Invention Publication
- Patent Title: SEMICONDUCTOR MEMORY AND METHOD OF MANUFACTURING THE SAME
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Application No.: US18441204Application Date: 2024-02-14
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Publication No.: US20240188307A1Publication Date: 2024-06-06
- Inventor: Masahiro KIYOTOSHI , Akihito YAMAMOTO , Yoshio OZAWA , Fumitaka ARAI , Riichiro SHIROTA
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP 06256194 2006.09.21
- Main IPC: H10B63/00
- IPC: H10B63/00 ; H01L21/02 ; H01L21/28 ; H01L21/306 ; H01L21/3105 ; H01L21/321 ; H01L21/3213 ; H01L21/762 ; H01L27/105 ; H01L29/51 ; H10B43/27 ; H10B43/30 ; H10B43/35 ; H10B43/40 ; H10B69/00 ; H10B99/00 ; H10N70/00 ; H10N70/20

Abstract:
A semiconductor memory includes a plurality of stripe-like active areas formed by stacking, in a direction perpendicular to a substrate, a plurality of layers extending parallel to the substrate, a first gate electrode formed on first side surfaces of the active areas, the first side surfaces being perpendicular to the substrate, a second gate electrode formed on second side surfaces of the active areas, the second side surfaces being perpendicular to the substrate. The layers are patterned in self-alignment with each other, intersections of the active areas and the first gate electrode form a plurality of memory cells, and the plurality of memory cells in an intersecting plane share the first gate electrode.
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