- 专利标题： ABNORMALITY DETECTION METHOD AND PROCESSING APPARATUS
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申请号： US17675225申请日： 2022-02-18
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公开(公告)号： US20220270940A1公开(公告)日： 2022-08-25
- 发明人: Shingo HISHIYA , Nobutoshi TERASAWA , Fumiaki NAGAI , Kazuaki SASAKI , Hiroaki KIKUCHI , Masayuki KITAMURA , Kazuo YABE , Motoshi FUKUDOME , Tatsuya MIYAHARA , Eiji KIKAMA , Yuki TANABE , Tomoyuki NAGATA
- 申请人： Tokyo Electron Limited
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 优先权： JP2021-029150 20210225
- 主分类号： H01L21/66
- IPC分类号： H01L21/66 ; C23C16/52 ; C23C16/455 ; H01L21/02
摘要：
An abnormality detection method includes: supplying a gas controlled to a selected rate to a gas supply pipe via the gas pipe connected to the gas supply pipe, thereby introducing the gas into a reaction region of a processing container provided in a processing apparatus from a gas hole of the gas supply pipe; measuring a pressure inside the gas pipe by a pressure gauge attached to the gas pipe; and detecting an abnormality of at least one of the gas supply pipe and the gas pipe based on the pressure measured at the measuring.