Abstract:
Embodiments described herein relate to integrated abrasive (IA) polishing pads, and methods of manufacturing IA polishing pads using, at least in part, surface functionalized abrasive particles in an additive manufacturing process, such as a 3D inkjet printing process. In one embodiment, a method of forming a polishing article includes dispensing a first plurality of droplets of a first precursor, curing the first plurality of droplets to form a first layer comprising a portion of a sub-polishing element, dispensing a second plurality of droplets of the first precursor and a second precursor onto the first layer, and curing the second plurality of droplets to form a second layer comprising portions of the sub-polishing element and portions of a plurality of polishing elements. Here, the second precursor includes functionalized abrasive particles having a polymerizable group chemically bonded to surfaces thereof.
Abstract:
An optionally VOC-free silicone containing furniture polish is prepared using one or both of 1) a low viscosity silicone fluid and 2) a polydiorganosiloxane; and 3) a phosphonic acid dispersant together with water and one or more suitable surfactants.
Abstract:
The present invention discloses the application of polymers which comprise repeating units containing -(RO)- or -(RCOO)- groups in production of chemical mechanical polishing liquid of self-etch-stop of polysilicon and usage of the same, in which R is alkyl of C 1-10 . The polymers of the invention are used in production of polishing liquid and usage of the same, it can realize the process of self-etch-stop mechanism in chemical mechanical polishing of polysilicon under polishing conditions of constant conventional technical parameter, so as to prevent silicon dioxide channels from generating dishing defects of polysilicon, and to remove residual polysilicon from the silicon dioxide dishing defects and improve surface flatness of the polished wafers. Furthermore it has wide technology window, which can greatly improve the productivity and lower the cost.
Abstract:
A floor finish is provided including a film former, a lightness inducing agent, and a diluent. The floor finish composition includes a film former, a lightness inducing agent, and a diluent, with the lightness inducing agent being included in an amount sufficient for the composition to provide, when evaluated using a hardened finish having a thickness of about 0.005 mm on a LENETA Form 5C Opacity chart and a MINISCAN XE Plus color spectrophotometer having 45° illumination and a 0° viewing geometry (a) an increased lightness value L* on the black portion of the chart and (b) a contrast ratio (CR080) less than about 0.7 when evaluated on the black and white portions of the chart. Laminates, methods for treating a floor, and kits are also provided.
Abstract:
Compositions for treating shoes, especially canvas and/or leather-containing shoes, such as athletic shoes, and methods and articles of manufacture employing same to treat the shoes prior to and/or during and/or after washing the shoes are disclosed. The compositions are used to pre-treat the shoes prior to soiling of the shoes.
Abstract:
A polish composition includes a siloxane polymer of formula (III) wherein each group A independently represents an alkyl group having up to 6 carbon atoms, M represents an alkyl group having up to 6 carbons atoms and Q represents an alkyl group, wherein a proportion of the groups Q have more than 20 carbon atoms and the remainder have up to 6 carbon atoms, wherein "x" is an integer selected to give a molecular weight of the polymer III in the range 3,000-30,000. In prior polish compositions the radical "Q" have been of shorter chain lengths. We have found that a longer chain length promoters reduced smearing.
Abstract:
A polish composition comprising a base component and an alkylated fluorochemical oligomer. The oligomer comprises a fluorochemical oligomeric portion, an aliphatic moiety, and a linking group which links the two. The base component of the polish composition may be a wax, a silicone oil, or a mixture of the two.
Abstract:
A polish composition comprising a base component and a alkylated fluorochemical oligomer. The oligomer comprises a fluorochemical oligomeric portion, an aliphatic moiety, and a linking group which links the two. The base component of the polish composition may be a wax, a silicone oil, or a mixture of the two.
Abstract:
A continuous bulk polymerization and esterification process includes continuously charging into a reaction zone at least one ethylenically unsaturated acid-functional monomer and at least one linear or branched chain alkanol having greater than 11 carbon atoms. The process includes including maintaining a flow rate through the reaction zone sufficient to provide an average residence time of less than 60 minutes and maintaining a temperature in the reaction zone sufficient to produce a polymeric product incorporating at least some of the alkanol as an ester of the polymerized ethylenically unsaturated acid-functional monomer. The polymeric product is used in various processes to produce water-based compositions including emulsions and dispersions such as oil emulsions, wax dispersions, pigment dispersions, surfactants and coatings which contain the polymeric product. A polymeric surfactant includes at least one ethylenically unsaturated acid-functional monomer which has been radically incorporated into the polymeric surfactant and at least one ester of the incorporated ethylenically unsaturated acid-functional monomer which has a linear or branched chain alkyl group with greater than 11 carbon atoms. The molar critical micelle concentration of the polymeric surfactant is less than 1.0 x 10 moles/liter. Aqueous 2 percent neutralized solutions of certain polymeric surfactants have a surface tension of less than 45 mN/m at 30 DEG C and exhibit a decrease in surface tension of at least 5 mN/m as the temperature warms from 30 DEG C to 50 DEG C.