Invention Grant
US08927942B2 Ion source, nanofabrication apparatus comprising such source, and a method for emitting ions
有权
离子源，包含这种源的纳米制造装置和用于发射离子的方法
- Patent Title: Ion source, nanofabrication apparatus comprising such source, and a method for emitting ions
- Patent Title (中): 离子源，包含这种源的纳米制造装置和用于发射离子的方法
-
Application No.: US14124408Application Date: 2012-06-05
-
Publication No.: US08927942B2Publication Date: 2015-01-06
- Inventor: Jacques Gierak , Nicolas Allemandou , Klaus Hasselbach , Jean-Paul Leggeri , Guillaume Donnier-Valentin , Stephen Purcell , Pauline Gavand
- Applicant: Jacques Gierak , Nicolas Allemandou , Klaus Hasselbach , Jean-Paul Leggeri , Guillaume Donnier-Valentin , Stephen Purcell , Pauline Gavand
- Applicant Address: FR Paris Cedex FR Villeurbanne
- Assignee: Centre National de la Recherche Scientifique—CNRS,Universite Claude Bernard Lyon
- Current Assignee: Centre National de la Recherche Scientifique—CNRS,Universite Claude Bernard Lyon
- Current Assignee Address: FR Paris Cedex FR Villeurbanne
- Agency: Miller, Matthias & Hull LLP
- Priority: EP11305686 20110606
- International Application: PCT/EP2012/060578 WO 20120605
- International Announcement: WO2012/168225 WO 20121213
- Main IPC: H01J27/00
- IPC: H01J27/00 ; H01J37/08 ; H01J27/02 ; H01J27/22 ; H01J3/18 ; H01J3/26 ; H01J37/05 ; H01J37/317
Abstract:
A ion source comprises: a chamber, an injection to inject matter into the chamber, wherein said matter comprises at least a first species, a tip with an apex located in the chamber, wherein the apex has a surface made of a metallic second species, a generator to generate ions of said species, and a regulation system adapted to set operative conditions of the chamber to alternatively generate ions from the gaseous first species, and ions from the non-gaseous metallic second species.
Public/Granted literature
- US20140175301A1 Ion Source, Nanofabrication Apparatus Comprising Such Source, and a Method for Emitting Ions Public/Granted day:2014-06-26
Information query
