公开(公告)号：WO2003075368A3

公开(公告)日：2003-09-12

申请号：PCT/US2003/006048

申请日：2003-02-28

Applicant: BOARD OF CONTROL OF MICHIGAN TECHNOLOGICAL UNIVERSITY ,  BERGSTROM, Paul, L. ,  TROMBLEY, Melissa, L.

Inventor： BERGSTROM, Paul, L. ,  TROMBLEY, Melissa, L.

IPC: H01L21/00

Abstract: A method of performing regional heating of a system having a substrate. The method may include applying a thin film to the system, and controllably energizing a coil positioned near the thin film. The energized coils thereby generate a magnetic flux. The method further includes inducing a current in the thin film with the magnetic flux thereby heating the system.

公开(公告)号：WO2015073640A1

公开(公告)日：2015-05-21

申请号：PCT/US2014/065403

申请日：2014-11-13

Applicant: MICHIGAN TECHNOLOGICAL UNIVERSITY

Inventor： DAUNAIS, Thomas ,  BERGSTROM, Paul, L.

IPC: H01L21/00

CPC classification number: G01N33/54386 ,  B82Y10/00 ,  B82Y40/00 ,  G01N27/127 ,  G01N27/4146 ,  G01N33/552 ,  G01N33/56916 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02236 ,  H01L21/02255 ,  H01L21/02266 ,  H01L21/0273 ,  H01L21/30604 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/311 ,  H01L29/0673 ,  H01L29/16 ,  H01L29/66439 ,  H01L29/775

Abstract: A method for fabricating silicon nanowires. The method includes the steps of: depositing a silicon nitride layer on a silicon on insulator (SOI) starting wafer; patterning the silicon nitride to define at least one silicon microbar; etching the SOI starting wafer to expose the at least one silicon microbar, wherein the at least one microbar is surrounded by a raised perimeter; growing a silicon oxide layer on the raised perimeter of the at least one microbar; and etching a portion of the at least one silicon microbar to produce at least one silicon nanowire adjacent the silicon oxide layer.

Abstract translation: 一种制造硅纳米线的方法。 该方法包括以下步骤：在绝缘体上硅（SOI）起始晶片上沉积氮化硅层; 图案化氮化硅以限定至少一个硅微孔; 蚀刻所述SOI起始晶片以暴露所述至少一个硅微型棒，其中所述至少一个微型棒被升高的周边包围; 在所述至少一个微条的隆起周边上生长氧化硅层; 以及蚀刻所述至少一个硅微量棒的一部分以产生邻近所述氧化硅层的至少一个硅纳米线。

公开(公告)号：WO2003075368A2

公开(公告)日：2003-09-12

申请号：PCT/US2003/006048

申请日：2003-02-28

Applicant: BOARD OF CONTROL OF MICHIGAN TECHNOLOGICAL UNIVERSITY ,  BERGSTROM, Paul, L. ,  TROMBLEY, Melissa, L.

Inventor： BERGSTROM, Paul, L. ,  TROMBLEY, Melissa, L.

IPC: H01L49/00

CPC classification number: H05B6/105 ,  H01L21/324 ,  H01L21/67103

Abstract: A method of performing regional heating of a system having a substrate. The method may include applying a thin film to the system, and controllably energizing a coil positioned near the thin film. The energized coils thereby generate a magnetic flux. The method further includes inducing a current in the thin film with the magnetic flux thereby heating the system.

Abstract translation: 对具有基板的系统进行区域加热的方法。 该方法可以包括将薄膜施加到系统，并且可控地激励位于薄膜附近的线圈。 因此，通电线圈产生磁通量。 该方法还包括利用磁通量引起薄膜中的电流，从而加热系统。