Invention Application
- Patent Title: CHEMICAL LIQUID PREPARATION DEVICE, AND SUBSTRATE PROCESSING DEVICE
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Application No.: US17867693Application Date: 2022-07-19
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Publication No.: US20220347641A1Publication Date: 2022-11-03
- Inventor: Hajime NISHIDE , Takashi IZUTA , Takatoshi HAYASHI , Katsuhiro FUKUI , Koichi OKAMOTO , Kazuhiro FUJITA , Atsuyasu MIURA , Kenji KOBAYASHI , Sei NEGORO , Hiroki TSUJIKAWA
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP Kyoto
- Priority: JP2017-183007 20170922
- Main IPC: B01F35/82
- IPC: B01F35/82 ; H01L21/67 ; G05D21/02 ; H01L21/306 ; G05D11/00 ; H01L21/3213 ; B01F23/231 ; B01F35/21 ; B01F35/22
Abstract:
A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.
Public/Granted literature
- US12064739B2 Chemical liquid preparation device, and substrate processing device Public/Granted day:2024-08-20
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