2-PYRIDONE DERIVATIVES AS NETROPHIL ELASTASE INHIBITORS AND THEIR USE
    2.
    发明申请
    2-PYRIDONE DERIVATIVES AS NETROPHIL ELASTASE INHIBITORS AND THEIR USE 审中-公开
    2-PYRIDONE衍生物作为网络弹性酶抑制剂及其使用

    公开(公告)号:WO2005026124A1

    公开(公告)日:2005-03-24

    申请号:PCT/SE2004/001336

    申请日:2004-09-15

    CPC classification number: C07D213/82 C07D213/85 C07D401/04

    Abstract: There are provided novel compounds of formula (I), wherein R 1 , R 2 , R 4 , R 5 , G 1 , G 2 , L, Y and n are as defined in the Specification and optical isomers, racemates and tautomers thereof, and pharmaceutically acceptable salts thereof; together with processes for their preparation, compositions containing them and their use in therapy. The compounds are inhibitors of neutrophil elastase.

    Abstract translation: 提供新的式(I)化合物,其中R 1,R 2,R 4,R 5,G 1,G 2,L,Y和n如上定义 在规格和光学异构体中,其外消旋体和互变异构体及其药学上可接受的盐; 以及其制备方法,含有它们的组合物及其在治疗中的用途。 这些化合物是嗜中性粒细胞弹性蛋白酶抑制剂。

    PLASMA DEPOSITION APPARATUS AND METHOD FOR MAKING HIGH-PURITY SILICON
    3.
    发明申请
    PLASMA DEPOSITION APPARATUS AND METHOD FOR MAKING HIGH-PURITY SILICON 审中-公开
    等离子体沉积装置和制造高纯度硅的方法

    公开(公告)号:WO2011094662A1

    公开(公告)日:2011-08-04

    申请号:PCT/US2011/023109

    申请日:2011-01-31

    Abstract: A plasma deposition apparatus for making high purity silicon, including a chamber for depositing said high purity silicon, the chamber including a top defining substantially an upper end of die chamber; one or more sides having an upper end and a lower end, the top substantially sealingly joining the upper end of the one or more sides; a base defining substantially a lower end of the chamber, the base substantially sealingly joining the lower end of the one or more sides; and at least one induction coupled plasma torch disposed in the top, the at least one induction coupled plasma torch oriented in a substantially vertical position producing a plasma flame downward from the top towards the base, the plasma flame defining a reaction zone for reacting one or more reactants to produce the high purity silicon. In addition, methods for collecting molten silicon are also provided.

    Abstract translation: 一种用于制造高纯度硅的等离子体沉积设备,包括用于沉积所述高纯度硅的室,所述室包括基本上限定模腔的上端的顶部; 一个或多个侧面具有上端和下端,顶部基本上密封地连接一个或多个侧面的上端; 基部基本上限定所述腔室的下端,所述基座基本上密封地连接所述一个或多个侧面的下端; 以及设置在顶部中的至少一个感应耦合等离子体焰炬,所述至少一个感应耦合等离子体焰炬在基本垂直的位置上取向,从顶部朝向底部产生等离子体火焰,所述等离子体火焰限定用于使一个或 更多的反应物产生高纯硅。 此外,还提供了收集熔融硅的方法。

    SYSTEM FOR PROVIDING STEP OUT COMMISSIONS AND COMPENSATION FOR RESEARCH BROKERS

    公开(公告)号:WO2005079268A3

    公开(公告)日:2005-09-01

    申请号:PCT/US2005/004234

    申请日:2005-02-11

    Abstract: In a trading environment that comprises buy side traders and securities brokers, a computer process capable of preventing securities brokers from receiving information irrelevant to a commission payment for a securities transaction. The process comprises means for providing an overview of commission payments for a predetermined time period, means for providing details of step-out payments for the predetermined period, means for adjusting step-in amounts and frequencies, means for providing notification that a commission payment has been stepped out and is capable of being credited, means for automatically suggesting and performing step-ins and step-outs, and means for assessing the step-outs and step-ins against a predetermined budget.

    AZAINDOLE COMPOUNDS AS KINASE INHIBITORS
    8.
    发明申请
    AZAINDOLE COMPOUNDS AS KINASE INHIBITORS 审中-公开
    AZAINDOLE化合物作为激酶抑制剂

    公开(公告)号:WO2004099205A1

    公开(公告)日:2004-11-18

    申请号:PCT/SE2004/000696

    申请日:2004-05-06

    CPC classification number: C07D471/04

    Abstract: The present invention relates to novel azaindole compounds which are kinase inhibitors, methods for their preparation intermediates and pharmaceutical compositions comprising them.

    Abstract translation: 本发明涉及作为激酶抑制剂的新型氮杂吲哚化合物,其制备中间体的方法和包含它们的药物组合物。

    BEUTELVERPACKUNG
    9.
    发明申请
    BEUTELVERPACKUNG 审中-公开
    袋包装

    公开(公告)号:WO2012045424A1

    公开(公告)日:2012-04-12

    申请号:PCT/EP2011/004912

    申请日:2011-10-03

    CPC classification number: B65D33/007 B65D31/02 B65D75/30 B65D75/58 B65D75/5855

    Abstract: Bei einer Beutelverpackung mit aus wenigstens einer flexiblen Verpackungsfolie gebildeter Beutelfrontwand (12) und Beutelruckwand (14) zum Verpacken von fliessfähigem Füllgut (11) sind die Beutelfrontwand (12) und die Beutelrückwand (14) über eine Siegelnaht (24) miteinander verbunden. Die Siegelnaht (24) ist in einem an einen Siegelrand (16) angrenzenden Bereich zu einer vom Siegelrand (16) weg gerichteten Siegelzone (26) mit einem vom Siegelrand (16) am weitesten entfernten freien Ende (27) erweitert. Die Beutelfrontwand (12) weist auf der gegen die Aussenseite der Beutelverpackung gerichteten Seite eine Aussenschicht (28) auf. Die Aussenschicht (28) und der unter der Aussenschicht (28) liegenden Teil (29) der Beutelfrontwand (12) begrenzen in einem das freie Ende (27) der Siegelzone (26) einschliessenden, sich bis zu einer Randkante (17) des Siegelrandes (16) erstreckenden Flächenbereich?eine Auslaufzone (30) für das Füllgut (11). Bei Druckbeaufschlagung bildet sich in dem unter der Aussenschicht (28) liegenden Teil (29) der Beutelfrontwand (12) im Bereich des freien Endes (27) der Siegelzone (26) ein Riss (38) und das Füllgut (11) tritt in die Auslaufzone (30) ein und an der Randkante (17) des Siegelrandes (16) aus der Beutelverpackung aus.

    Abstract translation: 在至少一个柔性包装膜形成的袋的前壁(12)和袋后面板(14)用于包装可流动的填充材料(11)的外包装包装,袋的前壁(12),并通过相互连接的密封接缝(24)在袋的后壁(14)。 密封接缝(24)是离在引导到密封边缘(16)区域邻近所述密封边缘(16)的密封区域(26)配有一个从密封边缘(16)从自由端(27)最远的延伸。 该袋的前壁(12)具有上朝向袋侧的外侧侧面的外层(28)。 袋子前墙的外层(28)和所述外层(28)位于部分(29)(12)在密封区的自由端(27),其限定(26)包围,向上延伸至所述密封边缘的外周边缘(17)( 16)延伸的表面区域?用于填充材料(11排出区(30))。 当压力施加到袋的前壁(12),形成裂纹(38)和填充材料(11)在在密封区的自由端(27)的区域中的外层(28)位于部分(29)根据(26)进入出口区 (30)和从所述袋包装的密封边缘(16)的周缘(17)。

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