Invention Grant
- Patent Title: Laterally diffused metal-oxide semiconductor field-effect transistor
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Application No.: US15766082Application Date: 2016-08-18
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Publication No.: US10199495B2Publication Date: 2019-02-05
- Inventor: Shukun Qi , Guipeng Sun
- Applicant: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Applicant Address: CN Wuxi New District, Jiang
- Assignee: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Current Assignee: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Current Assignee Address: CN Wuxi New District, Jiang
- Agency: Polsinelli PC
- Priority: CN201510647166 20151008
- International Application: PCT/CN2016/095902 WO 20160818
- International Announcement: WO2017/059739 WO 20170413
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119 ; H01L29/78 ; H01L29/08 ; H01L29/06

Abstract:
A laterally diffused metal-oxide semiconductor field-effect transistor, comprising a substrate, a first conductivity type well region, a second conductivity type well region, a drain electrode in the first conductivity type well region, a source electrode and a body region in the second conductivity type well region, and a gate electrode arranged across surfaces of the first conductivity type well region and the second conductivity type well region, and also comprising a floating layer ring arranged on the top of the first conductivity type well region and located between the gate electrode and the drain electrode and a plurality of groove polysilicon electrodes running through the floating layer ring and stretching into the first conductivity type well region.
Public/Granted literature
- US20180286976A1 LATERALLY DIFFUSED METAL-OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTOR Public/Granted day:2018-10-04
Information query
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