Abstract:
A stereoscopic image sensor apparatus including a pair of image sensors adjacently fabricated on a common carrier is disclosed, the common carrier being a diced portion of a carrier on which an aligned plurality of image sensors have been fabricated within an alignment tolerance, the alignment tolerance including a target lateral offset between the adjacent image sensors, and a target orientation between corresponding rows of light sensitive elements on the adjacent image sensors. An alternative stereoscopic image sensor apparatus includes a common window having first and second image sensors bonded to the common window within the alignment tolerance. Another alternative stereoscopic image sensor apparatus includes rear faces of respective first and second image sensors being bonded to a common circuit substrate within the alignment tolerance. Methods for fabricating the stereoscopic image sensors are also disclosed.
Abstract:
Imaging devices and electronic apparatuses incorporating imaging devices or image pick-up elements are provided. An imaging device as disclosed can include a substrate, a first opto-electronic converter having a first area formed in the substrate, and a second opto-electronic converter having a second area formed in the substrate. The first area is larger than the second area. In addition, a light blocking wall can extend from a first surface of the substrate such that at least a portion of the light blocking wall is between the first opto-electronic converter and the second opto-electronic converter.
Abstract:
A CMOS time-of-flight image sensor must be robust to interface traps and fixed charges which may be present due to fabrication and which may cause an undesired induced electric field in the silicon substrate. This undesired induced electrical field is reduced by introducing a hydrogen-enriched dielectric material. Further remedial techniques can include applying ultraviolet light and/or performing a plasma treatment. Another possible approach adds a passivation doping layer at a top of the detector as a shield against the undesired induced electric field. One or more of the above techniques can be used to prevent any unstable behavior of the time-of-flight sensor.
Abstract:
Various embodiments include methods and apparatuses for forming and using pixels for image sensors. In one embodiment, an image sensor is disclosed. The image sensor includes an optically sensitive material; a plurality of electrodes proximate the optically sensitive material, including at least a first electrode, a second electrode and a third electrode; and a charge store. The first electrode is coupled to the charge store, and the first electrode and the second electrode are configured to provide a bias to the optically sensitive material to direct photocarriers to the charge store. Other methods and apparatuses are disclosed.
Abstract:
A solid state imaging device (44) that includes a phase difference detection pixel (81) which is a pixel for phase difference detection; a first imaging pixel (82) which is a pixel for imaging and is adjacent to the phase difference detection pixel; and a second imaging pixel (83) which is a pixel for imaging other than the first imaging pixel. An area of a color filter (94) of the first imaging pixel is smaller than an area of a color filter (97) of the second imaging-pixel.