- 专利标题: Ferroelectric capacitor, process for production thereof and semiconductor device using the same
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申请号: US11024873申请日: 2004-12-30
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公开(公告)号: US20050242381A1公开(公告)日: 2005-11-03
- 发明人: Osamu Matsuura , Kenji Maruyama , Kazuaki Takai
- 申请人: Osamu Matsuura , Kenji Maruyama , Kazuaki Takai
- 申请人地址: JP Kawasaki
- 专利权人: FUJITSU LIMITED
- 当前专利权人: FUJITSU LIMITED
- 当前专利权人地址: JP Kawasaki
- 优先权: JP2003-002577 20030108
- 主分类号: C23C14/08
- IPC分类号: C23C14/08 ; C23C16/40 ; G01Q30/04 ; G01Q30/10 ; G01Q70/04 ; G01Q70/14 ; H01L21/02 ; H01L21/316 ; H01L21/8246 ; H01L27/105 ; H01L27/115 ; H01L29/76
摘要:
A ferroelectric capacitor includes a pair of electrodes, and at least one ferroelectric held between the pair of electrodes, in which the ferroelectric includes a first ferroelectric layer having a surface roughness (RMS) determined with an atomic force microscope of 10 nm or more; and a second ferroelectric layer being arranged adjacent to the first ferroelectric layer and having an RMS of 5 nm or less. A process produces such a ferroelectric capacitor by forming a first ferroelectric layer on or above one of a pair of electrodes at a temperature equal to or higher than a crystallization temperature at which the first ferroelectric layer takes on a ferroelectric crystalline structure, and forming a second ferroelectric layer on the first ferroelectric layer at a temperature lower than a crystallization temperature at which the second ferroelectric layer takes on a ferroelectric crystalline structure.
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