Invention Grant
- Patent Title: Semiconductor storage device comprising resistance change film and method of manufacturing the same
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Application No.: US15892016Application Date: 2018-02-08
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Publication No.: US10522596B2Publication Date: 2019-12-31
- Inventor: Keiichi Sawa , Kazuhisa Matsuda , Atsushi Takahashi , Takaumi Morita , Masayuki Tanaka , Shinji Mori , Kazuhiro Matsuo , Yuta Saito , Kenichiro Toratani , Hisashi Okuchi
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2017-139387 20170718
- Main IPC: H01L27/24
- IPC: H01L27/24 ; G11C13/00 ; H01L27/108 ; H01L45/00

Abstract:
In one embodiment, a semiconductor storage device includes a first interconnect extending in a first direction, a plurality of second interconnects extending in a second direction different from the first direction, and a plurality of first insulators provided alternately with the second interconnects. The device further includes a resistance change film provided between the first interconnect and at least one of the second interconnects and including a first metal layer or a first semiconductor layer that includes a first face provided on a first interconnect side and a second face provided on a second interconnect side, at least any of the first face and the second face having a curved plane shape.
Public/Granted literature
- US20190027538A1 SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2019-01-24
Information query
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