Invention Application
- Patent Title: ROTARY REACTOR FOR DEPOSITION OF FILMS ONTO PARTICLES
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Application No.: US17971504Application Date: 2022-10-21
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Publication No.: US20230127489A1Publication Date: 2023-04-27
- Inventor: Brian Hayes Burrows , Sekar Krishnasamy , Ayyanagouda Raravi , Monika Mudalkar , Govindraj Desai , Hemantha Kumar Raju , Basavaraj Pattanshetty , David Masayuki Ishikawa , Visweswaren Sivaramakrishnan , Shrikant Swaminathan , Mario Cambron , Robert Navasca , Miaojun Wang , Jonathan Frankel
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Priority: IN202141048138 20211022
- Main IPC: A61K9/16
- IPC: A61K9/16 ; B01J19/28 ; B01J19/00
Abstract:
A reactor for coating particles includes a rotatable reactor assembly including a drum configured to hold a plurality of particles to be coated, an inlet tube, and an outlet tube, a stationary gas inlet line coupled to the inlet tube by a rotary inlet seal, a stationary gas outlet line coupled to the outlet tube by a rotary outlet seal, and a motor to rotate the rotatable reactor assembly.
Information query
