- 专利标题： Variable frequency microwave (VFM) processes and applications in semiconductor thin film fabrications
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申请号： US15399614申请日： 2017-01-05
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公开(公告)号： US09960035B2公开(公告)日： 2018-05-01
- 发明人: Loke Yuen Wong , Ke Chang , Yueh Sheng Ow , Ananthkrishna Jupudi , Glen T. Mori , Aksel Kitowski , Arkajit Roy Barman
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson + Sheridan LLP
- 主分类号： H01L21/31
- IPC分类号： H01L21/31 ; H01L21/02 ; H01L21/3105 ; H01L21/67 ; C23C14/22 ; C23C16/46 ; C23C16/511
摘要：
Methods and apparatus for processing a substrate are described herein. A vacuum multi-chamber deposition tool can include a degas chamber with both a heating mechanism and a variable frequency microwave source. The methods described herein use variable frequency microwave radiation to increased quality and speed of the degas process without damaging the various components.
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