Invention Application
- Patent Title: ABNORMALITY DETECTION METHOD AND PROCESSING APPARATUS
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Application No.: US17675225Application Date: 2022-02-18
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Publication No.: US20220270940A1Publication Date: 2022-08-25
- Inventor: Shingo HISHIYA , Nobutoshi TERASAWA , Fumiaki NAGAI , Kazuaki SASAKI , Hiroaki KIKUCHI , Masayuki KITAMURA , Kazuo YABE , Motoshi FUKUDOME , Tatsuya MIYAHARA , Eiji KIKAMA , Yuki TANABE , Tomoyuki NAGATA
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Priority: JP2021-029150 20210225
- Main IPC: H01L21/66
- IPC: H01L21/66 ; C23C16/52 ; C23C16/455 ; H01L21/02
Abstract:
An abnormality detection method includes: supplying a gas controlled to a selected rate to a gas supply pipe via the gas pipe connected to the gas supply pipe, thereby introducing the gas into a reaction region of a processing container provided in a processing apparatus from a gas hole of the gas supply pipe; measuring a pressure inside the gas pipe by a pressure gauge attached to the gas pipe; and detecting an abnormality of at least one of the gas supply pipe and the gas pipe based on the pressure measured at the measuring.
Information query
IPC分类:
