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18 条记录 (耗时 0.022 秒)

    Substrate liquid treatment apparatus
    1.
    发明授权
    Substrate liquid treatment apparatus 有权

    公开(公告)号：US11309194B2

    公开(公告)日：2022-04-19

    申请号：US15883481

    申请日：2018-01-30

    申请人： Tokyo Electron Limited

    发明人： Koji Tanaka ,  Toshiyuki Shiokawa ,  Koji Yamashita ,  Hiroyuki Masutomi ,  Hitoshi Kosugi ,  Takao Inada ,  Takashi Ikeda ,  Tsukasa Hirayama

    IPC分类号： H01L21/67 ,  H01L21/673 ,  H01L21/677

    摘要： A substrate liquid treatment apparatus includes an inner tank configured to store a treatment liquid and having an upper opening, an outer tank disposed outside the inner tank, and a lid movable between a close position for closing the upper opening of the inner tank and an open position for opening the upper opening of the inner tank. The lid includes a main portion that covers the upper opening of the inner tank when the lid is positioned at the close position, and a splash shielding portion connected to the main portion. When the lid is positioned at the close position, the splash shielding portion extends from a position higher than an upper end of a side wall of the inner tank adjacent to the splash shielding portion to a position which is lower than the upper end of the side wall and which is on the outer tank side of the side wall.

    SUBSTRATE PROCESSING APPARATUS
    2.
    发明申请
    SUBSTRATE PROCESSING APPARATUS 审中-公开

    公开(公告)号：US20190148176A1

    公开(公告)日：2019-05-16

    申请号：US16167863

    申请日：2018-10-23

    申请人： Tokyo Electron Limited

    发明人： Koji Tanaka ,  Takashi Ikeda ,  Hiroyuki Masutomi

    IPC分类号： H01L21/67 ,  H01L21/673

    摘要： A substrate processing apparatus according to an embodiment includes a substrate processing tank, a processing liquid supply nozzle, and a pressure regulating plate. The processing liquid supply nozzle is provided in a lower portion within the substrate processing tank, and ejects the processing liquid from a plurality of ejection ports. The pressure regulating plate is provided between the processing liquid supply nozzle and the substrate in the substrate processing tank and has a plurality of holes through which the processing liquid flows. The pressure regulating plate is configured to adjust the inflow pressure of the processing liquid ejected from the processing liquid supply nozzle. In addition, the pressure regulating plate includes ribs that protrude from a processing liquid supply nozzle side surface thereof so as to partition the processing liquid supply nozzle side surface into a plurality of partitioned regions.

    Substrate liquid processing apparatus
    4.
    发明授权
    Substrate liquid processing apparatus 有权

    公开(公告)号：US10573539B2

    公开(公告)日：2020-02-25

    申请号：US15535882

    申请日：2015-12-15

    申请人： Tokyo Electron Limited

    发明人： Hiroshi Komiya ,  Yasuhiro Takaki ,  Shinichi Umeno ,  Koji Tanaka ,  Takami Satoh ,  Atsushi Anamoto

    IPC分类号： H01L21/67 ,  B08B3/04

    摘要： A substrate liquid processing apparatus includes a transfer section, a processing section, a reservoir and a liquid sending mechanism. The transfer section includes a transfer device configured to transfer a substrate. The processing section is provided adjacent to the transfer section in a horizontal direction, and includes a liquid processing unit configured to process the substrate by using a processing liquid. The reservoir is configured to store the processing liquid therein. The liquid sending mechanism is configured to send out the processing liquid stored in the reservoir into the liquid processing unit. The reservoir is disposed directly under the transfer section. Further, the liquid sending mechanism is disposed directly under the processing section. Space saving of the substrate liquid processing apparatus can be achieved.

    SUBSTRATE LIQUID PROCESSING APPARATUS AND METHOD, AND COMPUTER-READABLE RECORDING MEDIUM WITH SUBSTRATE LIQUID PROCESSING PROGRAM RECORDED THEREIN
    8.
    发明申请
    SUBSTRATE LIQUID PROCESSING APPARATUS AND METHOD, AND COMPUTER-READABLE RECORDING MEDIUM WITH SUBSTRATE LIQUID PROCESSING PROGRAM RECORDED THEREIN 有权
    基板液体处理装置和方法以及具有基板液化处理程序的计算机可读记录介质

    公开(公告)号：US20150273538A1

    公开(公告)日：2015-10-01

    申请号：US14666896

    申请日：2015-03-24

    申请人： Tokyo Electron Limited

    发明人： Daisuke Saiki ,  Shogo Mizota ,  Takashi Yabuta ,  Jun Nonaka ,  Tatsuya Nagamatsu ,  Koji Tanaka ,  Tomiyasu Maezono

    IPC分类号： B08B3/14

    CPC分类号： B08B3/14 ,  B01D36/04 ,  B01D37/04 ,  B24B57/02 ,  C11D11/0047 ,  H01L21/67017

    摘要： Disclosed are a substrate liquid processing apparatus and method for performing a liquid processing on a substrate using a processing liquid, and a computer-readable recording medium with a substrate liquid processing program recorded therein. In the method, a first chemical liquid supply step is performed to supply a first chemical liquid from a first chemical liquid supply unit to a processing liquid storage unit, a first chemical liquid purifying step is performed to purify the first chemical liquid in a chemical liquid purifying unit, a second chemical liquid supply step is performed to supply a second chemical liquid from a second chemical liquid supply unit to the processing liquid storage unit, and a processing liquid supply step is performed to supply the processing liquid obtained by mixing the first and second chemical liquids from the processing liquid supply unit to substrate liquid processing units.

    摘要翻译： 公开了一种用于使用处理液在基板上进行液体处理的基板液体处理装置和方法，以及记录有基板液体处理程序的计算机可读记录介质。 在该方法中，进行第一药液供给工序，将第一药液从第一药液供给部供给至处理液储存部，进行第一化学液净化工序，对化学液中的第一药液进行净化 净化单元，执行第二化学液体供给步骤，将第二化学液体从第二药液供给单元供给到处理液储存单元，并且进行处理液供给工序，供给通过混合第一和第 第二化学液体从处理液体供应单元到基板液体处理单元。

    SUBSTRATE PROCESSING APPARATUS AND LIQUID MIXING METHOD
    9.
    发明申请
    SUBSTRATE PROCESSING APPARATUS AND LIQUID MIXING METHOD 审中-公开
    基板处理装置和液体混合方法

    公开(公告)号：US20150146498A1

    公开(公告)日：2015-05-28

    申请号：US14543951

    申请日：2014-11-18

    申请人： Tokyo Electron Limited

    发明人： Yasuo Kiyohara ,  Ikuo Sunaka ,  Koji Tanaka ,  Takami Satoh ,  Kazuyoshi Mizumoto ,  Takashi Uno ,  Hirotaka Maruyama ,  Hidetomo Uemukai ,  Tomiyasu Maezono

    IPC分类号： B01F15/04 ,  B01F15/02 ,  B01F3/08

    CPC分类号： G05D11/132 ,  B01F3/088 ,  B01F15/0479

    摘要： A substrate processing apparatus includes a mixing tank, a first opening/closing valve, a second opening/closing valve, a first flow rate measuring unit, a second flow rate measuring unit, a control unit, and a substrate processing unit. A first liquid and a second liquid are mixed such that the second liquid is mixed in an amount more than that of the first liquid. The first and second opening/closing valves open/close a first flow path and a second flow path, respectively. The first and second flow rate measuring units measure flow rates of the first and second liquids flowing through the first and second flow paths, respectively. The control unit controls opening/closing of the first opening/closing valve and the second opening/closing valve. The substrate processing unit processes a substrate by supplying a mixed liquid of the first and second liquids to the substrate.

    摘要翻译： 基板处理装置包括混合槽，第一开闭阀，第二开闭阀，第一流量测量单元，第二流量测量单元，控制单元和基板处理单元。 混合第一液体和第二液体，使得第二液体的混合量大于第一液体的量。 第一和第二打开/关闭阀分别打开/关闭第一流动路径和第二流动路径。 第一和第二流量测量单元分别测量流过第一和第二流路的第一和第二液体的流量。 控制单元控制第一打开/关闭阀和第二打开/关闭阀的打开/关闭。 基板处理单元通过将第一和第二液体的混合液体供给到基板来处理基板。