one implementation, a chemical device is described. The sensor includes a chemically-sensitive field effect transistor including a floating gate structure having a plurality of floating gate conductors electrically coupled to one another. A conductive element overlies and is in communication with an uppermost floating gate conductor in the plurality of floating gate conductors. The conductive element is wider and thinner than the uppermost floating gate conductor. A dielectric material defines an opening extending to an upper surface of the conductive element.