Invention Grant
- Patent Title: Method of forming printed circuit card
- Patent Title (中): 形成印刷电路卡的方法
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Application No.: US11224191Application Date: 2005-09-12
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Publication No.: US07353590B2Publication Date: 2008-04-08
- Inventor: Kenneth Fallon , Miguel A. Jimarez , Ross W. Keesler , John M. Lauffer , Roy H. Magnuson , Voya R. Markovich , Irv Memis , Jim P. Paoletti , Marybeth Perrino , John A. Welsh , William E. Wilson
- Applicant: Kenneth Fallon , Miguel A. Jimarez , Ross W. Keesler , John M. Lauffer , Roy H. Magnuson , Voya R. Markovich , Irv Memis , Jim P. Paoletti , Marybeth Perrino , John A. Welsh , William E. Wilson
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Driggs, Hogg, Daugherty & Del Zoppo Co., LPA
- Agent Patrick J. Daugherty
- Main IPC: H05K3/36
- IPC: H05K3/36

Abstract:
A method of forming a printed circuit card with a metal power plane layer between two photoimageable dielectric layers is provided. Photoformed metal filled vias and plated through holes are in the photopatternable material, and signal circuitry is on the surfaces of each of the dielectric materials connected to the vias and plated through holes. A border may be around the card including a metal layer terminating in from the edge of one of the dielectric layers. Copper foil with clearance holes is provided. First and second layers of photoimageable curable dielectric material are on opposite sides of the copper. Patterns are developed on the first and second layers of the photoimageable material to reveal the metal layer through vias. Through holes are developed where holes were patterned in both dielectric layers. The surfaces of the photoimageable material, vias and through holes are metallized by copper plating, preferably using photoresist.
Public/Granted literature
- US20060005383A1 Method of forming printed circuit card Public/Granted day:2006-01-12
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