Invention Grant
- Patent Title: Substrate treatment apparatus
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Application No.: US17073342Application Date: 2020-10-17
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Publication No.: US12094733B2Publication Date: 2024-09-17
- Inventor: Young Dae Chung , Won Geun Kim , Jee Young Lee , Ji Hoon Jeong , Tae Shin Kim , Se Hoon Oh , Pil Kyun Heo , Hyun Goo Park
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Cheonan-si
- Priority: KR 20190130517 2019.10.21
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/306 ; C09K13/04
Abstract:
Disclosed is a substrate treatment apparatus including a rotation unit that supports and rotates a substrate, a chemical discharge unit that discharges a chemical solution to the rotation unit, a chemical recovery unit disposed close to the rotation unit and configured to recover the chemical solution scattering from the rotation unit, and a laser irradiation unit that applies a laser beam to the substrate and heats the substrate.
Public/Granted literature
- US20210118701A1 SUBSTRATE TREATMENT APPARATUS Public/Granted day:2021-04-22
Information query
IPC分类:
