- 专利标题: Semiconductor storage device comprising resistance change film and method of manufacturing the same
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申请号: US15892016申请日: 2018-02-08
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公开(公告)号: US10522596B2公开(公告)日: 2019-12-31
- 发明人: Keiichi Sawa , Kazuhisa Matsuda , Atsushi Takahashi , Takaumi Morita , Masayuki Tanaka , Shinji Mori , Kazuhiro Matsuo , Yuta Saito , Kenichiro Toratani , Hisashi Okuchi
- 申请人: TOSHIBA MEMORY CORPORATION
- 申请人地址: JP Minato-ku
- 专利权人: TOSHIBA MEMORY CORPORATION
- 当前专利权人: TOSHIBA MEMORY CORPORATION
- 当前专利权人地址: JP Minato-ku
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2017-139387 20170718
- 主分类号: H01L27/24
- IPC分类号: H01L27/24 ; G11C13/00 ; H01L27/108 ; H01L45/00
摘要:
In one embodiment, a semiconductor storage device includes a first interconnect extending in a first direction, a plurality of second interconnects extending in a second direction different from the first direction, and a plurality of first insulators provided alternately with the second interconnects. The device further includes a resistance change film provided between the first interconnect and at least one of the second interconnects and including a first metal layer or a first semiconductor layer that includes a first face provided on a first interconnect side and a second face provided on a second interconnect side, at least any of the first face and the second face having a curved plane shape.
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