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1.发明公开AQUEOUS POLISHING AGENT AND GRAFT COPOLYMERS AND THEIR USE IN PROCESS FOR POLISHING PATTERNED AND UNSTRUCTURED METAL SURFACES 审中-公开水基清洗剂和移植物及它们在一种用于清洁EYED化和非结构化的金属表面
公开(公告)号：EP2539412A4
公开(公告)日：2013-07-31
申请号：EP11746939
申请日：2011-01-19
Applicant: BASF SE
Inventor： RAMAN VIJAY IMMANUEL , GUBAYDULLIN ILSHAT , BRANDS MARIO , LI YUZHUO , PERETOLCHIN MAXIM
IPC: C09G1/02 , C08F271/02 , C09K3/14
CPC classification number: C09G1/02 , C08F283/00 , C09K3/1463 , C08F220/32
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2.发明公开PROCESS FOR REMOVING BULK MATERIAL LAYER FROM SUBSTRATE AND CHEMICAL MECHANICAL POLISHING AGENT SUITABLE FOR THIS PROCESS 审中-公开VERFAHREN ZUR ENTFERNUNG EINER MATERIALMASSESCHICHT VON EINEM SUBSTRAT UND CHEMISCH-MECHANISCHES REINIGUNGSMITTELFÜRDIESES VERFAHREN
公开(公告)号：EP2507332A4
公开(公告)日：2017-08-02
申请号：EP10832737
申请日：2010-11-25
Applicant: BASF SE
Inventor： RAMAN VIJAY IMMANUEL , LI YUZHUO , BRANDS MARIO , LAN YONGQING , RUSHING KENNETH , RAMJI KARPAGAVALLI
IPC: C09G1/02 , B01J13/14 , C09K3/14 , H01L21/321
CPC classification number: H01L21/3212 , C09G1/02 , C09K3/1436 , C09K3/1463
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3.发明公开PROCESS FOR REMOVING A BULK MATERIAL LAYER FROM A SUBSTRATE AND A CHEMICAL MECHANICAL POLISHING AGENT SUITABLE FOR THIS PROCESS 审中-公开除去方法基板和化学机械清洗机的材料，近地层这个过程
公开(公告)号：EP2507824A4
公开(公告)日：2013-09-25
申请号：EP10832736
申请日：2010-11-25
Applicant: BASF SE
Inventor： RAMAN VIJAY IMMANUEL , EBERT SOPHIA , BRANDS MARIO , LAN YONGQING , ZACHARIAS PHILIPP , GUBAYDULLIN ILSHAT , LI YUZHUO
IPC: H01L21/321 , C09G1/02
CPC classification number: C09G1/02 , C09K3/1463 , H01L21/3212
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4.发明公开CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A SPECIFIC HETEROPOLYACID 审中-公开使用杂用于化学机械抛光（CMP）组合物
公开(公告)号：EP2625241A4
公开(公告)日：2014-04-23
申请号：EP11830275
申请日：2011-10-04
Applicant: BASF SE
Inventor： SCHMITT CHRISTINE , KARPOV ANDREY , ROSOWSKI FRANK , BRANDS MARIO , LI YUZHUO
IPC: C09G1/02 , H01L21/306 , H01L21/321
CPC classification number: H01L21/30625 , C09G1/02 , H01L21/3212
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