Abstract:
Wafers, chips, or dies that contain fill cells with structures configured to obtain in-line data via non-contact electrical measurements ("NCEM"). Such NCEM-enabled fill cells may target/expose a variety of open-circuit, short-circuit, leakage, or excessive resistance failure modes. Such wafers, chips, or dies may include Designs of Experiments ("DOEs"), comprised of multiple NCEM-enabled fill cells, in at least two variants, all targeted to the same failure mode(s).
Abstract:
Product ICs/wafers include additional diagnostic, test, or monitoring structures opportunistically placed in filler cell positions, within tap cells, within decap cells, within scribe line areas, and/or within dummy fill regions. Improved fabrication processes utilize data from such structure (s) in wafer disposition decisions, rework decisions, process control, yield learning, or fault diagnosis.