公开(公告)号：US10916451B2

公开(公告)日：2021-02-09

申请号：US16453740

申请日：2019-06-26

Applicant: Applied Materials, Inc.

Inventor： Mohsin Waqar ,  Marvin L. Freeman

IPC: G05B19/04 ,  G05B19/18 ,  H01L21/67 ,  H01L21/687

Abstract: An electronic device manufacturing system includes a motion control system for calibrating a gap between surfaces of process chamber or loadlock components by moving those component surfaces into direct contact with each other. The component surfaces may include a surface of a substrate and/or a substrate support and a surface of process delivery apparatus, which may be, e.g., a pattern mask and/or a plasma or gas distribution assembly. The motion control system may include a motion controller, a software program executable by the motion controller, a network, one or more actuator drivers, a software program executable by the one or more actuator drivers, one or more actuators, and one or more feedback devices. Methods of calibrating a gap via direct contact of process chamber or loadlock component surfaces are also provided, as are other aspects.

公开(公告)号：US12215966B2

公开(公告)日：2025-02-04

申请号：US17247241

申请日：2020-12-04

Applicant: Applied Materials, Inc.

Inventor： Mohsin Waqar ,  Paul Zachary Wirth ,  Todd James Brill ,  Paul Edward Fisher ,  Ilias Iliopoulos ,  Charles Gregory Potter, Sr.

IPC: G01B11/14 ,  G01B11/02 ,  G01B11/06 ,  G01B11/24 ,  H01L21/66 ,  H01L21/67 ,  H01L21/677 ,  H01L21/687 ,  B25J11/00

Abstract: Implementations disclosed describe an inspection device capable of being transferred by a robot blade into a processing chamber of a manufacturing machine, the inspection device comprising an optical sensor to detect light reflected from a target located within the processing chamber, wherein the optical sensor is to output, to a processing device, a signal representative of a state of a region of a surface of the target.

公开(公告)号：US11813757B2

公开(公告)日：2023-11-14

申请号：US17069431

申请日：2020-10-13

Applicant: APPLIED MATERIALS, INC.

Inventor： Ali Utku Pehlivan ,  Mohsin Waqar ,  Paul Zachary Wirth ,  Todd James Brill

IPC: B25J9/16

CPC classification number: B25J9/1692

Abstract: A method for finding a center of a process kit and/or a process kit ring is provided. An object placed on an end effector is moved past a sensor of a manufacturing system. A first signal indicating a current shape of object is received from the sensor of the manufacturing system. A determination is made whether the first signal corresponds to a second signal indicating a predefined shape for a process kit and/or a process kit carrier. In response to a determination that the first signal corresponds to the second signal, a coordinate correspondence is determined between coordinates of a center of the object and coordinates of a center of the end effector. The determined coordinate correspondence indicates whether a current placement of the object on the end effector satisfies a target placement criterion.

公开(公告)号：US11031262B2

公开(公告)日：2021-06-08

申请号：US16838128

申请日：2020-04-02

Applicant: Applied Materials, Inc.

Inventor： Saptarshi Basu ,  Jeongmin Lee ,  Paul Connors ,  Dale R. Du Bois ,  Prashant Kumar Kulshreshtha ,  Karthik Thimmavajjula Narasimha ,  Brett Berens ,  Kalyanjit Ghosh ,  Jianhua Zhou ,  Ganesh Balasubramanian ,  Kwangduk Douglas Lee ,  Juan Carlos Rocha-Alvarez ,  Hiroyuki Ogiso ,  Liliya Krivulina ,  Rick Gilbert ,  Mohsin Waqar ,  Venkatanarayana Shankaramurthy ,  Hari K. Ponnekanti

IPC: C23C16/40 ,  H01L21/67 ,  H01J37/32 ,  H01L21/687

Abstract: Implementations disclosed herein describe a bevel etch apparatus within a loadlock bevel etch chamber and methods of using the same. The bevel etch apparatus has a mask assembly within the loadlock bevel etch chamber. During an etch process, the mask assembly delivers a gas flow to control bevel etch without the use of a shadow frame. As such, the edge exclusion at the bevel edge can be reduced, thus increasing product yield.

公开(公告)号：US10403515B2

公开(公告)日：2019-09-03

申请号：US15013547

申请日：2016-02-02

Applicant: Applied Materials, Inc.

Inventor： Saptarshi Basu ,  Jeongmin Lee ,  Paul Connors ,  Dale R. Du Bois ,  Prashant Kumar Kulshreshtha ,  Karthik Thimmavajjula Narasimha ,  Brett Berens ,  Kalyanjit Ghosh ,  Jianhua Zhou ,  Ganesh Balasubramanian ,  Kwangduk Douglas Lee ,  Juan Carlos Rocha-Alvarez ,  Hiroyuki Ogiso ,  Liliya Krivulina ,  Rick Gilbert ,  Mohsin Waqar ,  Venkatanarayana Shankaramurthy ,  Hari K. Ponnekanti

IPC: C23C16/40 ,  H01L21/67 ,  H01J37/32 ,  H01L21/687

Abstract: Implementations disclosed herein describe a bevel etch apparatus within a loadlock bevel etch chamber and methods of using the same. The bevel etch apparatus has a mask assembly within the loadlock bevel etch chamber. During an etch process, the mask assembly delivers a gas flow to control bevel etch without the use of a shadow frame. As such, the edge exclusion at the bevel edge can be reduced, thus increasing product yield.

公开(公告)号：US20180374719A1

公开(公告)日：2018-12-27

申请号：US15632031

申请日：2017-06-23

Applicant: Applied Materials, Inc.

Inventor： Mohsin Waqar ,  Marvin L. Freeman

IPC: H01L21/67

CPC classification number: H01L21/67011 ,  G05B2219/45031 ,  H01L21/67201 ,  H01L21/67259 ,  H01L21/687

Abstract: An electronic device manufacturing system includes a motion control system for calibrating a gap between surfaces of process chamber or loadlock components by moving those component surfaces into direct contact with each other. The component surfaces may include a surface of a substrate and/or a substrate support and a surface of process delivery apparatus, which may be, e.g., a pattern mask and/or a plasma or gas distribution assembly. The motion control system may include a motion controller, a software program executable by the motion controller, a network, one or more actuator drivers, a software program executable by the one or more actuator drivers, one or more actuators, and one or more feedback devices. Methods of calibrating a gap via direct contact of process chamber or loadlock component surfaces are also provided, as are other aspects.

公开(公告)号：US20240051144A1

公开(公告)日：2024-02-15

申请号：US18493735

申请日：2023-10-24

Applicant: APPLIED MATERIALS, INC.

Inventor： Ali Utku Pehlivan ,  Mohsin Waqar ,  Paul Zachary Wirth ,  Todd James Brill

IPC: B25J9/16

CPC classification number: B25J9/1692

Abstract: One or more first signals are obtained. The first signals indicate a current shape of an object placed on an end effector. The one or more first signals are compared to one or more second signals that each indicate a predefined shape for a process component on the end effector. A determination is made of whether a current placement of the object on the end effector satisfies a target placement criterion based on the comparison.

公开(公告)号：US20220111529A1

公开(公告)日：2022-04-14

申请号：US17069431

申请日：2020-10-13

Applicant: APPLIED MATERIALS, INC.

Inventor： Ali Utku Pehlivan ,  Mohsin Waqar ,  Paul Zachary Wirth ,  Todd James Brill

IPC: B25J9/16

Abstract: A method for finding a center of a process kit and/or a process kit ring is provided. An object placed on an end effector is moved past a sensor of a manufacturing system. A first signal indicating a current shape of object is received from the sensor of the manufacturing system. A determination is made whether the first signal corresponds to a second signal indicating a predefined shape for a process kit and/or a process kit carrier. In response to a determination that the first signal corresponds to the second signal, a coordinate correspondence is determined between coordinates of a center of the object and coordinates of a center of the end effector. The determined coordinate correspondence indicates whether a current placement of the object on the end effector satisfies a target placement criterion.

公开(公告)号：US20210172728A1

公开(公告)日：2021-06-10

申请号：US17247241

申请日：2020-12-04

Applicant: Applied Materials, Inc.

Inventor： Mohsin Waqar ,  Paul Zachary Wirth ,  Todd James Brill ,  Paul Edward Fisher ,  Ilias Iliopoulos ,  Charles Gregory Potter, SR.

IPC: G01B11/14 ,  G01B11/06 ,  B25J11/00 ,  H01L21/687

Abstract: Implementations disclosed describe an inspection device capable of being transferred by a robot blade into a processing chamber of a manufacturing machine, the inspection device comprising an optical sensor to detect light reflected from a target located within the processing chamber, wherein the optical sensor is to output, to a processing device, a signal representative of a state of a region of a surface of the target.

公开(公告)号：US20190318940A1

公开(公告)日：2019-10-17

申请号：US16453740

申请日：2019-06-26

Applicant: Applied Materials, Inc.

Inventor： Mohsin Waqar ,  Marvin L. Freeman

IPC: H01L21/67

Abstract: An electronic device manufacturing system includes a motion control system for calibrating a gap between surfaces of process chamber or loadlock components by moving those component surfaces into direct contact with each other. The component surfaces may include a surface of a substrate and/or a substrate support and a surface of process delivery apparatus, which may be, e.g., a pattern mask and/or a plasma or gas distribution assembly. The motion control system may include a motion controller, a software program executable by the motion controller, a network, one or more actuator drivers, a software program executable by the one or more actuator drivers, one or more actuators, and one or more feedback devices. Methods of calibrating a gap via direct contact of process chamber or loadlock component surfaces are also provided, as are other aspects.