Invention Grant
- Patent Title: Polishing composition
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Application No.: US15764271Application Date: 2016-09-21
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Publication No.: US10414019B2Publication Date: 2019-09-17
- Inventor: Takeki Sato , Yukinobu Yoshizaki , Shogo Onishi
- Applicant: FUJIMI INCORPORATED
- Applicant Address: JP
- Assignee: FUJIMI INCORPORATED
- Current Assignee: FUJIMI INCORPORATED
- Current Assignee Address: JP
- Agency: Katten Muchin Rosenman LLP
- Priority: JP2015-192418 20150930; JP2015-192420 20150930; JP2015-192421 20150930
- International Application: PCT/JP2016/077905 WO 20160921
- International Announcement: WO2017/057155 WO 20170406
- Main IPC: B24B37/04
- IPC: B24B37/04 ; C09G1/02 ; C09K3/14 ; H01L21/306 ; H01L21/3105 ; H01L21/321
Abstract:
An object of the present invention is to provide a polishing composition enabling polishing of an object to be polished at higher speed.Provided is a polishing composition used for polishing an object to be polished in which the polishing composition contains surface-modified abrasive grains, in which an ionic dispersant is directly modified on the surface of the abrasive grains, and dispersing medium, and aggregation of the abrasive grains is suppressed in the dispersing medium.
Public/Granted literature
- US20180290262A1 POLISHING COMPOSITION Public/Granted day:2018-10-11
Information query
