Via Connection to a Partially Filled Trench

Invention Application

US20210366726A1 Via Connection to a Partially Filled Trench 有权

Please log in to see more content

Patent Title: Via Connection to a Partially Filled Trench
Application No.: US17397756

Application Date: 2021-08-09
Publication No.: US20210366726A1

Publication Date: 2021-11-25
Inventor: Shih-Ming Chang , Chih-Ming Lai , Ru-Gun Liu , Tsai-Sheng Gau , Chung-Ju Lee , Tien-I Bao , Shau-Lin Shue
Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
Applicant Address: TW Hsinchu
Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
Current Assignee Address: TW Hsinchu
Main IPC: H01L21/321
IPC: H01L21/321 ; H01L21/768 ; H01L21/311 ; H01L21/3105 ; H01L23/522

Via Connection to a Partially Filled Trench

Abstract:

An integrated circuit structure includes a first metal feature formed into a first dielectric layer, a second metal feature formed into a second dielectric layer, the second dielectric layer being disposed on said first dielectric layer, and a via connecting the first metal feature to the second metal feature, wherein a top portion of the via is offset from a bottom portion of the via.

Public/Granted literature

US11929258B2 Via connection to a partially filled trench Public/Granted day:2024-03-12

Information query

Global Dossier Espacenet

IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L21/00	专门适用于制造或处理半导体或固体器件或其部件的方法或设备
H01L21/02	.半导体器件或其部件的制造或处理
H01L21/04	..至少具有一个跃变势垒或表面势垒的器件，例如PN结、耗尽层、载体集结层
H01L21/18	...器件有由周期表Ⅳ族元素或含有/不含有杂质的AⅢBⅤ族化合物构成的半导体，如掺杂材料
H01L21/30	....用H01L21/20至H01L21/26各组不包含的方法或设备处理半导体材料的（在半导体材料上制作电极的入H01L21/28）
H01L21/31	.....在半导体材料上形成绝缘层的，例如用于掩膜的或应用光刻技术的（密封层入H01L21/56）；以及这些层的后处理；这些层的材料的选择
H01L21/3205	......非绝缘层的沉积，例如绝缘层上的导电层或电阻层；这些层的后处理（电极的制造入H01L21/28）
H01L21/321	.......后处理