Invention Grant
- Patent Title: Substrate liquid processing apparatus and method, and computer-readable recording medium with substrate liquid processing program recorded therein
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Application No.: US14666896Application Date: 2015-03-24
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Publication No.: US09862007B2Publication Date: 2018-01-09
- Inventor: Daisuke Saiki , Shogo Mizota , Takashi Yabuta , Jun Nonaka , Tatsuya Nagamatsu , Koji Tanaka , Tomiyasu Maezono
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JP2014-075072 20140401; JP2015-028739 20150217
- Main IPC: B08B3/14
- IPC: B08B3/14 ; C11D11/00 ; H01L21/67 ; B24B57/02 ; B01D36/04 ; B01D37/04

Abstract:
Disclosed are a substrate liquid processing apparatus and method for performing a liquid processing on a substrate using a processing liquid, and a computer-readable recording medium with a substrate liquid processing program recorded therein. In the method, a first chemical liquid supply step is performed to supply a first chemical liquid from a first chemical liquid supply unit to a processing liquid storage unit, a first chemical liquid purifying step is performed to purify the first chemical liquid in a chemical liquid purifying unit, a second chemical liquid supply step is performed to supply a second chemical liquid from a second chemical liquid supply unit to the processing liquid storage unit, and a processing liquid supply step is performed to supply the processing liquid obtained by mixing the first and second chemical liquids from the processing liquid supply unit to substrate liquid processing units.
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Information query
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