Invention Grant
- Patent Title: Systems and methods for spin process video analysis during substrate processing
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Application No.: US17037131Application Date: 2020-09-29
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Publication No.: US11637031B2Publication Date: 2023-04-25
- Inventor: Michael Carcasi , Joshua Hooge , Mark Somervell , Hiroyuki Iwaki , Masahide Tadokoro , Masashi Enomoto , Joel Estrella , Yuichiro Kunugimoto
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Slater Matsil, LLP
- Main IPC: H01L21/68
- IPC: H01L21/68 ; B05D1/00 ; G06T7/13 ; G06T7/00 ; G06T7/73 ; B05B12/08 ; G01N21/95 ; H01L21/67 ; H01L21/66 ; G01N21/84

Abstract:
Camera images may be utilized to detect substrate edges and provide information regarding the centering of the substrate within the fluid dispense system. Camera images may also be utilized to monitoring the location of a cup within the fluid dispense system. The signal processing techniques utilized may include data smoothing, analyzing only certain wavelengths of reflected energy, transforming the data (in one embodiment utilizing a Fourier transform), and/or analyzing a sub-set of the collected pixels of data. The camera image data collected herein may be combined with a wide variety of other data so as to better monitor, characterize and/or control a substrate processing process flow.
Public/Granted literature
- US20210134637A1 Systems and Methods for Spin Process Video Analysis During Substrate Processing Public/Granted day:2021-05-06
Information query
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