Invention Grant
- Patent Title: Semiconductor device and method of manufacturing
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Application No.: US17027175Application Date: 2020-09-21
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Publication No.: US11335656B2Publication Date: 2022-05-17
- Inventor: Chih-Chia Hu , Ching-Pin Yuan , Sung-Feng Yeh , Sen-Bor Jan , Ming-Fa Chen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Slater Matsil, LLP
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/544 ; H01L25/065 ; H01L23/522

Abstract:
A semiconductor device including a first die and a second die bonded to one another. The first die includes a first passivation layer over a substrate, and first bond pads in the first passivation layer. The second die includes a second passivation layer, which may be bonded to the first passivation layer, and second bond pads in the second passivation layer, which may be bonded to the first bond pads. The second bond pads include inner bond pads and outer bond pads. The outer bond pads may have a greater diameter than the inner bond pads as well as the first bond pads.
Public/Granted literature
- US20210005561A1 Semiconductor Device and Method of Manufacturing Public/Granted day:2021-01-07
Information query
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