- 专利标题： Loadlock integrated bevel etcher system
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申请号： US15013547申请日： 2016-02-02
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公开(公告)号： US10403515B2公开(公告)日： 2019-09-03
- 发明人: Saptarshi Basu , Jeongmin Lee , Paul Connors , Dale R. Du Bois , Prashant Kumar Kulshreshtha , Karthik Thimmavajjula Narasimha , Brett Berens , Kalyanjit Ghosh , Jianhua Zhou , Ganesh Balasubramanian , Kwangduk Douglas Lee , Juan Carlos Rocha-Alvarez , Hiroyuki Ogiso , Liliya Krivulina , Rick Gilbert , Mohsin Waqar , Venkatanarayana Shankaramurthy , Hari K. Ponnekanti
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson + Sheridan LLP
- 主分类号： C23C16/40
- IPC分类号： C23C16/40 ; H01L21/67 ; H01J37/32 ; H01L21/687
摘要：
Implementations disclosed herein describe a bevel etch apparatus within a loadlock bevel etch chamber and methods of using the same. The bevel etch apparatus has a mask assembly within the loadlock bevel etch chamber. During an etch process, the mask assembly delivers a gas flow to control bevel etch without the use of a shadow frame. As such, the edge exclusion at the bevel edge can be reduced, thus increasing product yield.
公开/授权文献
- US20170092511A1 LOADLOCK INTEGRATED BEVEL ETCHER SYSTEM 公开/授权日：2017-03-30
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