Invention Grant
- Patent Title: Substrate cleaning compositions, substrate cleaning method and substrate treating apparatus
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Application No.: US16600166Application Date: 2019-10-11
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Publication No.: US11530375B2Publication Date: 2022-12-20
- Inventor: Hae-Won Choi , Kihoon Choi , Jaeseong Lee , Chan Young Heo , Anton Koriakin , Do Heon Kim , Ji Soo Jeong
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Cheonan-si
- Agency: Procopio, Cory, Hargreaves & Savitch LLP
- Priority: KR10-2018-0120914 20181011
- Main IPC: B08B3/04
- IPC: B08B3/04 ; C11D7/50 ; B08B3/08 ; C11D11/00 ; H01L21/02 ; C11D7/08 ; C11D7/36 ; H01L21/67 ; C11D7/26
Abstract:
A composition for cleaning a substrate is provided. According to an embodiment, the composition for cleaning the substrate includes an organic solvent having a Hansen solubility parameter of 5 or more to 12 or less for polystyrene latex to the substrate.
Information query
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