发明授权
US08927942B2 Ion source, nanofabrication apparatus comprising such source, and a method for emitting ions
有权
离子源，包含这种源的纳米制造装置和用于发射离子的方法
- 专利标题： Ion source, nanofabrication apparatus comprising such source, and a method for emitting ions
- 专利标题（中）： 离子源，包含这种源的纳米制造装置和用于发射离子的方法
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申请号： US14124408申请日： 2012-06-05
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公开(公告)号： US08927942B2公开(公告)日： 2015-01-06
- 发明人: Jacques Gierak , Nicolas Allemandou , Klaus Hasselbach , Jean-Paul Leggeri , Guillaume Donnier-Valentin , Stephen Purcell , Pauline Gavand
- 申请人： Jacques Gierak , Nicolas Allemandou , Klaus Hasselbach , Jean-Paul Leggeri , Guillaume Donnier-Valentin , Stephen Purcell , Pauline Gavand
- 申请人地址： FR Paris Cedex FR Villeurbanne
- 专利权人： Centre National de la Recherche Scientifique—CNRS,Universite Claude Bernard Lyon
- 当前专利权人： Centre National de la Recherche Scientifique—CNRS,Universite Claude Bernard Lyon
- 当前专利权人地址： FR Paris Cedex FR Villeurbanne
- 代理机构： Miller, Matthias & Hull LLP
- 优先权： EP11305686 20110606
- 国际申请： PCT/EP2012/060578 WO 20120605
- 国际公布： WO2012/168225 WO 20121213
- 主分类号： H01J27/00
- IPC分类号： H01J27/00 ; H01J37/08 ; H01J27/02 ; H01J27/22 ; H01J3/18 ; H01J3/26 ; H01J37/05 ; H01J37/317
摘要：
A ion source comprises: a chamber, an injection to inject matter into the chamber, wherein said matter comprises at least a first species, a tip with an apex located in the chamber, wherein the apex has a surface made of a metallic second species, a generator to generate ions of said species, and a regulation system adapted to set operative conditions of the chamber to alternatively generate ions from the gaseous first species, and ions from the non-gaseous metallic second species.
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