Invention Grant
- Patent Title: Variable frequency microwave (VFM) processes and applications in semiconductor thin film fabrications
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Application No.: US15399614Application Date: 2017-01-05
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Publication No.: US09960035B2Publication Date: 2018-05-01
- Inventor: Loke Yuen Wong , Ke Chang , Yueh Sheng Ow , Ananthkrishna Jupudi , Glen T. Mori , Aksel Kitowski , Arkajit Roy Barman
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/02 ; H01L21/3105 ; H01L21/67 ; C23C14/22 ; C23C16/46 ; C23C16/511
Abstract:
Methods and apparatus for processing a substrate are described herein. A vacuum multi-chamber deposition tool can include a degas chamber with both a heating mechanism and a variable frequency microwave source. The methods described herein use variable frequency microwave radiation to increased quality and speed of the degas process without damaging the various components.
Public/Granted literature
- US20170117146A1 VARIABLE FREQUENCY MICROWAVE (VFM) PROCESSES AND APPLICATIONS IN SEMICONDUCTOR THIN FILM FABRICATIONS Public/Granted day:2017-04-27
Information query
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