摘要:
A disclosed method of manufacturing a surface emitting laser includes laminating a transparent dielectric layer on an upper surface of a laminated body; forming a first resist pattern on an upper surface of the dielectric layer, the first resist pattern including a pattern defining an outer perimeter of a mesa structure and a pattern protecting a region corresponding to one of the relatively high reflection rate part and the relatively low reflection rate part included in an emitting region; etching the dielectric layer by using the first resist pattern as an etching mask; and forming a second resist pattern protecting a region corresponding to an entire emitting region. These steps are performed before the mesa structure is formed.
摘要:
A nitride semiconductor laser element having a first nitride semiconductor layer (11), an active layer (12), a second nitride semiconductor layer (13), a first protective film (25) in contact with a cavity end face of the nitride semiconductor laser, and a second protective film (26) formed on the first protective film (25), wherein the second protective film (26) has a thick part protruding from a face on the cavity end face side and from a face opposite the cavity end face.
摘要:
A laser light source especially comprises a semiconductor layer sequence (10) having an active zone (45) and a radiation output surface (12) with a first section (121) and a second section (122), which is different therefrom, and a filter structure (5). When operating, the active zone (45) produces coherent first electromagnetic radiation (51) of a first wavelength range and incoherent second electromagnetic radiation (52) of a second wavelength range. The coherent first electromagnetic radiation (51) is emitted in a direction of emission (90) by the first section (121). The incoherent second electromagnetic radiation (51) is emitted by the first section (121) and the second section (122). The second wavelength range comprises the first wavelength range. The filter structure (5) at least partially attenuates the incoherent second electromagnetic radiation (52) emitted by the active zone along the direction of emission.
摘要:
The invention relates to a semiconductor laser diode structure with increased catastrophic optical damage (COD) power limit, featuring three sections, sometimes called windows, at the output facet of the diode. These include an optically transparent section (53), a current blocking section (54) and a partially current blocking section (55).
摘要:
A semiconductor laser device, which has a protective film at an end surface thereof, is adaptable to demands for higher outputs or shorter wavelengths. The semiconductor laser device according to the present invention includes a dielectric film (110) on at least one end surface of an optical resonator (300), in which the dielectric film includes a first dielectric layer (111) and a second dielectric layer (112) comprised of the same elements and disposed in sequence from the end surface side of the semiconductor, the first dielectric layer including a layer made of a single crystal material and the second dielectric layer including a layer made of an amorphous material.
摘要:
The invention relates to a semiconductor laser diode structure with increased catastrophic optical damage (COD) power limit, featuring three sections, sometimes called windows, at the output facet of the diode. These include an optically transparent section (53), a current blocking section (54) and a partially current blocking section (55).
摘要:
A semiconductor laser device, which has a protective film at an end surface thereof, is adaptable to demands for higher outputs or shorter wavelengths. The semiconductor laser device according to the present invention includes a dielectric film (110) on at least one end surface of an optical resonator (300), in which the dielectric film includes a first dielectric layer (111) and a second dielectric layer (112) comprised of the same elements and disposed in sequence from the end surface side of the semiconductor, the first dielectric layer including a layer made of a single crystal material and the second dielectric layer including a layer made of an amorphous material.
摘要:
A semiconductor laser element which can provide a good FFP free from ripple and close to a Gaussian distribution, and which is provided with a laminate structure that is formed by sequentially laminating a first conductive type semiconductor layer, an active layer, and a second conductive type (different from the first conductive type) semiconductor layer and that has a waveguide area for guiding light in one direction and a laser-resonating resonator surfaces at the opposite ends thereof, wherein the laminate structure has at one end thereof a non-resonator surface separate from the resonator surfaces and formed so as to include an active layer sectional surface, and the active layer sectional surface of the non-resonator surface is covered with a light shielding layer.
摘要:
The invention relates to a method using dry etching to obtain contamination free surfaces on of a material chosen from the group comprising GaAs, GaAlAs, InGaAsP, and InGaAs to obtain nitride layers on arbitrary structures on GaAs based lasers, and a GaAs based laser manufactured in accordance with the method. The laser surface is provided with a mask masking away parts of its surface to be prevented from dry etching. The laser is then placed in vacuum. Dry etching is then performed using a substance chosen from the group containing: chemically reactive gases, inert gases, a mixture between chemically reactive gases and inert gases. A native nitride layer is created using plasma containing nitrogen. A protective layer and/or a mirror coating is added.