Invention Grant
- Patent Title: Wafer debonding system and method
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Application No.: US16710348Application Date: 2019-12-11
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Publication No.: US10889097B2Publication Date: 2021-01-12
- Inventor: Chang-Chen Tsao , Kuo Liang Lu , Ru-Liang Lee , Sheng-Hsiang Chuang , Yu-Hung Cheng , Yeur-Luen Tu , Cheng-Kang Hu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: B32B38/10
- IPC: B32B38/10 ; H01L21/67 ; H01L21/68 ; H01L21/683

Abstract:
The present disclosure relates to a debonding apparatus. In some embodiments, the debonding apparatus comprises a wafer chuck configured to hold a pair of bonded substrates on a chuck top surface. The debonding apparatus further comprises a pair of separating blades including a first separating blade and a second separating blade placed at edges of the pair of bonded substrates. The first separating blade has a first thickness that is smaller than a second thickness of the second separating blade. The debonding apparatus further comprises a flex wafer assembly configured to pull the pair of bonded substrates upwardly to separate a second substrate from a first substrate of the pair of bonded substrate. By providing unbalanced initial torques on opposite sides of the bonded substrate pair, edge defects and wafer breakage are reduced.
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