公开(公告)号：US20230128094A1

公开(公告)日：2023-04-27

申请号：US17971511

申请日：2022-10-21

申请人： Applied Materials, Inc.

发明人： Brian Hayes Burrows ,  Sekar Krishnasamy ,  Ayyanagouda Raravi ,  Monika Mudalkar ,  Govindraj Desai ,  Hemantha Kumar Raju ,  Basavaraj Pattanshetty ,  David Masayuki Ishikawa ,  Visweswaren Sivaramakrishnan ,  Shrikant Swaminathan ,  Mario Cambron ,  Robert Navasca ,  Miaojun Wang ,  Jonathan Frankel

IPC分类号： B05C19/02 ,  B01J8/38 ,  B01J8/18

摘要： A reactor for coating particles includes a rotatable reactor assembly includes a reactor drum configured to hold a plurality of particles to be coated, an inlet tube, and an outlet tube. The drum includes a cylindrical tube, and an inlet-side endplate secured to cover an inlet-side opening of the cylindrical tube and/or an outlet-side endplate secured to cover an outlet-side opening of the cylindrical tube. A stationary gas inlet line is coupled to the inlet tube by a rotary inlet seal, a stationary gas outlet line is coupled to the outlet tube by a rotary outlet seal, and a motor rotates the rotatable reactor assembly. The inlet tube is releasably mechanically secured to the inlet-side endplate and the outlet tube is releasably mechanically secured to the outlet-side endplate.

公开(公告)号：US20230127489A1

公开(公告)日：2023-04-27

申请号：US17971504

申请日：2022-10-21

申请人： Applied Materials, Inc.

发明人： Brian Hayes Burrows ,  Sekar Krishnasamy ,  Ayyanagouda Raravi ,  Monika Mudalkar ,  Govindraj Desai ,  Hemantha Kumar Raju ,  Basavaraj Pattanshetty ,  David Masayuki Ishikawa ,  Visweswaren Sivaramakrishnan ,  Shrikant Swaminathan ,  Mario Cambron ,  Robert Navasca ,  Miaojun Wang ,  Jonathan Frankel

IPC分类号： A61K9/16 ,  B01J19/28 ,  B01J19/00

摘要： A reactor for coating particles includes a rotatable reactor assembly including a drum configured to hold a plurality of particles to be coated, an inlet tube, and an outlet tube, a stationary gas inlet line coupled to the inlet tube by a rotary inlet seal, a stationary gas outlet line coupled to the outlet tube by a rotary outlet seal, and a motor to rotate the rotatable reactor assembly.

公开(公告)号：US20230132290A1

公开(公告)日：2023-04-27

申请号：US17971516

申请日：2022-10-21

申请人： Applied Materials, Inc.

发明人： Brian Hayes Burrows ,  Sekar Krishnasamy ,  Ayyanagouda Raravi ,  Monika Mudalkar ,  Govindraj Desai ,  Hemantha Kumar Raju ,  Basavaraj Pattanshetty ,  David Masayuki Ishikawa ,  Visweswaren Sivaramakrishnan ,  Shrikant Swaminathan ,  Mario Cambron ,  Robert Navasca ,  Miaojun Wang ,  Jonathan Frankel

IPC分类号： C23C16/458 ,  C23C16/44 ,  C23C16/455

摘要： A deposition system includes an isolator or fume hood and a reactor for coating particles, the reactor including a rotatable reactor assembly positioned within the isolator or fume hood and including a reactor drum configured to hold a plurality of particles to be coated, an inlet tube, and an outlet tube. The reactor drum is configured to be detached from the inlet tube and the outlet tube by an operator while the reactor drum remains within the isolator or fume hood.

公开(公告)号：US08888916B2

公开(公告)日：2014-11-18

申请号：US14088013

申请日：2013-11-22

申请人： Applied Materials, Inc.

发明人： Ming-Kuei (Michael) Tseng ,  Norman L. Tam ,  Yoshitaka Yokota ,  Agus S. Tjandra ,  Robert Navasca ,  Mehran Behdjat ,  Sundar Ramamurthy ,  Kedarnath Sangam ,  Alexander N. Lerner

IPC分类号： C23C16/00 ,  H01L21/00 ,  H01L21/67 ,  F27D7/06

CPC分类号： H01L21/67115 ,  F27D7/06 ,  H01L21/67017 ,  H01L21/67098

摘要： Embodiments of the present invention provide apparatus and method for improving gas distribution during thermal processing. One embodiment of the present invention provides an apparatus for processing a substrate comprising a chamber body defining a processing volume, a substrate support disposed in the processing volume, wherein the substrate support is configured to support and rotate the substrate, a gas inlet assembly coupled to an inlet of the chamber body and configured to provide a first gas flow to the processing volume, and an exhaust assembly coupled to an outlet of the chamber body, wherein the gas inlet assembly and the exhaust assembly are disposed on opposite sides of the chamber body, and the exhaust assembly defines an exhaust volume configured to extend the processing volume.

摘要翻译： 本发明的实施例提供了用于改善热处理期间气体分布的装置和方法。 本发明的一个实施例提供了一种用于处理衬底的装置，其包括限定处理体积的室主体，设置在处理容积中的衬底支撑件，其中衬底支撑件构造成支撑和旋转衬底;气体入口组件， 室主体的入口并且被配置为向处理容积提供第一气流，以及联接到室主体的出口的排气组件，其中气体入口组件和排气组件设置在室主体的相对侧上 ，并且排气组件限定了被配置为延长处理量的排气量。